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Displaying 1-4 of 4 results for author "Yanof, Arnold W."
Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VII : 2-4 March 1988, Santa Clara, California / Arnold W. Yanof, chair/editor ; sponsored by SPIE-the International Society for Optical Engineering.
- Text
- Bellingham, Wash., USA : The Society, [1988], ©1988.
- 1988-1988
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E4826 1988 Off-site Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VIII : 1-3 March 1989, San Jose, California / Arnold W. Yanof, chair/editor ; sponsored by SPIE-the International Society for Optical Engineering.
- Text
- Bellingham, Wash., USA : The Society, [1989], ©1989.
- 1989-1989
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E4355 1989g Off-site Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VIII : 1-3 March 1989, San Jose, California / Arnold W. Yanof, chair/editor ; sponsored by SPIE-the International Society for Optical Engineering.
- Text
- 1989
- 1 Item
Item details Format Call Number Item Location Text TK7874.E4355 Off-site Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VIII : 1-3 March 1989, San Jose, California / Arnold W. Yanof, chair/editor ; sponsored by SPIE-the International Society for Optical Engineering.
- Text
- Bellingham, Wash., USA : The Society, c1989.
- 1989
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E4355 Off-site
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