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Displaying 1-5 of 5 results for author "Northern California Microphotomask/Masking Working Group."
Developments in semiconductor microlithography II : [seminar], April 4-5, 1977, San Jose, California / James W. Giffin, Bruce Ruff, editors ; presented by the Society of Photo-optical Instrumentation Engineers and the Northern California Microphotomask/Masking Working Group, in cooperation with the International Society for Hybrid Microelectronics.
- Text
- Bellingham, Wash. : SPIE, c1977.
- 1977
- 1 Item
Item details Format Call Number Item Location Text TK7871.85.D493 Off-site Developments in semiconductor microlithography IV : April 23-24, 1979, San Jose, California / Jim Dey, editor ; cooperating organization, Northern California Microphotomask/Masking Working Group.
- Text
- Bellingham, Wash. : Society of Photo-optical Instrumentation Engineers, c1979.
- 1979
- 1 Item
Item details Format Call Number Item Location Text TK7871.85 .D495 Off-site Semiconductor microlithography V / Jim Dey, editor ; presented by the Society of Photo-optical Instrumentation Engineers in cooperation with the Northern California Microphotomask/Masking Working Group and the International Society for Hybrid Microelectronics, March 17-18, 1980, San Jose, California.
- Text
- Bellingham, Wash. : SPIE, 1980.
- 1980
- 1 Item
Item details Format Call Number Item Location Text TK7871.85 .S465 Off-site Optical microlithography : technology for the mid-1980s : March 31-April 1, 1982, Santa Clara, California / Harry L. Stover, chairman-editor ; in cooperation with the International Society for Hybrid Microelectronics, the Northern California Microphotomask/Masking Working Group, the Materials Research Society.
- Text
- Bellingham, Wash. : SPIE--the International Society for Optical Engineering, c1982.
- 1982
- 1 Item
Item details Format Call Number Item Location Text TK7874 .O67 Off-site Submicron lithography : March 29-30, 1982, Santa Clara, California / Phillip D. Blais, chairman-editor ; in cooperation with the International Society for Hybrid Microelectronics, the Northern California Microphotomask/Masking Working Group, the Materials Research Society.
- Text
- Bellingham, Wash. : SPIE--the International Society for Optical Engineering, c1982.
- 1982
- 1 Item
Item details Format Call Number Item Location Text TK7874 .S82 Off-site
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