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Displaying 1-5 of 5 results for author "Semiconductor Equipment and Materials International (Japan)"
Photomask and next-generation lithography mask technology VII : 12-13 April 2000, Yokohama, Japan / Hiroaki Morimoto, editor ; sponsored by Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for the symposium, Japan Society of Applied Physics, Japan Society for Precision Engineering, [and] Institute of Electrical Engineers of Japan ; cooperating organization for technical exhibit, SEMI Japan.
- Text
- Bellingham, Wash., USA : SPIE, [2000], ©2000.
- 2000-2000
- 1 Item
Item details Format Call Number Item Location Text TK7872.M3 P46 2000g Off-site Photomask and next-generation lithography mask technology VIII : 25-26 April 2001, Yokohama, Japan / Hiroichi Kawahira, editor ; sponsored by PMJ--Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for the symposium, Japan Society of Applied Physics [and others] ; cooperating organization for technical exhibit, SEMI Japan ; supported by Yokohama City.
- Text
- Bellingham, Wash., USA : SPIE, [2001], ©2001.
- 2001-2001
- 1 Item
Item details Format Call Number Item Location Text TK7872.M3 P46 2001g Off-site Photomask and next-generation lithography mask technology IX : 23-25 April, 2002, Yokohama, Japan / Hiroichi Kawahira, editor ; sponsored by PMJ--Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for the symposium, Japan Society of Applied Physics [and others] ; cooperating organization for technical exhibit, SEMI Japan ; supported by Yokohama City ; published by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Washington : SPIE, [2001], ©2001.
- 2001-2001
- 1 Item
Item details Format Call Number Item Location Text TK7872.M3 P46 2002g Off-site Photomask and next-generation lithography mask technology X : 16-18 April, 2003, Yokohama, Japan / Hiroyoshi Tanabe, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical roup of SPIE dedicated to the advancement of photomask technology, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for symposium, the Japan Society of Applied Physics ... [et al.] ; cooperating organization for technical exhibit, SEMI Japan ; supported by Yokohama City ; published by SPIE--the International Society for Optical Engineering.
- Text
- 2003
- 1 Item
Item details Format Call Number Item Location Text TK7872.M3 P46 2003g Off-site Photomask and next-generation lithography mask technology XI. Part One : 14-16 April, 2004, Yokohama, Japan / Hiroyoshi Tanabe, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--The International Society for Optical Engineering ; cooperating organizations, The Institute of Electrical Engineers of Japan . . . (et al.); co-organized by Yokohama City (Japan) ; published by SPIE--The International Society for Optical Engineering.
- Text
- Bellingham, Wash. : SPIE, [2004], ©2004.
- 2004-2004
- 2 Items
Item details Format Call Number Item Location Text TK7872.M3 P46 2004g pt.2 Off-site Item details Format Call Number Item Location Text TK7872.M3 P46 2004g pt.1 Off-site
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