Research Catalog

  • Materials, technology and reliability of low-k dielectrics and copper interconnects : symposium held April 18-21, 2006, San Francisco, California, U.S.A. / editors Ting Y. Tsui [and others].

    • Text
    • Warrendale, Pennsylvania : Materials Research Society, 2006.
    • 2006
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.85 .M36783 2006gOff-site

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