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  • Film deposition by plasma techniques / Mitsuharu Konuma.

    • Text
    • Berlin ; New York : Springer-Verlag, c1992.
    • 1992
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 92-1216Offsite

  • Characterization of plasma-enhanced CVD processes : symposium held November 27-28, 1989, Boston, Massachusetts, U.S.A. / editors, Gerald Lucovsky, Dale E. Ibbotson, Dennis W. Hess.

    • Text
    • Pittsburgh, Pa. : Materials Research Society, c1990.
    • 1990
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 92-1919Offsite

  • Photons and low energy particles in surface processing : symposium held December 3-6, 1991, Boston, Massachusetts, U.S.A. / editors, Carol I.H. Ashby, James H. Brannon, Stella W. Pang.

    • Text
    • Pittsburgh, Pa. : Materials Research Society, c1992.
    • 1992
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 93-745Offsite

  • Synthetic diamond : emerging CVD science and technology / edited by Karl E. Spear, John P. Dismukes ; sponsored by the Electrochemical Society, Inc.

    • Text
    • New York : Wiley, c1994.
    • 1994
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 95-1420Offsite
    Request for On-site UseRequest Scan
    Not available - In use until 2024-01-27 - Please for assistance.

  • Materials and processes for surface and interface engineering / edited by Yves Pauleau.

    • Text
    • Dordrecht ; Boston : Kluwer Academic Publishers, 1995.
    • 1995
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 95-1173Offsite

  • Plasma processing of polymers : proceedings of the NATO Advanced Study Institute on Plasma Treatments and Deposition of Polymers, Acquafredda di Maratea, Italy, May 19-June 2, 1996 / edited by Riccardo d'Agostino, Pietro Favia, Francesco Fracassi.

    • Text
    • Boston : Kluwer Academic Publishers, 1998.
    • 1998
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 97-1736Offsite

  • Plasma deposition and treatment of polymers : symposium held November 30-December 2, 1998, Boston, Massachusetts, U.S.A. / editors, Wei William Lee, Riccardo d'Agostino, Michael R. Wertheimer.

    • Text
    • Warrendale, Pa. : Materials Research Society, c1999.
    • 1999
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 00-1602Offsite

  • An overview of CVD processes [microform] / S. Okamoto.

    • Text
    • Washington DC : National Aeronautics and Space Administration, [1986]
    • 1986

  • Numerical modeling tools for chemical vapor deposition [microform] / Thomas J. Jasinski and Edward P. Childs.

    • Text
    • [Washington, D.C.] : National Aeronautics and Space Administration, Office of Management, Scientific and Technical Information Program ; [Springfield, Va. : National Technical Information Service, distributor], 1992.
    • 1992

  • Real time optics of the growth of textured silicon films in photovoltaics : final technical report, 1 August 1999-12 August 2002 / R.W. Collins and C.R. Wronski.

    • Text
    • Golden, Colo. : National Renewable Energy Laboratory, [2003]
    • 2003
    • 1 Resource

    Available Online

    https://purl.fdlp.gov/GPO/LPS48807

  • Plasma techniques for film deposition / Mitsuharu Konuma.

    • Text
    • Harrow, U.K. : Alpha Science International, c2005.
    • 2005
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 06-939Offsite

  • Plasmas and polymers [electronic resource].

    • Text
    • [New York, N.Y.] : Kluwer Academic-Plenum-Human Sciences Press, -©2004.
    • 1996-2004
    • 2 Resources

    Available Online

    See All Available Online Resources

  • Film deposition by plasma techniques / Mitsuharu Konuma.

    • Text
    • Berlin ; New York : Springer-Verlag, 1992.
    • 1992
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.15.F5 K58 1992Off-site

  • Photons and low energy particles in surface processing : symposium held December 3-6, 1991, Boston, Massachusetts, U.S.A. / editors, Carol I.H. Ashby, James H. Brannon, Stella W. Pang.

    • Text
    • Pittsburgh, Pa. : Materials Research Society, [1992], ©1992.
    • 1992-1992
    • 1 Item
    FormatCall NumberItem Location
    Text TA418.7 .P46 1992Off-site

  • Hydrogenated amorphous silicon alloy deposition processes / Werner Luft and Y. Simon Tsuo.

    • Text
    • New York : Marcel Dekker, [1993], ©1993.
    • 1993-1993
    • 1 Item
    FormatCall NumberItem Location
    Text TK7872.T55 L84 1993Off-site

  • Synthetic diamond : emerging CVD science and technology / edited by Karl E. Spear, John P. Dismukes ; sponsored by the Electrochemical Society, Inc.

    • Text
    • New York : Wiley, [1994], ©1994.
    • 1994-1994
    • 1 Item
    FormatCall NumberItem Location
    Text TP873.5.D5 S96 1994Off-site

  • Plasma deposition of amorphous silicon-based materials / edited by Giovanni Bruno, Pio Capezzuto, Arun Madan.

    • Text
    • San Diego, CA : Academic Press, 1995.
    • 1995
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.99.A45 P55 1995Off-site

  • Materials and processes for surface and interface engineering / edited by Yves Pauleau.

    • Text
    • Dordrecht ; Boston : Kluwer Academic Publishers, 1995.
    • 1995
    • 1 Item
    FormatCall NumberItem Location
    Text TS695 .M37 1995Off-site

  • Plasma processing of polymers : proceedings of the NATO Advanced Study Institute on Plasma Treatments and Deposition of Polymers, Acquafredda di Maratea, Italy, May 19-June 2, 1996 / edited by Riccardo d'Agostino, Pietro Favia, Francesco Fracassi.

    • Text
    • Dortrecht ; Boston : Kluwer Academic Publishers, [1997], ©1997.
    • 1997-1997
    • 1 Item
    FormatCall NumberItem Location
    Text TP1092 .N38 1997Off-site

  • Plasma deposition and treatment of polymers : symposium held November 30-December 2, 1998, Boston, Massachusetts, U.S.A. / editors, Wei William Lee, Riccardo d'Agostino, Michael R. Wertheimer.

    • Text
    • Warrendale, Pa. : Materials Research Society, [1999], ©1999.
    • 1999-1999
    • 1 Item
    FormatCall NumberItem Location
    Text TA455.P58 P57 1999Off-site

  • Dusty plasmas : physics, chemistry, and technological impacts in plasma processing / edited by André Bouchoule.

    • Text
    • Chichester, England ; New York : Wiley, [1999], ©1999.
    • 1999-1999
    • 1 Item
    FormatCall NumberItem Location
    Text TA2020 .D88 1999Off-site

  • Lasers in synthesis, characterization, and processing of diamond : 6-9 October 1997, Tashkent, Uzbekistan / Alexander M. Prokhorov, chair ; Vitaly I. Konov, Mukhsin Kh. Ashurov, cochairs ; Vitaly I. Konov, Victor G. Ralchenko, editors ; sponsored by General Physics Institute, Russian Academy of Sciences (Russia) [and others] ; organized by General Physics Institute, Russian Academy of Sciences, Phonon Scientific Industrial Association (Uzbekistan), [and] SPIE Russia Chapter.

    • Text
    • Bellingham, Wash. : SPIE, [1997], ©1997.
    • 1997-1997
    • 1 Item
    FormatCall NumberItem Location
    Text TP873.5.D5 L37 1997gOff-site

  • Interconnect and contact metallization for ULSI : proceedings of the international symposium / editors, G.S. Mathad, H.S. Rathore, Y. Arita ; [sponsored by] Dielectric Science and Technology, Electronics, and Electrodeposition Divisions.

    • Text
    • Pennington, N.J. : Electrochemical Society, [2000], ©2000.
    • 2000-2000
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874.76 .S97 1999gOff-site

  • Plasma techniques for film deposition / Mitsuharu Konuma.

    • Text
    • Harrow, U.K. : Alpha Science International, [2005], ©2005.
    • 2005-2005
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.15.F5 K58 2005gOff-site

  • Characterization of plasma-enhanced CVD processes : symposium held Novermber 27-28, 1989, Boston, Massachusetts, U.S.A. / editors, Gerald Lucovsky, Dale E. Ibbotson, Dennis W. Hess.

    • Text
    • Pittsburgh, Pa. : Materials Research Society, [1990], ©1990.
    • 1990-1990
    • 1 Item
    FormatCall NumberItem Location
    Text TS695.15 .C47 1990Off-site

  • Beam technologies for integrated processing : report of the Committee on Beam Technologies: Opportunities in Attaining Fully-Integrated Processing Systems, National Materials Advisory Board, Commission on Engineering and Technical Systems, National Research Council.

    • Text
    • 1992
    • 1 Item
    FormatCall NumberItem Location
    Text TK7836.N37 1992Off-site

  • Rapid thermal and laser processing : 24-25 September 1992, San Jose, California / Dim-Lee Kwong, Heinrich G. Müller, chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering.

    • Text
    • Bellingham, Wash. : Society of Photo-optical Instrumentation Engineers, ©1993.
    • 1993
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.85 .R365 1993Off-site

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