Research Catalog

  • Plasma effects in bismuth-antimony alloys and silicon.

    • Text
    • [Copenhagen], Technical University of Denmark, Lyngby, Physics Laboratory III, 1970.
    • 1970
    • 1 Item
    FormatCall NumberItem Location
    Text JSF 72-1241Offsite
  • Materials issues in applications of amorphous silicon technology : symposium held April 15-17, 1985, San Francisco, California, U.S.A. / editors, D. Adler, A. Madan, M.J. Thompson.

    • Text
    • Pittsburgh, Pa. : Materials Research Society, c1985.
    • 1985
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 86-415Offsite
  • Amorphous silicon technology, 1989 : symposium held April 25-28, 1989, San Diego, California, U.S.A. / editors, Arun Madan ... [et al.].

    • Text
    • Pittsburgh, Pa. : Materials Research Society, c1989.
    • 1989
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 91-385Offsite
  • Amorphous silicon technology, 1990 : symposium held April 17-20, 1990, San Francisco, California, U.S.A. / editors, P.C. Taylor ... [et al.].

    • Text
    • Pittsburgh, Pa. : Materials Research Society, c1990.
    • 1990
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 92-1804Offsite
  • Properties of strained and relaxed silicon germanium / edited by Erich Kasper.

    • Text
    • London : INSPEC, c1995.
    • 1995
    • 1 Item
    FormatCall NumberItem Location
    Text JSF 95-462Offsite
  • Properties of amorphous silicon and its alloys / edited by Tim Searle.

    • Text
    • London : INSPEC, c1998.
    • 1998
    • 1 Item
    FormatCall NumberItem Location
    Text JSF 98-612Offsite
  • Epitaxy and applications of Si-based heterostructures : symposium held April 13-17, 1998, San Francisco, California, U.S.A. / editors, Eugene A. Fitzgerald, Derek C. Houghton, Patricia M. Mooney.

    • Text
    • Warrendale, Pa. : Materials Research Society, c1998.
    • 1998
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 99-939Offsite
  • Properties of silicon germanium and SiGe:Carbon / edited by Erich Kasper and Klara Lyutovich.

    • Text
    • London : INSPEC, c2000.
    • 2000
    • 1 Item
    FormatCall NumberItem Location
    Text JSF 00-821Offsite
  • Silicon-based material and devices / edited by Hari Singh Nalwa.

    • Text
    • San Diego, Calif. : London : Academic Press, c2001.
    • 2001
  • Studies on the reactive melt infiltration of silicon and silicon-molybdenum alloys in porous carbon [microform] / M. Singh and D.R. Behrendt.

    • Text
    • [Washington, DC : National Aeronautics and Space Administration ; Springfield, Va. : For sale by the National Technical Information Service, 1992]
    • 1992
  • Development of Si[1-x]Ge[x] technology for microwave sensing applications [microform] / Rafael A. Mena ... [et al.].

    • Text
    • [Washington, DC] : National Aeronautics and Space Administration ; [Springfield, Va. : National Technical Information Service, distributor, 1993]
    • 1993
  • Development of a polysilicon process based on chemical vapor deposition of dichlorosilane in an advanced Siemen's reactor [microform] : final report covering period October 11, 1982 to May 21, 1983 / Arvid N. Arvidson, principal investigator ; David H. Swayer, David M. Muller.

    • Text
    • Hemlock, Mich. : Hemlock Semiconductor Corporation ; [Springfield, Va. : National Technical Information Service, 1983]
    • 1983
  • Fatigue crack layer propagation in silicon-iron [microform] / Y. Birol, G. Welsch, and A. Chudnovsky.

    • Text
    • [Washington, DC] : National Aeronautics and Space Administration ; [Springfield, Va. : National Technical Information Service, distributor, 1986]
    • 1986
  • Reactive melt infiltration of silicon-molybdenum alloys into microporous carbon preforms [microform] / M. Singh, D.R. Behrendt.

    • Text
    • [Washington, D.C. : National Aeronautics and Space Administration ; Springfield, Va. : National Technical Information Service, distributor, 1995]
    • 1995-1995
  • Silicon-germanium carbon alloys / edited by S.T. Pantelides and S. Zollner.

    • Text
    • New York ; London : Taylor & Francis, 2002.
    • 2002
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 02-1640Offsite
  • Monte Carlo simulation of the rapid crystallization of bismuth-doped silicon [microform] / Kenneth L. Jackson, George H. Gilmer, and Dmitri E. Temkin.

    • Text
    • [Washington, D.C. : National Aeronautics and Space Administration, 1997]
    • 1997-1995
  • Effect of oxygen-nitrogen ratio on sinterability of Sialons / Alan Arias.

    • Text
    • [Washington, D.C.] : National Aeronautics and Space Administration, Scientific and Technical Information Office, April 1979.
    • 1979-4
    • 1 Resource

    Available Online

    https://purl.fdlp.gov/GPO/gpo172537
  • Wear of aluminum and hypoeutectic aluminum-silicon alloys in boundary-lubricated pin-on-disk sliding / John Ferrante and William A. Brainard.

    • Text
    • Washington, D.C. : National Aeronautics and Space Administration, Scientific and Technical Information Office, April 1979.
    • 1979-4
    • 1 Resource

    Available Online

    https://purl.fdlp.gov/GPO/gpo172556
  • Amorphous silicon materials and solar cells, Denver, CO, 1991 / editor, Bryon [i.e. Byron] L. Stafford.

    • Text
    • New York : American Institute of Physics, [1991], ©1991.
    • 1991-1991
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.99.A45 A476 1991Off-site
  • Hydrogenated amorphous silicon alloy deposition processes / Werner Luft and Y. Simon Tsuo.

    • Text
    • New York : Marcel Dekker, [1993], ©1993.
    • 1993-1993
    • 1 Item
    FormatCall NumberItem Location
    Text TK7872.T55 L84 1993Off-site
  • Advanced silicon and semiconducting silicon-alloy based materials and devices / edited by Johan F.A. Nijs.

    • Text
    • Bristol ; Philadelphia : Institute of Physics Pub., [1994], ©1994.
    • 1994-1994
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.85 .A354 1994Off-site
  • Properties of strained and relaxed silicon germanium / edited by Erich Kasper.

    • Text
    • London : INSPEC, [1995], ©1995.
    • 1995-1995
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.85 .P76 1995Off-site
  • Plasma deposition of amorphous silicon-based materials / edited by Giovanni Bruno, Pio Capezzuto, Arun Madan.

    • Text
    • San Diego, CA : Academic Press, 1995.
    • 1995
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.99.A45 P55 1995Off-site
  • Epitaxy and applications of Si-based heterostructures : symposium held April 13-17, 1998, San Francisco, California, U.S.A. / editors, Eugene A. Fitzgerald, Derek C. Houghton, Patricia M. Mooney.

    • Text
    • Warrendale, Pa. : Materials Research Society, [1998], ©1998.
    • 1998-1998
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.85 .E655 1998Off-site
  • Properties of amorphous silicon and its alloys / edited by Tim Searle.

    • Text
    • London : INSPEC, [1998], ©1998.
    • 1998-1998
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.15.S55 P73 1998gOff-site
  • Silicon-based materials and devices / edited by Hari Singh Nalwa.

    • Text
    • San Diego : Academic Press, 2001.
    • 2001
    • 2 Items
    FormatCall NumberItem Location
    Text QD181.S6 S56 2001 v.2Off-site
    FormatCall NumberItem Location
    Text QD181.S6 S56 2001 v.1Off-site
  • Silicon-germanium carbon alloy / edited by S.T. Pantelides and S. Zollner.

    • Text
    • New York : Taylor & Francis, 2002.
    • 2002
    • 1 Item
    FormatCall NumberItem Location
    Text TA479.S5 S55 2002Off-site
  • Silicon materials--processing, characterization and reliability : symposium held April 1-5, 2002, San Francisco, California, U.S.A. / editors, Janice L. Veteran [and others].

    • Text
    • Warrendale, Pa. : Materials Research Society, [2002], ©2002.
    • 2002-2002
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.85 .S54669 2002Off-site
  • Materials issues in applications of amorphous silicon technology : symposium held April 15-17, 1985, San Francisco, California, U.S.A. / editors, D. Adler, A. Madan, M.J. Thompson.

    • Text
    • Pittsburgh, Pa. : Materials Research Society, [1985], ©1985.
    • 1985-1985
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.15.S55 M37 1985Off-site
  • Stability of amorphous silicon alloy materials and devices / editors, B.L. Stafford & E. Sabisky.

    • Text
    • New York : American Institute of Physics, 1987.
    • 1987
    • 1 Item
    FormatCall NumberItem Location
    Text TA479.S5 I6 1987gOff-site
  • Properties of semiconductor alloys : group-IV, III-V and II-VI semiconductors / Sadao Adachi.

    • Text
    • Chichester, U.K. : Wiley, 2009.
    • 2009
    • 2 Items
    FormatCall NumberItem Location
    Text Off-site
    Not available - Please for assistance.
    FormatCall NumberItem Location
    Text TK7871.85 .A32 2009Off-site
    Not available - Please for assistance.
  • Amorphous silicon technology, 1989 : symposium held April 25-28, 1989, San Diego, California, U.S.A. / editors, Arun Madan [and others].

    • Text
    • Pittsburgh, Pa. : Materials Research Society, 1989.
    • 1989
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.99.A45 A478 1989Off-site
  • Amorphous silicon technology, 1990 : symposium held April 17-20, 1990, San Francisco, California, U.S.A. / editors, P.C. Taylor [and others].

    • Text
    • Pittsburgh, Pa. : Materials Research Society, [1990], ©1990.
    • 1990-1990
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.99.A45 A479 1990Off-site
  • The alloys of aluminum and silicon : produced by the Cowles' electric furnace / [By] The Cowles Electric Smelting & Aluminum Co. ...

    • Text
    • [Cleveland : Leader Printing Company, 1887]
    • 1887
    • 1 Item
    FormatCall NumberItem Location
    Text Chem 7430Off-site
  • Group IV heterostructures, physics, and devices (Si, Ge, C, [alpha]-Sn) : proceedings of Symposium D on Group IV Heterostructures, Physics, and Devices (Si, Ge, C, [alpha]-Sn) of the 1996 E-MRS Spring Conference, Strasbourg, France, June 4-7, 1996 / edited by J.-M. Lourtioz, G. Abstreiter, B. Meyerson.

    • Text
    • Amsterdam ; New York : Elsevier, c1997.
    • 1997-1997
    • 1 Item
    FormatCall NumberItem Location
    Text QC611.8.A44 S96 1996Off-site
  • Materials issues in applications of amorphous silicon technology : symposium held April 15-17, 1985, San Francisco, California, U.S.A. / editors, D. Adler, A. Madan, M.J. Thompson.

    • Text
    • 1985
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.15.S55M37 1985Off-site
  • The physics of hydrogenated amorphous silicon / edited by J.D. Joannopoulos and G. Lucovsky, with contributions by D.E. Carlson [and 8 others].

    • Text
    • Berlin ; New York : Springer-Verlag, 1984.
    • 1984
    • 1 Item
    FormatCall NumberItem Location
    Text QC611.8.S5 P49 1984 v.1Off-site
  • Materials issues in applications of amorphous silicon technology : symposium held April 15-17, 1985, San Francisco, California, U.S.A. / editors, D. Adler, A. Madan, M.J. Thompson.

    • Text
    • Pittsburgh, Pa. : Materials Research Society, ©1985.
    • 1985
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.15.S55 M37 1985Off-site

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