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Displaying 1-6 of 6 results for author "Grenon, Brian J."
17th Annual Symposium on Photomask Technology and Management : : 17-19 September, 1997, Redwood City, California / James A Reynolds, Brian J. Grenon, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology ; published by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Washington : SPIE, [1998], ©1998.
- 1998-1998
- 1 Item
Item details Format Call Number Item Location Text TK7874 .S9274 1997g Off-site 18th Annual Symposium on Photomask Technology and Management : : 16-18 September, 1998, Redwood City, California / Brian J. Grenon, Frank E. Abboud, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology ; published by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Washington : SPIE, [1998], ©1998.
- 1998-1998
- 1 Item
Item details Format Call Number Item Location Text TK7874 .S9274 1998g Off-site 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California / Frank E. Abboud, Brian J. Grenon, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology.
- Text
- Bellingham, Wash., USA : SPIE, [1999], ©1999.
- 1999-1999
- 2 Items
Item details Format Call Number Item Location Text TK7874 .S9438 1999g v.2 Off-site Item details Format Call Number Item Location Text TK7874 .S9438 1999g v.1 Off-site 20th Annual BACUS Symposium on Photomask Technology : 13-15 September, 2000, Monterey, [California] USA / Brian J. Grenon, Giang T. Dao,chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology, SPIE--the International Sociey for Optical Engineering ; published by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Washington : SPIE, [1999], ©1999.
- 1999-1999
- 1 Item
Item details Format Call Number Item Location Text TK7874 .S9438 2000g Off-site 21st Annual BACUS Symposium on Photomask Technology : 3-5 October, 2001 Monterey, [California] USA / Giang T. Dao, Brian J. Grenon, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology, SPIE--the International Sociey for Optical Engineering ; published by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Washington : SPIE, [2002], ©2002.
- 2002-2002
- 2 Items
Item details Format Call Number Item Location Text TK7874 .S9274 2001g pt.2 Off-site Item details Format Call Number Item Location Text TK7874 .S9274 2001g pt.1 Off-site 22nd Annual BACUS Symposium on Photomask Technology : 1-4 October, 2002, Monterey, California, USA / Brian J. Grenon, Kurt R. Kimmel, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology, SPIE--the International Society for Optical Engineering ; published by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash. : SPIE, [2002], ©2002.
- 2002-2002
- 2 Items
Item details Format Call Number Item Location Text TK7874 .S9274 2002g pt.2 Off-site Item details Format Call Number Item Location Text TK7874 .S9274 2002g pt.1 Off-site
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