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Displaying 1-7 of 7 results for author "BACUS (Technical group) http://id.loc.gov/authorities/names/n92089299"
Photomask and X-ray mask technology II : 20-21 April 1995, Kawasaki City, Kanagawa, Japan / Hideo Yoshihara, chair/editor ; sponsored by Photomask Japan ; BACUS ; SPIE--the International Society for Optical Engineering ... [et al.].
- Text
- Bellingham, Wash. : SPIE, c1995.
- 1995
- 1 Item
Item details Format Call Number Item Location Text TK7874 .P5672 1995 Off-site 15th Annual Symposium on Photomask Technology and Management : proceedings : 20-22 September, 1995, Santa Clara, California / Gilbert V. Shelden, James N. Wiley, chairs/editors; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology.
- Text
- Bellingham, Wash. : SPIE, c1995.
- 1995
- 1 Item
Item details Format Call Number Item Location Text TK7874 .S9434 1995 Off-site 16th Annual Symposium on Photomask Technology and Management : proceedings : 20-22 September, 1996, Redwood City, California / Gilbert V. Shelden, James A Reynolds, chairs/editors; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology.
- Text
- Bellingham, Wash. : SPIE, c1996.
- 1996
- 1 Item
Item details Format Call Number Item Location Text TA1505 .P762 vol.2884 Off-site Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan / Naoaki Aizaki, editor ; sponsored by Photomask Japan, BACUS, SPIE--the International Society for Optical Engineering ; supporting societies, the Japan Society of Applied Physics ... [et al.].
- Text
- Bellingham, Washington : SPIE, c1997.
- 1997
- 1 Item
Item details Format Call Number Item Location Text TA1505 .P762 vol.3096 Off-site 12th annual Symposium on Photomask Technology and Management : proceedings : 23-24 September 1992, Sunnyvale, California / sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology.
- Text
- Bellingham, Wash. : SPIE--the International Society for Optical Engineering, c1993.
- 1993
- 1 Item
Item details Format Call Number Item Location Text TK7874 .S9434 1992 Off-site Photomask and x-ray mask technology : 22 April 1994, Kawasaki City, Kanagawa, Japan / Hideo Yoshihara, chair/editor ; sponsored by Japan Chapter of SPIE ; cosponsored by BACUS, SPIE--the International Society for Optical Engineering.
- Text
- 1994
- 1 Item
Item details Format Call Number Item Location Text TK7874 .P567 1994 Off-site 14th Annual Symposium on Photomask Technology and Management : proceedings : 14-16 September 1994, Santa Clara, California / William L. Brodsky, Gilbert V. Shelden, chairs/editors : sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology.
- Text
- Bellingham, Wash. : SPIE--the International Society for Optical Engineering, c1994.
- 1994
- 1 Item
Item details Format Call Number Item Location Text TK7874 .S9434 1994 Off-site
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