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Displaying 1-3 of 3 results for author "Warlaumont, John M."
Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V : 20-21 February 1995, Santa Clara, California / John M. Warlaumont, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.
- Text
- Bellingham, Wash., USA : SPIE, [1995], ©1995.
- 1995-1995
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E44 1995g Off-site Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V : 20-21 February 1995, Santa Clara, California / John M. Warlaumont, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering : cooperating organization SEMI--Semiconductor Equipment and Materials International.
- Text
- Bellingham, Wash., USA : SPIE, c1995.
- 1995
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E437 1995 Off-site Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V : 20-21 February 1995, Santa Clara, California / John M. Warlaumont, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering : cooperating organization SEMI--Semiconductor Equipment and Materials International.
- Text
- Bellingham, Wash., USA : SPIE, c1995.
- 1995
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E437 1995 Off-site
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