Research Catalog

  • Microlithography and metrology in micromachining II : 14-15 October 1996, Austin, Texas / Michael T. Postek, Craig Friedrich, chairs/editors ; sponsored by SPIE--the International Society for Optical Engineering, SEMI--Semiconductor Equipment and Materials International, NIST--National Institute of Standards and Technology.

    • Text
    • Bellingham, Wash. : SPIE, [1996], ©1996.
    • 1996-1996
    • 1 Item
    FormatCall NumberItem Location
    Text QC176.8.M5 M39 1996gOff-site
  • Microlithography and metrology in micromachining III : 29-30 September, 1997, Austin, Texas / Craig R. Friedrich, Akira Umeda, chairs/editors ; sponsored by SPIE--the Internatinoal Society for optical Engineering, SEMI--Semiconductor Equipment and Materials International, NIST--National Institute of Standards and Technology ; cooperating organization Solid State Technology ; published by SPIE--the International Society for Optical Engineering.

    • Text
    • Bellingham, Washington : SPIE, [1997], ©1997.
    • 1997-1997
    • 1 Item
    FormatCall NumberItem Location
    Text QC176.8.M5 M39 1997gOff-site
  • Materials and device characterization in micromachining : 21-22 September, 1998, Santa Clara, California / Craig R. Friedrich, Yuli Valdimirsky, chairs/editors ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperaing organizations , SEMI--Semiconductor Equipment and Materials International [and others].

    • Text
    • Bellingham, Wash. : SPIE, [1998], ©1998.
    • 1998-1998
    • 1 Item
    FormatCall NumberItem Location
    Text TJ1191.5 .M38 1998Off-site
  • Microlithography and metrology in micromachining II : 14-15 October 1996, Austin, Texas / Michael T. Postek, Craig Friedrich, chairs/editors ; sponsored by SPIE--the International Society for Optical Engineering, SEMI--Semiconductor Equipment and Materials International, NIST--National Institute of Standards and Technology.

    • Text
    • Bellingham, Wash. : SPIE, c1996.
    • 1996
    • 1 Item
    FormatCall NumberItem Location
    Text TA1505 .P762 vol.2880Off-site
  • Microlithography and metrology in micromachining II : 14-15 October, 1996, Austin, Texas / Michael T. Postek, Craig Friedrich, chairs/editors ; sponsored by SPIE--the International Society for Optical Engineering, SEMI--Semiconductor Equipment and Materials International, NIST--National Institute of Standards and Technology.

    • Text
    • Bellingham, Wash. : Society of Photo-optical Instrumentation Engineers, 1996.
    • 1996
    • 1 Item
    FormatCall NumberItem Location
    Text TA1505 .P762 vol.2880Off-site

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