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Displaying 1-6 of 6 results for author "Patterson, David O."
Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III : 1-2 March 1993, San Jose, California / David O. Patterson, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash. : The Society, [1993], ©1993.
- 1993-1993
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E4863 1992g Off-site Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV : 28 February-1 March 1994, San Jose, California / David O. Patterson, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.
- Text
- Bellingham, Wash., USA : SPIE, [1994], ©1994.
- 1994-1994
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E4834 1994g Off-site Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III : 1-2 March 1993, San Jose, California / David O. Patterson chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
- Text
- 1993
- 1 Item
Item details Format Call Number Item Location Text TK7874.E4359 1993 Off-site Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV : 28 February-1 March 1994, San Jose, California / David O. Patterson chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering : cooperating organization SEMI--Semiconductor Equipment and Materials International.
- Text
- 1994
- 1 Item
Item details Format Call Number Item Location Text TK7874.E436 1994 Off-site Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III : 1-2 March 1993, San Jose, California / David O. Patterson chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash., USA : SPIE, c1993.
- 1993
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E4359 1993 Off-site Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV : 28 February-1 March 1994, San Jose, California / David O. Patterson chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering : cooperating organization SEMI--Semiconductor Equipment and Materials International.
- Text
- Bellingham, Wash., USA : SPIE, c1994.
- 1994
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E436 1994 Off-site
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