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Displaying 1-13 of 13 results for author "Postek, Michael T."
Shape-sensitive linewidth measurements of resist structures : LITG410I project / John S. Villarrubia; Andras E. Vladar; Michael T. Postek.
- Text
- Gaithersburg, MD : U.S. Dept. of Commerce, National Institute of Standards and Technology, 2004.
- 2004
- 1 Resource
Available Online
https://purl.fdlp.gov/GPO/gpo95206Integrated circuit metrology, inspection, and process control VI : 9-11 March 1992, San Jose, California / Michael T. Postek, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash., USA : SPIE, [1992], ©1992.
- 1992-1992
- 1 Item
Item details Format Call Number Item Location Text TK7874 .I5554 1992g Off-site Integrated circuit metrology, inspection, and process control VII : 2-4 March 1993, San Jose, California / Michael T. Postek, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash., USA : SPIE, [1993], ©1993.
- 1993-1993
- 1 Item
Item details Format Call Number Item Location Text TK7874 .I54294 1993g Off-site Microlithography amd metrology in micromachining : 23-24 October, 1995, Austin, Texas / Michael T. Postek, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash., USA : SPIE, [1995], ©1995.
- 1995-1995
- 1 Item
Item details Format Call Number Item Location Text QC176.8.M5 M39 1995g Off-site Microlithography and metrology in micromachining II : 14-15 October 1996, Austin, Texas / Michael T. Postek, Craig Friedrich, chairs/editors ; sponsored by SPIE--the International Society for Optical Engineering, SEMI--Semiconductor Equipment and Materials International, NIST--National Institute of Standards and Technology.
- Text
- Bellingham, Wash. : SPIE, [1996], ©1996.
- 1996-1996
- 1 Item
Item details Format Call Number Item Location Text QC176.8.M5 M39 1996g Off-site Nanostructure science, metrology, and technology : 5-7 September 2001, Gaithersburg, USA / Martin C. Peckerar, Michael T. Postek, Jr., chairs/editors.
- Text
- Bellingham, Wash. : SPIE-the International Society for Optical Engineering, [2002], ©2002.
- 2002-2002
- 1 Item
Item details Format Call Number Item Location Text T174.7 .N365 2002 Off-site Microlithography and metrology in micromachining : 23-24 October 1995, Austin, Texas / Michael T. Postek, chair/editor ; sponsored by SEMI--Semiconductor Equipment and Materials International, NIST--National Institute of Standards and Technology, SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash. : SPIE, c1995.
- 1995
- 1 Item
Item details Format Call Number Item Location Text TK7874 .M524 1995 Off-site Microlithography and metrology in micromachining II : 14-15 October 1996, Austin, Texas / Michael T. Postek, Craig Friedrich, chairs/editors ; sponsored by SPIE--the International Society for Optical Engineering, SEMI--Semiconductor Equipment and Materials International, NIST--National Institute of Standards and Technology.
- Text
- Bellingham, Wash. : SPIE, c1996.
- 1996
- 1 Item
Item details Format Call Number Item Location Text TA1505 .P762 vol.2880 Off-site Integrated circuit metrology, inspection, and process control VI 9-11 March 1992, San Jose, California / Michael T. Postek, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
- Text
- 1992
- 1 Item
Item details Format Call Number Item Location Text TK7874.I54686 1992 Off-site Integrated circuit metrology, inspection, and process control VII : 2-4 March 1993, San Jose, California / Michael T. Postek, chair/editor ; sponsored and published by SPIE-the International Society for Optical Engineering.
- Text
- Bellingham, WA : SPIE-the International Society for Optical Engineering, c1993.
- 1993
- 1 Item
Item details Format Call Number Item Location Book/Text TK7874.I54687 1993 Off-site Microlithography and metrology in micromachining : 23-24 October 1995, Austin, Texas / Michael T. Postek, chair/editor ; sponsored by SEMI--Semiconductor Equipment and Materials International, NIST--National Institute of Standards and Technology, SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash. : SPIE, c1995.
- 1995
- 1 Item
Item details Format Call Number Item Location Book/Text TK7874 .M524 1995 Off-site Microlithography and metrology in micromachining II : 14-15 October, 1996, Austin, Texas / Michael T. Postek, Craig Friedrich, chairs/editors ; sponsored by SPIE--the International Society for Optical Engineering, SEMI--Semiconductor Equipment and Materials International, NIST--National Institute of Standards and Technology.
- Text
- Bellingham, Wash. : Society of Photo-optical Instrumentation Engineers, 1996.
- 1996
- 1 Item
Item details Format Call Number Item Location Book/Text TA1505 .P762 vol.2880 Off-site Integrated circuit metrology, inspection, and process control VI 9-11 March 1992, San Jose, California / Michael T. Postek, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash. : SPIE--the International Society for Optical Engineering, c1992.
- 1992
- 1 Item
Item details Format Call Number Item Location Book/Text TK7874 .I54686 1992 Off-site
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