Research Catalog

  • Proceedings. Edited by F. A. Glaski.

    • Text
    • [Hinsdale, Ill., American Nuclear Society, 1972]
    • 1972
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 73-106Offsite
  • Chemical vapor deposition; [papers]. Edited by Gene F. Wakefield [and] John M. Blocher, Jr.

    • Text
    • Princeton, N.J., Electrothermics and Metallurgy Division, Electrochemical Society [1973]
    • 1973
    • 1 Item
    FormatCall NumberItem Location
    Text JSD 74-981Offsite
  • Vapor deposition; prepared by the editors of Chemical engineering progress.

    • Text
    • New York, 1966.
    • 1966
  • Proceedings of the Conference on Chemical Vapor Deposition, fifth international conference, 1975 / edited by John M. Blocher, Jr., Hans E. Hintermann, Lou H. Hall.

    • Text
    • Princeton, N.J. : Electrothermics and Metallurgy Division, Electrochemical Society, c1975.
    • 1975
    • 1 Item
    FormatCall NumberItem Location
    Text JSD 76-630Offsite
  • Proceedings of the Sixth International Conference on Chemical Vapor Deposition, 1977 / edited by Lee F. Donaghey, P. Rai-Choudhury, Richard N. Tauber.

    • Text
    • Princeton, N.J. : Electrochemical Society, c1977.
    • 1977
    • 1 Item
    FormatCall NumberItem Location
    Text JSD 78-384Offsite
  • Proceedings of the Seventh International Conference on Chemical Vapor Deposition, 1979 / edited by Thomas O. Sedgwick, Hans Lydtin.

    • Text
    • Princeton, N.J. : Electrochemical Society, c1979.
    • 1979
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 80-836Offsite
  • Chemical vapor deposition, 1960-1980 : a bibliography / edited by Donald T. Hawkins.

    • Text
    • New York : IFI Plenum, c1981.
    • 1981
    • 1 Item
    FormatCall NumberItem Location
    Text JSF 82-17Offsite
  • Chemical vapor deposition : proceedings of the Eighth International Conference on Chemical Vapor Deposition, 1981 / edited by John M. Blocher, Guy E. Vuillard, [and] Georg Wahl.

    • Text
    • Pennington, N.J. : Electrochemical Society, c1981.
    • 1981
    • 1 Item
    FormatCall NumberItem Location
    Text JSD 84-317Offsite
  • Annual technical conference proceedings / Society of Vacuum Coaters.

    • Text
    • Washington, D.C. : The Society
    • 198-1981
    • 1 Item
    FormatCall NumberItem Location
    Text JSP 84-189 v. 24 (1981)Offsite
  • Proceedings of the Third European Conference on Chemical Vapor Deposition, 1980, April 16-18, Neuchatel, Switzerland / edited by H.E Hintermann.

    • Text
    • Neuchâtel, Switzerland : Laboratoire suisse de recherches horlogères, 1980.
    • 1980
    • 1 Item
    FormatCall NumberItem Location
    Text JSD 86-240Offsite
  • Applications of plasma processes to VLSI technology / edited by Takuo Sugano ; translated by Hyo-gun Kim.

    • Text
    • New York : John Wiley & Sons, c1985.
    • 1985
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 86-2282Offsite
  • Beam-induced chemical processes : proceedings of Symposium D, 1985 Fall Meeting of the Materials Research Society, December 2-6, 1985, Boston Marriott Hotel at Copley Place, Boston, Massachusetts : extended abstracts / edited by R.J. von Gutfield, J.E. Greene, H. Schlossberg ; principal symposium support, Air Force Office of Scientific Research ; supplemental support, IBM Corporation.

    • Text
    • Pittsburgh : Materials Research Society, c1985.
    • 1985
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 88-2478Offsite
  • Proceedings of the Tenth International Conference on Chemical Vapor Deposition, 1987 / edited by G.W. Cullen ; consulting editor, J.M. Blocher, Jr. ; subject editors, D. Allred ... [et al.].

    • Text
    • Pennington, NJ (10 S. Main St., Pennington 08534-2896) : Electrochemical Society, c1987.
    • 1987
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 88-3240Offsite
  • Proceedings of the ... annual technical conference / Society of Vacuum Coaters.

    • Text
    • [Washington, D.C.] : The Society, c1982-
    • 1982-present
    • 1 Item
    FormatCall NumberItem Location
    Text JSP 88-309 1983Offsite
  • Thin films by chemical vapour deposition / C.E. Morosanu.

    • Text
    • Amsterdam ; New York : Elsevier ; Bucharest, Romania : Editura Tehnică, 1990.
    • 1990
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 90-1859Offsite
  • Rapid thermal annealing/chemical vapor deposition and integrated processing / symposium held April 25-28, 1989, San Diego, California, U.S.A. / editors, David Hodul ... [et al.].

    • Text
    • Pittsburgh, Pa. : Materials Research Society, c1989.
    • 1989
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 91-498Offsite
  • Chemical vapor deposition of refractory metals and ceramics : symposium held November 29-December 1, 1989, Boston, Massachusetts, U.S.A. / editors, Theodore M. Besmann, Bernard M. Gallois.

    • Text
    • Pittsburgh, Pa. : Materials Research Society, c1990.
    • 1990
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 91-2131Offsite
  • Photochemical vapor deposition / J.G. Eden.

    • Text
    • New York : Wiley, c1992.
    • 1992
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 92-1927Offsite
  • Rapid thermal and integrated processing : symposium held April 30-May 3, 1991, Anaheim, California, U.S.A. / editors, Jeffrey C. Gelpey ... [et al.].

    • Text
    • Pittsburgh, Pa. : Materials Research Society, c1991.
    • 1991
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 92-1805Offsite
  • Preparation of thin films / Joy George.

    • Text
    • New York : M. Dekker, c1992.
    • 1992
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 93-428Offsite
  • Chemical vapor deposition of refractory metals and ceramics II : symposium held December 4-6, 1991, Boston, Massachusetts, U.S.A. / editors, Theodore M. Besmann, Bernard M. Gallois, James W. Warren.

    • Text
    • Pittsburgh, Pa. : Materials Research Society, c1992.
    • 1992
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 93-741Offsite
  • Advanced metallization and processing for semiconductor devices and circuits--II : symposium held April 27-May 1, 1992, San Francisco, California, U.S.A. / editors, Avishay Katz ... [et al.].

    • Text
    • Pittsburgh, Pa. : Materials Research Society, c1992.
    • 1992
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 93-1360Offsite
  • Journal of chemical vapor deposition.

    • Text
    • Lancaster, PA : Technomic Pub., 1992-
    • 1992-present
    • 2 Items
    FormatCall NumberItem Location
    Text JSL 93-28 v. 1-2 (1992-1994)Offsite
    FormatCall NumberItem Location
    Text JSL 93-28 v. 3Offsite
  • Rapid thermal and integrated processing II : symposium held April 12-15, 1993, San Francisco, California, U.S.A. / editors, Jeffrey C. Gelpey ... [et al.].

    • Text
    • Pittsburgh, Pa. : Materials Research Society, c1993.
    • 1993
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 94-645Offsite
  • Metal-organic chemical vapor deposition of electronic ceramics : symposium held on November 29-December 3, 1993, at Boston, Massachusetts, U.S.A. / editors, Seshu B. Desu ... [et al.].

    • Text
    • Pittsburgh, Pa. : Materials Research Society, c1994.
    • 1994
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 95-868Offsite
  • Evolution of surface and thin film microstructure : symposium held November 30-December 4, 1992, Boston, Massachusetts, U.S.A. / editors, Harry A. Atwater ... [et al.].

    • Text
    • Pittsburgh, Pa. : Materials Research Society, c1993.
    • 1993
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 94-1476Offsite
  • Thin-film deposition : principles and practice / Donald L. Smith.

    • Text
    • New York : McGraw-Hill, c1995.
    • 1995
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 95-1179Offsite
  • Materials and processes for surface and interface engineering / edited by Yves Pauleau.

    • Text
    • Dordrecht ; Boston : Kluwer Academic Publishers, 1995.
    • 1995
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 95-1173Offsite
  • Chemical vapor deposition of refractory metals and ceramics III : symposium held November 28-30, 1994, Boston, Massachusetts, U.S.A. / editors, Bernard M. Gallois, Woo Y. Lee, Michael A. Pickering.

    • Text
    • Pittsburgh, Pa. : Materials Research Society, c1995.
    • 1995
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 95-1371Offsite
  • High vacuum production in the microelectronics industry / Pierre Duval.

    • Text
    • Amsterdam ; New York : Elsevier, 1988.
    • 1988
    • 1 Item
    FormatCall NumberItem Location
    Text JSF 96-576Offsite
  • Ergebnisse der Hochvakuumtechnik und der Physik dünner Schichten. Mit einem Geleitwort von W. Gerlach und Beiträgen von H. Adam [et al.].

    • Text
    • Stuttgart, Wissenschaftliche Verlagsgesellschaft, 1957.
    • 1957
    • 1 Item
    FormatCall NumberItem Location
    Text PCN (Auwarter, M. Ergebnisse der Hochvakuumtechnik) (1957)Offsite
  • Vacuum deposition of thin films / L. Holland ; with a foreword by S. Tolansky.

    • Text
    • New York, Wiley, 1958, c1956.
    • 1958-1956
    • 1 Item
    FormatCall NumberItem Location
    Text VID (Holland, L. Vacuum deposition of thin films)Offsite
  • Vapor deposition, edited by Carroll F. Powell, Joseph H. Oxley [and] John M. Blocher, Jr. Sponsored by the Electrochemical Society, New York.

    • Text
    • New York, Wiley [1966]
    • 1966-
    • 1 Item
    FormatCall NumberItem Location
    Text VID (Powell, C. F. Vapor deposition)Offsite
  • Vapor-plating: the formation of coatings by vapor-deposition techniques, by C. F. Powell, I. E. Campbell, and B. W. Gonser [of] Battelle Memorial Institute.

    • Text
    • New York, Wiley, c1955.
    • 1955
    • 1 Item
    FormatCall NumberItem Location
    Text VID (Powell, C. F. Vapor-plating)Offsite
  • Proceedings. Edited by A.C. Schaffhauser.

    • Text
    • [Hinsdale, Ill., American Nuclear Society] 1967.
    • 1967
    • 1 Item
    FormatCall NumberItem Location
    Text VID (Conference on Chemical Vapor Deposition of Refractory Metals, Alloys, and Compounds, Gatlinburg, Tenn., 1967. Proceedings)Offsite
  • Handbook of physical vapor deposition (PVD) processing : film formation, adhesion, surface preparation and contamination control / by Donald M. Mattox.

    • Text
    • Westwood, N.J. : Noyes Publications, c1998.
    • 1998
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 98-1335Offsite
  • Rapid thermal and integrated processing VII : symposium held April 13-15, 1998, San Francisco, California, U.S.A. / editors, Mehmet C. Öztürk ... [et al.].

    • Text
    • Warrendale, Pennsylvania: Materials Research Society, c1998.
    • 1998
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 99-1309Offsite
  • Physical vapor deposition of thin films / John E. Mahan.

    • Text
    • New York ; Chichester [England] : Wiley, c2000.
    • 2000
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 00-564Offsite
  • Handbook of chemical vapor depos[i]tion (CVD) : principles, technology, and applications / by Hugh O. Pierson.

    • Text
    • Norwich, N.Y : Noyes Publications/William Andrew Pub., c1999.
    • 1999
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 00-1032Offsite
  • Convection and chemistry effects in CVD, a 3-D analysis for silicon deposition [microform] / S.A. Gokoglu ... [et al.].

    • Text
    • [Washington, DC] : National Aeronautics and Space Administration ; [Springfield, Va. : For sale by the National Technical Information Service, 1989]
    • 1989-1989
  • Vapor phase deposition studies of phosphate esters on metal and ceramic surfaces [microform] / Douglas E. Deckman and Stephen M. Hsu, E. Erwin Klaus.

    • Text
    • Gaithersburg, MD : U.S. Dept. of Commerce, National Institute of Standards and Technology, [1988]
    • 1991-1988
  • Vacuum vapor deposition [microform] : a spinoff of space welding development / by R.M. Pooman.

    • Text
    • [Marshall Space Flight Center, Ala.] : National Aeronautics and Space Administration, George C. Marshall Space Flight Center ; [Springfield, VA : For sale by the National Technical Information Service, 1991]
    • 1991
  • Research on chemical vapor deposition processes for advanced ceramic coatings [microform] / principal investigator: Daniel E. Rosner.

    • Text
    • New Haven, CT : Yale University, Dept. of Chemical Engineering, High Temperature Chemical Reaction Engineering Laboratory ; [Washington, DC : National Aeronautics and Space Administration ; Springfield, Va. : National Technical Information Service, distributor, 1993]
    • 1993
  • Synthesis of high performance ceramic fibers by chemical vapor deposition for advanced metallics reinforcing [microform] / Vithal Revankar and Vladimir Hlavacek.

    • Text
    • Buffalo, N.Y. : Laboratory for Ceramic and Reaction Engineering, Dept. of Chemical Engineering, State University of New York at Buffalo ; Cleveland, OH : NASA Lewis Research Center, [1991]
    • 1991
  • Synthesis of multifilament silicon carbide fibers by chemical vapor deposition [microform] : final technical report ... / Vithal Revankar and Vladimir Hlavacek.

    • Text
    • Buffalo, N.Y. : Laboratory for Ceramic and Reaction Engineering, Dept. of Chemical Engineering, State University of New York at Buffalo ; Cleveland, OH : NASA Lewis Research Center, [1991]
    • 1991
  • Chemical vapor deposition / edited by Jong-Hee Park, T.S. Sudarshan.

    • Text
    • Materials Park, OH : ASM International, 2001.
    • 2001
    • 1 Item
    FormatCall NumberItem Location
    Text JSF 01-960Offsite
  • Buoyancy-driven heat transfer during application of a thermal gradient for the study of vapor deposition at low pressure using an ideal gas [microform] / D.O. Frazier ... [et al.].

    • Text
    • [Washington, D.C. : National Aeronautics and Space Administration, 1997]
    • 1997-1997
  • Fabrication of lightweight Si/SiC LIDAR mirrors [microform] / Jitendra S. Goela and Raymond L. Taylor.

    • Text
    • [Washington, D.C.] : National Aeronautics and Space Administration, Office of Management, Scientific and Technical Information Program ; [Springfield, Va. : For sale by the National Technical Information Service], 1991.
    • 1991
    • 1 Resource

    Available Online

    http://purl.access.gpo.gov/GPO/LPS67721
  • Experimental verification of corrosive vapor deposition rate theory in high veloicty burner rigs [microform] / Suleyman A. Gokoglu and Gilbert J. Santoro.

    • Text
    • [Cleveland, Ohio : National Aeronautics and Space Administration, Lewis Research Center, 1986]
    • 1986
  • Criteria for significance of simultaneous presence of both condensible vapors and aerosol particles on mass transfer (deposition) rates [microform] / Suleyman A. Gokoglu.

    • Text
    • [Cleveland, Ohio : National Aeronautics and Space Administration, Lewis Research Center, 1986]
    • 1986

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