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Displaying 1-10 of 10 results for author "Blais, Phillip D."
Submicron lithography / Phillip D. Blais, chairman/editor ; in cooperation with the International Society for Hybrid Microelectronics, the Northern California Microphotomask/Masking Working Group, the Materials Research Society, March 29-30, 1982, Santa Clara, California.
- Text
- Bellingham, Wash. : International Society for Optical Engineering, 1982.
- 1982
- 1 Item
Item details Format Call Number Item Location Text TK7874 .S85 1982 Off-site Electron-beam, x-ray, & ion-beam techniques for submicrometer lithographies V : 11-12 March 1986, Santa Clara, California / Phillip D. Blais, chairman/editor.
- Text
- Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, c1986.
- 1986
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E43 Off-site Electron-beam, X-ray, and ion-beam lithographies VI : 5-6 March 1987, Santa Clara, California / Phillip D. Blais, chair/editor.
- Text
- Bellingham, Wash. : SPIE--the International Society for Optical Engineering, 1987.
- 1987
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E4775 1987g Off-site Electron-beam, x-ray, and ion-beam techniques for submicron lithographies II : March 14-15, 1983, Santa Clara, California / Phillip D. Blais, chairman/editor ; sponsored by SPIE--The International Society for Optical Engineering in cooperation with National Bureau of Standards, International Society for Hybrid Microelectronics, Northern California Microphotomask/Masking Working Group.
- Text
- Bellingham, Wash. : SPIE--The International Society for Optical Engineering, c1983.
- 1983
- 1 Item
Item details Format Call Number Item Location Text TR940 .E43 Off-site Electron-beam, x-ray, & ion-beam techniques for submicrometer lithographies V : 11-12 March 1986, Santa Clara, California / Phillip D. Blais, chairman/editor.
- Text
- Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, c1986.
- 1986
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E434 Off-site Electron-beam, X-ray, and ion-beam lithographies VI : 5-6 March 1987, Santa Clara, California / Phillip D. Blais, chair/editor.
- Text
- 1987
- 1 Item
Item details Format Call Number Item Location Text TK7874.E435 Off-site Submicron lithography : March 29-30, 1982, Santa Clara, California / Phillip D. Blais, chairman-editor ; in cooperation with the International Society for Hybrid Microelectronics, the Northern California Microphotomask/Masking Working Group, the Materials Research Society.
- Text
- 1982
- 1 Item
Item details Format Call Number Item Location Text TK7874 .S82 Off-site Electron-beam, x-ray, & ion-beam techniques for submicrometer lithographies V : 11-12 March 1986, Santa Clara, California / Phillip D. Blais, chairman/editor.
- Text
- Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, c1986.
- 1986
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E434 Off-site Electron-beam, X-ray, and ion-beam lithographies VI : 5-6 March 1987, Santa Clara, California / Phillip D. Blais, chair/editor.
- Text
- Bellingham, Wash. : SPIE--the International Society for Optical Engineering, 1987.
- 1987
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E435 Off-site Submicron lithography : March 29-30, 1982, Santa Clara, California / Phillip D. Blais, chairman-editor ; in cooperation with the International Society for Hybrid Microelectronics, the Northern California Microphotomask/Masking Working Group, the Materials Research Society.
- Text
- Bellingham, Wash. : SPIE--the International Society for Optical Engineering, c1982.
- 1982
- 1 Item
Item details Format Call Number Item Location Text TK7874 .S82 Off-site
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