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Displaying 1-3 of 3 results for author "SPIE Symposium on Microlithography (1994 : San Jose, Calif.)"
Integrated circuit metrology, inspection, and process control VIII : 28 February-2 March, San Jose, California / Marylyn Hoy Bennett, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.
- Text
- Bellingham, Wash., USA : SPIE, [1994], ©1994.
- 1994-1994
- 1 Item
Item details Format Call Number Item Location Text TK7874 .I54282 1994g Off-site Advances in resist technology and processing XI : 28 February-1 March 1994, San Jose, California / Omkaram Nalamasu, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.
- Text
- Bellingham, Wash., USA : SPIE, [1994], ©1994.
- 1994-1994
- 1 Item
Item details Format Call Number Item Location Text TR94 .A478 1994g Off-site Integrated circuit metrology, inspection, and process control VIII : 28 February-2 March, San Jose, California / Marylyn Hoy Bennett, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.
- Text
- Bellingham, Wash. : Society of Photo-optical Instrumentation Engineers, ©1994.
- 1994
- 1 Item
Item details Format Call Number Item Location Text TK7874 .I54688 1994 Off-site
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