Research Catalog

  • Photomask and X-ray mask technology VI : 13-14 April, 1999, Yokohama, Japan / Hiraoki Morimoto, editor ; sponsored by Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations, the Japan Society of Applied Physics [and others].

    • Text
    • Bellingham, Wash., USA : SPIE, [1999], ©1999.
    • 1999-1999
    • 1 Item
    FormatCall NumberItem Location
    Text TK7872.M3 P46 1999gOff-site
  • Photomask and next-generation lithography mask technology VII : 12-13 April 2000, Yokohama, Japan / Hiroaki Morimoto, editor ; sponsored by Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for the symposium, Japan Society of Applied Physics, Japan Society for Precision Engineering, [and] Institute of Electrical Engineers of Japan ; cooperating organization for technical exhibit, SEMI Japan.

    • Text
    • Bellingham, Wash., USA : SPIE, [2000], ©2000.
    • 2000-2000
    • 1 Item
    FormatCall NumberItem Location
    Text TK7872.M3 P46 2000gOff-site

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