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Displaying 1-3 of 3 results for author "Resnick, Douglas J."
Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies IX : 7-8 March 1990, San Jose, California / Douglas J. Resnick, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, [1990], ©1990.
- 1990-1990
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E4356 1990g Off-site Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies IX : 7-8 March 1990, San Jose, California / Douglas J. Resnick, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, c1990.
- 1990
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E4356 Off-site Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies IX : 7-8 March 1990, San Jose, California / Douglas J. Resnick, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash. : Society of Photo-optical Instrumentation Engineers, ©1990.
- 1990
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E4356 Off-site
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