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  • Ellipsometry and polarized light / R. M. A. Azzam and N. M. Bashara.

    • Text
    • Amsterdam ; New York : North-Holland Pub. Co. ; New York : sale distributors for the U. S.A. and Canada, Elsevier North-Holland, 1977.
    • 1977
    • 1 Item
    FormatCall NumberItem Location
    Text JSD 77-957Offsite

  • Radiovolnova︠i︡a ėllipsometri︠i︡a / V.A. Konev, E.M. Kuleshov, N.N. Punʹko.

    • Text
    • Minsk : "Nauka i tekhnika", 1985.
    • 1985
    • 1 Item
    FormatCall NumberItem Location
    Text *QH 88-11568Offsite

  • Ėllipsometri︠i︡a--teori︠i︡a, metody, prilozheni︠i︡a / otvetstvennye redaktory A.V. Rzhanov, L.A. Ilʹina.

    • Text
    • Novosibirsk : Izd-vo "Nauka", Sibirskoe otd-nie, 1987.
    • 1987
    • 1 Item
    FormatCall NumberItem Location
    Text *QH 90-9470Offsite

  • Handbook of the polariscope and its pracitcal applications / adapted from the German editon of H. Landolt, by D. C. Robb and V. H. Veley; with an appendix by I. Steiner.

    • Text
    • London : Macmillan, 1882.
    • 1882
    • 1 Item
    FormatCall NumberItem Location
    Text PER (Landolt, H. Handbook of the polariscope)Offsite

  • Ellipsometric study of InGaAs MODFET material [microform] / S.A. Alterovitz ... [et al.].

    • Text
    • [Washington, DC] : National Aeronautics and Space Administration ; [Springfield, Va. : For sale by the National Technical Information Service, 1990]
    • 1991-1990

  • A New technique for oil backstreaming contamination measurements [microform] / S.A. Alterovitz ... [et al.].

    • Text
    • [Washington, DC] : National Aeronautics and Space Administration ; [Springfield, Va. : For sale by the National Technical Information Service, 1991]
    • 1991

  • Preparation and certification of SRM-2530, ellipsometric parameters [delta] and [psi] and derived thickness and refractive index of a silicon dioxide layer on silicon / G.A. Candela ... [et al.].

    • Text
    • Gaithersburg, MD : U.S. Dept. of Commerce, National Institute of Standards and Technology, [1988]
    • 1988

  • A software program for aiding the analysis of ellipsometric measurements, simple models [microform] / J. F. Marchiando.

    • Text
    • Gaithersburg, MD : U.S. Dept. of Commerce, National Institute of Standards and Technology, 1989.
    • 1989

  • Development of Si[1-x]Ge[x] technology for microwave sensing applications [microform] / Rafael A. Mena ... [et al.].

    • Text
    • [Washington, DC] : National Aeronautics and Space Administration ; [Springfield, Va. : National Technical Information Service, distributor, 1993]
    • 1993

  • Study of InGaAs based MODEFET structures using variable angle spectroscopic ellipsometry [microform] / S.A. Alterovitz ... [et al.].

    • Text
    • [Washington, DC] : National Aeronautics and Space Administration ; [Springfield, Va. : For sale by the National Technical Information Service, 1991]
    • 1991

  • [Sputter process investigation] [microform] : [material and environment interaction processes investigation] : final technical report / John R. Williams, Michael J. Bozack, and Albert T. Fromhold.

    • Text
    • [Washington, DC : National Aeronautics and Space Administration ; Springfield, Va. : National Technical Information Service, distributor, 1994]
    • 1994

  • Materials, structures, and devices for high-speed electronics [microform] : final report, grant period, January 1, 1981 - December 31, 1992 / by John A. Woollam, principal investigator and Paul G. Snyder, co-investigator.

    • Text
    • [Washington, DC : National Aeronautics and Space Administration ; Springfield, Va. : National Technical Information Service, distributor, 1992]
    • 1992

  • Ellipsometric study of YBa₂Cu₃O₇₋x laser ablated and co-evaporated films [microform] / S.A. Alterovitz ... [et al.] ; prepared for the International Conference on Electronic Materials 1990, sponsored by the Materials Research Society, Newark, New Jersey, September 17-19, 1990.

    • Text
    • [Washington, D.C.] : NASA ; [Springfield, Va. : For sale by the National Technical Information Service, 1990?]
    • 1990

  • The results of an interlaboratory study of ellipsometric measurements of thin film silicon dioxide on silicon [microform] / Barbara J. Belzer and David L. Blackburn.

    • Text
    • Gaithersburg, MD : U.S. Dept. of Commerce, Technology Administration, National Institute of Standards and Technology, 1997.
    • 1997

  • Characterization of SiGe/Ge heterostructures and graded layers using variable angle spectroscopic ellipsometry [microform] / A.R. Heyd ... [et al.].

    • Text
    • [Washington, D.C. : National Aeronautics and Space Administration ; Springfield, Va. : National Technical Information Service, distributor, 1996]
    • 1996

  • Characterization of high Ge content SiGe heterostructures and graded alloy layers using spectroscopic ellipsometry [microform] / A.R. Heyd, S.A. Alterovitz, E.T. Croke.

    • Text
    • [Washington, D.C. : National Aeronautics and Space Administration ; Springfield, Va. : National Technical Information Service, distributor, 1995]
    • 1995

  • Band-gap engineering in sputter deposited amorphous/microcrystalline ScxGa1-xN [microform] / Mark E. Little, Martin E. Kordesch.

    • Text
    • Hampton, Va. : National Aeronautics and Space Administration, Langley Research Center ; Hanover, MD : Available from NASA Center for AeroSpace Information, [2002]
    • 2001
    • 1 Resource

    Available Online

    http://purl.access.gpo.gov/GPO/LPS39070

  • Real time optics of the growth of textured silicon films in photovoltaics : final technical report, 1 August 1999-12 August 2002 / R.W. Collins and C.R. Wronski.

    • Text
    • Golden, Colo. : National Renewable Energy Laboratory, [2003]
    • 2003
    • 1 Resource

    Available Online

    https://purl.fdlp.gov/GPO/LPS48807

  • Infrared ellipsometry on semiconductor layer structures : phonons, plasmons, and polaritons / Mathias Schubert.

    • Text
    • Berlin ; New York : Springer, 2004.
    • 2004
    • 2 Items
    FormatCall NumberItem Location
    Text JSE 05-73Offsite
    FormatCall NumberItem Location
    Text JSE 06-1265Offsite

  • Manufacturing process optimization to improve stability, yield, and efficiency of CdS/CdTe PV devices : final report, December 2004 - January 2009 / W.S. Sampath, A. Enzenroth, and K. Barth.

    • Text
    • Golden, Colo. : National Renewable Energy Laboratory, [2009]
    • 2009
    • 1 Resource

    Available Online

    https://purl.fdlp.gov/GPO/LPS113111

  • Enhancement of aviation fuel thermal stability characterization through application of ellipsometry / Samuel Tucker Browne ... [and others].

    • Text
    • Cleveland, Ohio : National Aeronautics and Space Administration, Glenn Research Center, [2012]
    • 2011
    • 1 Resource

    Available Online

    https://purl.fdlp.gov/GPO/gpo26312

  • A Fortran program for analysis of ellipsometer measurements / Frank L. McCrackin.

    • Text
    • Gaithersburg, MD : U.S. Dept. of Commerce, National Institute of Standards and Technology, 1969.
    • 1969
    • 1 Resource

    Available Online

    https://purl.fdlp.gov/GPO/gpo102801

  • A user's guide to ellipsometry / Harland G. Tompkins.

    • Text
    • Boston : Academic Press, [1993], ©1993.
    • 1993-1993
    • 1 Item
    FormatCall NumberItem Location
    Text QC443 .T65 1993Off-site

  • Polarimetry and ellipsometry : 20-23 May, 1996, Kazimierz Dolny, Poland / Maksymilian Pluta, Tomasz R. Woliński, chairs/editors ; Mariusz Szyjer, co-editor ; organized by, SPIE Poland Chapter, Institute of Applied Optics, Warsaw (Poland) ; sponsored by SPIE--the International Society for Optical Engineering, State Committee for Scientific Research (Poland).

    • Text
    • Bellingham, Wash., USA : SPIE, [1997], ©1997.
    • 1997-1997
    • 1 Item
    FormatCall NumberItem Location
    Text QC373.P7 P642 1996gOff-site

  • Spectroscopic ellipsometry and reflectometry : a user's guide / Harland G. Tompkins, William A. McGahan.

    • Text
    • New York : Wiley, [1999], ©1999.
    • 1999-1999
    • 1 Item
    FormatCall NumberItem Location
    Text QC443 .T63 1999Off-site

  • Handbook of ellipsometry / edited by Harland G. Tompkins and Eugene A. Irene.

    • Text
    • Norwich, NY : William Andrew Pub. ; Heidelberg, Germany : Springer, [2005], ©2005.
    • 2005-2005
    • 2 Items
    FormatCall NumberItem Location
    Text Off-site
    Not available - Please for assistance.
    FormatCall NumberItem Location
    Text QC443 .H26 2005Off-site

  • Modulated ellipsometric spectroscopy and its application to surface studies in electrochemistry / by Wilma Jean Horkans.

    • Text
    • 1973.
    • 1973
    • 1 Item
    FormatCall NumberItem Location
    Text F b3394Off-site

  • Ellipsometry for industrial applications / Karl Riedling.

    • Text
    • Wien ; New York : Springer-Verlag, [1988], ©1988.
    • 1988-1988
    • 1 Item
    FormatCall NumberItem Location
    Text TK7872.T55 R54 1988Off-site

  • Optical polarimetry : instrumentation & applications : August 23-24, 1977, San Diego, California : presented by the Society of Photo-optical Instrumentation Engineers in conjunction with the IEEE Computer Society International Optical Computing Conference 77 / R. M. A. Azzam, David L. Coffeen, editors.

    • Text
    • Bellingham, Wash. : The Society, 1977.
    • 1977
    • 1 Item
    FormatCall NumberItem Location
    Text QC373.P7 O67Off-site

  • Optical and x-ray studies of critical phenomena in thin liquid crystal films / by Suzanne Marie Amador.

    • Text
    • 1989.
    • 1989
    • 1 Item
    FormatCall NumberItem Location
    Text ThesisOff-site

  • Polarimetry and ellipsometry : 20-23 May, 1996, Kazimierz Dolny, Poland / Maksymilian Pluta, Tomasz R. Woliński, chairs/editors ; Mariusz Szyjer, co-editor ; organized by SPIE Poland Chapter, Institute of Applied Optics, Warsaw (Poland) ; sponsored by SPIE--the International Society for Optical Engineering, State Committee for Scientific Research (Poland).

    • Text
    • Bellingham, Wash., USA : SPIE, c1997.
    • 1997
    • 1 Item
    FormatCall NumberItem Location
    Text TA1505 .P762 vol.3094Off-site

  • Ellipsometry and polarized light / R. M. A. Azzam and N. M. Bashara.

    • Text
    • Amsterdam ; New York : North-Holland Pub. Co. ; New York : sole distributors for the U.S.A. and Canada, Elsevier North-Holland, 1977.
    • 1977
    • 1 Item
    FormatCall NumberItem Location
    Text QC443.A96Off-site

  • Handbook of the polariscope and its practical applications / adapted from the German editon of H. Landolt, by D. C. Robb and V. H. Veley; with an appendix by I. Steiner.

    • Text
    • London : Macmillan, 1882.
    • 1882
    • 1 Item
    FormatCall NumberItem Location
    Text 8273.559Off-site

  • Polarimetry and ellipsometry : 20-23 May, 1996, Kazimierz Dolny, Poland / Maksymilian Pluta, Tomasz R. Woliński, chairs/editors ; Mariusz Szyjer, co-editor ; organized by SPIE Poland Chapter, Institute of Applied Optics, Warsaw (Poland) ; sponsored by SPIE--the International Society for Optical Engineering, State Committee for Scientific Research (Poland).

    • Text
    • Bellingham, Wash., USA : SPIE, c1997.
    • 1997
    • 1 Item
    FormatCall NumberItem Location
    Text TA1505 .P762 vol.3094Off-site

  • Ellipsometry and polarized light / R. M. A. Azzam and N. M. Bashara.

    • Text
    • Amsterdam ; New York : North-Holland Pub. Co. ; New York : sole distributors for the U.S.A. and Canada, Elsevier North-Holland, 1977.
    • 1977
    • 1 Item
    FormatCall NumberItem Location
    Text QC443 .A96Off-site

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