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Displaying 1-3 of 3 results for author "Semiconductor Equipmant and Materials International."
Metrology, inspection, and process control for microlithography X : : 11-13 March, 1996, Santa Clara, California / Susan K. Jones, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering; cooperating organizations SEMI--Semiconductor Equipment and Materials International, SEMATECH.
- Text
- Bellingham, Wash., USA : SPIE, c1996.
- 1996
- 1 Item
Item details Format Call Number Item Location Text TA1505 .P762 vol.2725 Off-site Metrology, inspection, and process control for microlithography XI : 10-12 March, 1997, Santa Clara, California / Susan K. Jones, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations SEMI--Semiconductor Equipment and Materials International, SEMATECH.
- Text
- Bellingham, Wash. : SPIE, c1997.
- 1997
- 1 Item
Item details Format Call Number Item Location Text TA1505 .P762 vol.3050 Off-site Metrology, inspection, and process control for microlithography X : : 11-13 March, 1996, Santa Clara, California / Susan K. Jones, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering; cooperating organizations SEMI--Semiconductor Equipment and Materials International, SEMATECH.
- Text
- Bellingham, Wash., USA : SPIE, c1996.
- 1996
- 1 Item
Item details Format Call Number Item Location Text TA1505 .P762 vol.2725 Off-site
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