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Displaying 1-2 of 2 results for author "Houlihan, Francis M."
Advances in resist technology and processing XVII : 28 February-1 March, 2000, Santa Clara, USA / Francis M. Houlihan, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
- Text
- Bellingham, Washington : SPIE, [2000], ©2000.
- 2000-2000
- 2 Items
Item details Format Call Number Item Location Text TK7874 .A25 2000g p.2 Off-site Item details Format Call Number Item Location Text TK7874 .A25 2000g p.1 Off-site Advances in resist technology and processing XVIII : 26-28 February, 2001, Santa Clara, [California] USA / Francis M. Houlihan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
- Text
- Bellingham, Washington : SPIE, [2001], ©2001.
- 2001-2001
- 1 Item
Item details Format Call Number Item Location Text TK7874 .A25 2001g Off-site
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