Research Catalog

  • 16th Annual Symposium on Photomask Technology and Management : proceedings : 18-20 September, 1996, Redwood City, California / Gilbert V. Shelden, James A Reynolds, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology.

    • Text
    • Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, [1996], ©1996.
    • 1996-1996
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .S9274 1996gOff-site
  • 15th Annual Symposium on Photomask Technology and Management : proceedings : 20-22 September, 1995, Santa Clara, California / Gilbert V. Shelden, James N. Wiley, chairs/editors; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology.

    • Text
    • Bellingham, Wash. : SPIE, c1995.
    • 1995
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .S9434 1995Off-site
  • 16th Annual Symposium on Photomask Technology and Management : proceedings : 20-22 September, 1996, Redwood City, California / Gilbert V. Shelden, James A Reynolds, chairs/editors; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology.

    • Text
    • Bellingham, Wash. : SPIE, c1996.
    • 1996
    • 1 Item
    FormatCall NumberItem Location
    Text TA1505 .P762 vol.2884Off-site
  • 14th Annual Symposium on Photomask Technology and Management : proceedings : 14-16 September 1994, Santa Clara, California / William L. Brodsky, Gilbert V. Shelden, chairs/editors : sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology.

    • Text
    • Bellingham, Wash. : SPIE--the International Society for Optical Engineering, c1994.
    • 1994
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .S9434 1994Off-site
  • 15th Annual Symposium on Photomask Technology and Management : proceedings : 20-22 September, 1995, Santa Clara, California / Gilbert V. Shelden, James N. Wiley, chairs/editors; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology.

    • Text
    • Bellingham, Wash. : SPIE, c1995.
    • 1995
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .S9434 1995Off-site
  • 16th Annual Symposium on Photomask Technology and Management, 18-20 September 1996, Redwood City, California / Gilbert V. Shelden, James A. Reynolds., chairs/editors ; sponsored by BACUS.

    • Text
    • Bellingham, Wash. : Society of Photo-optical Instrumentation Engineers, ©1996.
    • 1996
    • 1 Item
    FormatCall NumberItem Location
    Text TA1505 .P762 vol.2884Off-site
  • 14th Annual Symposium on Photomask Technology and Management : proceedings : 14-16 September 1994, Santa Clara, California / William L. Brodsky, Gilbert V. Shelden, chairs/editors : sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology.

    • Text
    • Bellingham, Wash. : SPIE--the International Society for Optical Engineering, c1994.
    • 1994
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .S9434 1994Off-site

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