Research Catalog

  • Kristallokhimi︠i︡a sili︠t︡sidov i germanidov. Pod red. G. V. Samsonova.

    • Text
    • Moskva, "Metallurgi︠i︡a," 1971.
    • 1971
    • 1 Item
    FormatCall NumberItem Location
    Text *QH 75-4731Offsite
  • Silicides for VLSI applications / S.P. Murarka.

    • Text
    • New York : Academic Press, 1983.
    • 1983
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 83-950Offsite
  • Silicides, germanides, and their interfaces : symposium held November 29-December 2, 1993, Boston, Massachusetts, U.S.A. / editors, Robert W. Fathauer ... [et al.].

    • Text
    • Pittsburgh, Pa. : Materials Research Society, c1994.
    • 1994
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 95-1841Offsite
  • Phase transformations in thin films : thermodynamics and kinetics : symposium held April 13-15, 1993, San Francisco, California, U.S.A. / editors M. Atzmon ... [et al.].

    • Text
    • Pittsburgh, Pa. : Materials Research Society, c1993.
    • 1993
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 95-171Offsite
  • High temperature silicides and refractory alloys : symposium held November 29-December 3, 1993, Boston, Massachusetts, U.S.A. / editors, C.L. Briant ... [et al.].

    • Text
    • Pittsburgh, Pa. : Materials Research Society, c1994.
    • 1994
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 94-1561Offsite
  • Properties of metal silicides / edited by Karen Maex and Marc van Rossum.

    • Text
    • Stevenage : INSPEC, c1995.
    • 1995
    • 1 Item
    FormatCall NumberItem Location
    Text JSF 96-25Offsite
  • Borides, silicides, and phosphides; a critical review of their preparation, properties and crystal chemistry [by] Bertil Aronsson, Torsten Lundström [and] Stig Rundqvist.

    • Text
    • London, Methuen; New York, Wiley [1965]
    • 1965
    • 1 Item
    FormatCall NumberItem Location
    Text PND (Aronsson, B. Borides, silicides, and phosphides)Offsite
  • Hartstoffe und Hartmetalle, von R. Kieffer und P. Schwarzkopf unter Mitarbeit von F. Benesovsky und W. Leszynski.

    • Text
    • Wien, Springer-Verlag, 1953.
    • 1953
    • 1 Item
    FormatCall NumberItem Location
    Text VIB (Kieffer, R. Hartstoffe und Hartmetalle)Offsite
  • Hartstoffe von R. Kieffer und F. Benesovsky.

    • Text
    • Wien, Springer-Verlag, 1963.
    • 1963
    • 1 Item
    FormatCall NumberItem Location
    Text VIB (Kieffer, R. Hartstoffe)Offsite
  • Semiconducting silicides / [edited by] Victor E. Borisenko.

    • Text
    • Berlin ; New York : Springer, c2000.
    • 2000
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 00-688Offsite
  • Advanced interconnects and contacts : symposium held April 5-7, 1999, San Francisco, California, U.S.A. / editors, Daniel C. Edelstein ... [et al.].

    • Text
    • Warrendale, Pa. : Materials Research Society, c1999.
    • 1999
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 01-1714Offsite
  • High temperature creep and oxidation resistant chromium silicide matrix alloy containing molybdenum [microform] / inventor, Sai V. Raj.

    • Text
    • [Washington, DC : National Aeronautics and Space Administration, 1993]
    • 1993
  • Narrow bandgap semiconducting silicides [microform] : intrinsic infrared detectors on a silicon chip : final report / principal investigator, John E. Mahan.

    • Text
    • [Washington, DC : National Aeronautics and Space Administration ; Springfield, Va. : National Technical Information Service, distributor, 1990]
    • 1990
  • High temperature composites [microform] / M.V. Nathal.

    • Text
    • [Washington, DC] : National Aeronautics and Space Administration ; [Springfield, Va. : National Technical Information Service, distributor, 1995]
    • 1995
  • Oxidation and emittance studies of coated Mo-Re [microform] / David E. Glass.

    • Text
    • Hampton, Va. : National Aeronautics and Space Administration, Langley Research Center ; [Springfield, Va. : National Technical Information Service, distributor, 1997]
    • 1997
  • Silicide technology for integrated circuits / edited by Lih J. Chen.

    • Text
    • London : Institution of Electrical Engineers, c2004.
    • 2004
    • 1 Item
    FormatCall NumberItem Location
    Text JSF 05-424Offsite
  • Comparison of the thermal expansion behavior of several intermetallic silicide alloys between 293 and 1523 K / S.V. Raj.

    • Text
    • Cleveland, Ohio : National Aeronautics and Space Administration, Glenn Research Center, May 2014.
    • 2014-5
    • 1 Resource

    Available Online

    https://purl.fdlp.gov/GPO/gpo52769
  • An investigation of the borides and the silicides ...

    • Text
    • Madison, Wis., 1906.
    • 1906-
    • 1 Item
    FormatCall NumberItem Location
    Text PND p.v. 18 no. 1-17Schwarzman Building - General Research Room 315

    Available - Can be used on site. Please visit New York Public Library - Schwarzman Building to submit a request in person.

  • Phase transformations in thin films : thermodynamics and kinetics : symposium held April 13-15, 1993, San Francisco, California, U.S.A. / editors M. Atzmon [and others].

    • Text
    • Pittsburgh, Pa. : Materials Research Society, [1993], ©1993.
    • 1993-1993
    • 1 Item
    FormatCall NumberItem Location
    Text QC176.9.M84 P48 1993Off-site
  • High temperature silicides and refractory alloys : symposium held November 29-December 2, 1993, Boston, Massachusetts, U.S.A. / editors, C.L. Briant [and others].

    • Text
    • Pittsburgh, PA : Materials Research Society, 1994.
    • 1994
    • 1 Item
    FormatCall NumberItem Location
    Text TA418.26 .M33 1993Off-site
  • Silicides, germanides, and their interfaces : Symposium D of the 1993 Fall Meeting of the Materials Research Society, held from November 29 through December 2, 1993 / editors, Robert W. Fathauer [and others].

    • Text
    • Pittsburgh, PA : Materials Research Society, 1994.
    • 1994
    • 1 Item
    FormatCall NumberItem Location
    Text TA418.7 .M38 1994Off-site
  • Silicide thin films : fabrication, properties, and applications : symposium held November 27-30, 1995, Boston, Massachusetts, U.S.A. / editors, Raymond T. Tung [and others].

    • Text
    • Pittsburgh : Materials Research Society, [1996], ©1996.
    • 1996-1996
    • 1 Item
    FormatCall NumberItem Location
    Text TA418.9.T45 S55 1996Off-site
  • Properties of metal silicides / edited by Karen Maex and Marc van Rossum.

    • Text
    • Stevenage : INSPEC, [1995], ©1995.
    • 1995-1995
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.15.S54 P76 1995gOff-site
  • Properties of intermetallic alloys.

    • Text
    • West Lafayette, Ind. : Metals Information Analysis Center, Center for Information and Numerical Data Analysis and Synthesis, Purdue University, [1994-1995], ©1994-1995.
    • 1994-1995
    • 3 Items
    FormatCall NumberItem Location
    Text TA483 .P77 1994 v.3Off-site
    FormatCall NumberItem Location
    Text TA483 .P77 1994 v.2Off-site
    FormatCall NumberItem Location
    Text TA483 .P77 1994 v.1Off-site
  • Advanced interconnects and contacts : symposium held April 5-7, 1999, San Francisco, California, U.S.A. / editors, Daniel C. Edelstein [and others].

    • Text
    • Warrendale, Pa. : Materials Research Society, [1999], ©1999.
    • 1999-1999
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.85 .A34817 1999Off-site
  • Semiconducting silicides / [edited by] Victor E. Borisenko.

    • Text
    • Berlin ; New York : Springer, [2000], ©2000.
    • 2000-2000
    • 1 Item
    FormatCall NumberItem Location
    Text QC611.8.S5 S46 2000Off-site
  • Borides, silicides, and phosphides ; a critical review of their preparation, properties and crystal chemistry / [by] Bertil Aronsson, Torsten Lundström [and] Stig Rundqvist.

    • Text
    • London : Methuen; New York : Wiley, [1965]
    • 1965
    • 1 Item
    FormatCall NumberItem Location
    Text QD181.B1 Ar67Off-site
  • Silicides : fundamentals and applications / proceedings of the 16th Course of the International School of Solid State Physics, Erice, Italy, 5-16 June 1999 ; editors, Leo Miglio & Francois d'Heurle.

    • Text
    • Singapore ; River Edge, NJ : World Scientific, [2000], ©2000.
    • 2000-2000
    • 1 Item
    FormatCall NumberItem Location
    Text QD181.S6 C68 1999gOff-site
  • Gate stack and silicide issues in silicon processing : symposium held April 25-27, 2000, San Francisco, California, U.S.A. / editors L.A. Clevenger [and others].

    • Text
    • Warrendale, Pa. : Materials Research Society, [2001], ©2001.
    • 2001-2001
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874.76 .G38 2001Off-site
  • Gate stack and silicide issues in silicon processing II : symposium held April 17-19, 2001, San Francisco, California, U.S.A. / editors, S.A. Campbell [and others].

    • Text
    • Warrendale, Pa. : Materials Research Society, [2002], ©2002.
    • 2002-2002
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874.76 .G3823 2002Off-site
  • CMOS gate-stack scaling-- materials, interfaces and reliability implications : symposium held April 14-16, 2009 / editors, Alexander A. Demkov ... [et al.].

    • Text
    • 2009
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.99.M44 C1563 2009gOff-site
  • Silicide thin films : fabrication, properties, and application : Symposium held November 27-30, 1995, Boston, Massachusetts, USA / editors, Ray Tung ... [et al.].

    • Text
    • Pittsburgh : Materials Research Society, c1996.
    • 1996
    • 1 Item
    FormatCall NumberItem Location
    Text TA418.9.T45 S55 1996Off-site
  • Properties of intermetallic alloys / James Payne and Pramod D. Desai.

    • Text
    • West Lafayette, Ind. : Metals Information Analysis Center, Center for Information and Numerical Data Analysis and Synthesis, Purdue University, c1994-
    • 1994-present
    • 3 Items
    FormatCall NumberItem Location
    Text TA483 .P77 1994 vol.3Off-site
    FormatCall NumberItem Location
    Text TA483 .P77 1994 vol.2Off-site
    FormatCall NumberItem Location
    Text TA483 .P77 1994 vol.1Off-site
  • PC-based database on the properties of intermetallic alloys [electronic resource] : aluminides, silicides, beryllides, and miscellaneous compounds / Department of Defense Metals Information Analysis Center, Center for Information and Numerical Data Analysis and Synthesis.

    • Multimedia
    • West Lafayette, IN : MIAC/CINDAS, c1996.
    • 1996
    • 1 Item
    FormatCall NumberItem Location
    Multimedia COMPUTER FILE 7 January 1996Off-site
  • Borides, silicides, and phosphides; a critical review of their preparation, properties and crystal chemistry [by] Bertil Aronsson, Torsten Lundström [and] Stig Rundqvist.

    • Text
    • London, Methuen; New York, Wiley [1965]
    • 1965
    • 1 Item
    FormatCall NumberItem Location
    Text QD181.B1A7 1965Off-site
  • Hartstoffe von R. Kieffer und F. Benesovsky.

    • Text
    • Wien, Springer-Verlag, 1963.
    • 1963
    • 1 Item
    FormatCall NumberItem Location
    Text 93934.521Off-site
  • An investigation of the borides and the silicides ...

    • Text
    • Madison, Wis., 1906.
    • 1906
    • 1 Item
    FormatCall NumberItem Location
    Text 8360.957Off-site
  • Silicides for VLSI applications / S.P. Murarka.

    • Text
    • Orlando : Academic Press, 1983.
    • 1982
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.15.S54 M87 1983Off-site
  • An investigation of the borides and the silicides / By Oliver Patterson Watts.

    • Text
    • Madison, Wis., 1906.
    • 1906
  • Phase transformations in thin films : thermodynamics and kinetics : symposium held April 13-15, 1993, San Francisco, California, U.S.A. / editors M. Atzmon ... [et al.].

    • Text
    • Pittsburgh, Pa. : Materials Research Society, c1993.
    • 1993
    • 1 Item
    FormatCall NumberItem Location
    Text QC176.9.M84 P48 1993Off-site
  • Silicide thin films--fabrication, properties, and application : symposium held November 27-30, 1995, Boston, Massachusetts, U.S.A. / editors, Ray Tung [and others].

    • Text
    • Pittsburgh : Materials Research Society, ©1996.
    • 1996
    • 1 Item
    FormatCall NumberItem Location
    Text TA418.9.T45 S55 1996Off-site
  • Properties of intermetallic alloys / James Payne and Pramod D. Desai.

    • Text
    • West Lafayette, Ind. : Metals Information Analysis Center, Center for Information and Numerical Data Analysis and Synthesis, Purdue University, c1994-
    • 1994-present
    • 2 Items
    FormatCall NumberItem Location
    Text TA483 .P77 1994 vol.1Off-site
    FormatCall NumberItem Location
    Text TA483 .P77 1994 vol.2Off-site
  • Borides, silicides, and phosphides; a critical review of their preparation, properties and crystal chemistry [by] Bertil Aronsson, Torsten Lundström [and] Stig Rundqvist.

    • Text
    • London, Methuen; New York, Wiley [1965]
    • 1965
    • 1 Item
    FormatCall NumberItem Location
    Text QD181.B1 A7 1965Off-site
  • Silicides for VLSI applications / S.P. Murarka.

    • Text
    • New York : Academic Press, 1983.
    • 1983
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.15.S54 M87 1983Off-site

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