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Displaying 1-2 of 2 results for author "Tanabe, Hiroyoshi."
Photomask and next-generation lithography mask technology X : 16-18 April, 2003, Yokohama, Japan / Hiroyoshi Tanabe, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical roup of SPIE dedicated to the advancement of photomask technology, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for symposium, the Japan Society of Applied Physics ... [et al.] ; cooperating organization for technical exhibit, SEMI Japan ; supported by Yokohama City ; published by SPIE--the International Society for Optical Engineering.
- Text
- 2003
- 1 Item
Item details Format Call Number Item Location Text TK7872.M3 P46 2003g Off-site Photomask and next-generation lithography mask technology XI. Part One : 14-16 April, 2004, Yokohama, Japan / Hiroyoshi Tanabe, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--The International Society for Optical Engineering ; cooperating organizations, The Institute of Electrical Engineers of Japan . . . (et al.); co-organized by Yokohama City (Japan) ; published by SPIE--The International Society for Optical Engineering.
- Text
- Bellingham, Wash. : SPIE, [2004], ©2004.
- 2004-2004
- 2 Items
Item details Format Call Number Item Location Text TK7872.M3 P46 2004g pt.2 Off-site Item details Format Call Number Item Location Text TK7872.M3 P46 2004g pt.1 Off-site
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