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Displaying 1-4 of 4 results for author "SPIE Symposium on Microlithography (1991 : San Jose, Calif.)"
Advances in resist technology and processing VIII : 4-5 March 1991, San Jose, California / Hiroshi Ito, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, [1991], ©1991.
- 1991-1991
- 1 Item
Item details Format Call Number Item Location Text TK8331 .A38383 1991g Off-site Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing : 6-7 March 1991, San Jose, California / Martin Peckerar, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash., USA : SPIE, [1991], ©1991.
- 1991-1991
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E4357 1991g Off-site Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing : 6-7 March 1991, San Jose, California / Martin Peckerar, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash., USA : SPIE, c1991.
- 1991
- 2 Items
Item details Format Call Number Item Location Text Off-site Not available - Please for assistance.Item details Format Call Number Item Location Text TK7874 .E4357 Off-site Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing : 6-7 March 1991, San Jose, California / Martin Peckerar, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash., USA : SPIE, c1991.
- 1991
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E4357 Off-site
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