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  • 11th annual Symposium on Photomask Technology : proceedings : September 25-27, 1991, Sunnyvale, California / sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology.

    • Text
    • Bellingham, Wash. : SPIE--the International Society for Optical Engineering, [1992], ©1992.
    • 1992-1992
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .S9434 1991Off-site

  • 12th annual Symposium on Photomask Technology and Management : proceedings : 23-24 September 1992, Sunnyvale, California / sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology.

    • Text
    • Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, [1993], ©1993.
    • 1993-1993
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .S9434 1992gOff-site

  • Photomask and X-ray mask technology II : 20-21 April 1995, Kawasaki City, Kanagawa, Japan / Hideo Yoshihara, editor ; sponsored by Photomask Japan ; BACUS ; SPIE--the International Society for Optical Engineering ; cosponsored by Japan Chapter of SPIE [and others].

    • Text
    • Bellingham, Wash. : SPIE, [1995], ©1995.
    • 1995-1995
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .P46 1995gOff-site

  • 15th Annual Symposium on Photomask Technology and Management : proceedings : 20-22 September, 1995, Santa Clara, California / Gilbert V. Sheldon, James N. Wiley, chairs/editors; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology, published by SPIE--The International society for Optical Engineering.

    • Text
    • Bellingham, Wash. : SPIE--the International Society for Optical Engineering, [1995], ©1995.
    • 1995-1995
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .S9274 1995gOff-site

  • Photomask and X-ray mask technology III : 18-19 April, 1996, Kawasaki City, Kanagawa, Japan / Hideo Yoshihara, editor ; sponsored by Photomask Japan, BACUS, SPIE--the International Society for Optical Engineering ; cosponsored by Japan Chapter of SPIE [and others].

    • Text
    • Bellingham, Wash. : SPIE, [1965], ©1965.
    • 1965-1965
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .P46 1996gOff-site

  • 16th Annual Symposium on Photomask Technology and Management : proceedings : 18-20 September, 1996, Redwood City, California / Gilbert V. Shelden, James A Reynolds, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology.

    • Text
    • Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, [1996], ©1996.
    • 1996-1996
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .S9274 1996gOff-site

  • Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan / Naoaki Aizaki, editor ; sponsored by Photomask Japan, BACUS, SPIE--the International Society for Optical Engineering ; supporting societies, the Japan Society of Applied Physics [and others] ; published by SPIE--the International Society for Optical Engineering.

    • Text
    • Bellingham, Washington : SPIE, [1997], ©1997.
    • 1997-1997
    • 1 Item
    FormatCall NumberItem Location
    Text TK7878 .P46 1997gOff-site

  • 17th Annual Symposium on Photomask Technology and Management : : 17-19 September, 1997, Redwood City, California / James A Reynolds, Brian J. Grenon, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology ; published by SPIE--the International Society for Optical Engineering.

    • Text
    • Bellingham, Washington : SPIE, [1998], ©1998.
    • 1998-1998
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .S9274 1997gOff-site

  • Photomask and X-ray mask technology VI : 13-14 April, 1999, Yokohama, Japan / Hiraoki Morimoto, editor ; sponsored by Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations, the Japan Society of Applied Physics [and others].

    • Text
    • Bellingham, Wash., USA : SPIE, [1999], ©1999.
    • 1999-1999
    • 1 Item
    FormatCall NumberItem Location
    Text TK7872.M3 P46 1999gOff-site

  • 18th Annual Symposium on Photomask Technology and Management : : 16-18 September, 1998, Redwood City, California / Brian J. Grenon, Frank E. Abboud, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology ; published by SPIE--the International Society for Optical Engineering.

    • Text
    • Bellingham, Washington : SPIE, [1998], ©1998.
    • 1998-1998
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .S9274 1998gOff-site

  • Photomask and X-ray mask technology V : 9-10 April, 1998, Kawasaki, Japan / Naoaki Aizaki, editor ; sponsored by Photomask Japan, BACUS, SPIE--the International Society for Optical Engineering ; supporting societies, the Japan Society of Applied Physics [and others] ; published by SPIE--the International Society for Optical Engineering.

    • Text
    • Bellingham, Washington : SPIE, [1998], ©1998.
    • 1998-1998
    • 1 Item
    FormatCall NumberItem Location
    Text TK7878 .P56 1998Off-site

  • 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98 : 16-17 November 1998, Munich-Unterhaching, Germany / Uwe Behringer, chair/editor ; organized by VDE/VDI-Society Microelectronics, Micro- and Precision Engineering (GMM) (Germany) [and] Institute for Microstructure Technology/Forschungszentrum Karlsruhe GmbH (Germany) ; cooperating organizations, SEMI-Europe--Semiconductor Equipment and Materials International, BACUS (USA), [and] SPIE--the International Society for Optical Engineering.

    • Text
    • Bellingham, Wash., USA : SPIE, [1999], ©1999.
    • 1999-1999
    • 1 Item
    FormatCall NumberItem Location
    Text TK7872.M3 E89 1998gOff-site

  • 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California / Frank E. Abboud, Brian J. Grenon, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology.

    • Text
    • Bellingham, Wash., USA : SPIE, [1999], ©1999.
    • 1999-1999
    • 2 Items
    FormatCall NumberItem Location
    Text TK7874 .S9438 1999g v.2Off-site
    FormatCall NumberItem Location
    Text TK7874 .S9438 1999g v.1Off-site

  • Photomask and next-generation lithography mask technology VII : 12-13 April 2000, Yokohama, Japan / Hiroaki Morimoto, editor ; sponsored by Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for the symposium, Japan Society of Applied Physics, Japan Society for Precision Engineering, [and] Institute of Electrical Engineers of Japan ; cooperating organization for technical exhibit, SEMI Japan.

    • Text
    • Bellingham, Wash., USA : SPIE, [2000], ©2000.
    • 2000-2000
    • 1 Item
    FormatCall NumberItem Location
    Text TK7872.M3 P46 2000gOff-site

  • 20th Annual BACUS Symposium on Photomask Technology : 13-15 September, 2000, Monterey, [California] USA / Brian J. Grenon, Giang T. Dao,chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology, SPIE--the International Sociey for Optical Engineering ; published by SPIE--the International Society for Optical Engineering.

    • Text
    • Bellingham, Washington : SPIE, [1999], ©1999.
    • 1999-1999
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .S9438 2000gOff-site

  • Photomask and next-generation lithography mask technology VIII : 25-26 April 2001, Yokohama, Japan / Hiroichi Kawahira, editor ; sponsored by PMJ--Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for the symposium, Japan Society of Applied Physics [and others] ; cooperating organization for technical exhibit, SEMI Japan ; supported by Yokohama City.

    • Text
    • Bellingham, Wash., USA : SPIE, [2001], ©2001.
    • 2001-2001
    • 1 Item
    FormatCall NumberItem Location
    Text TK7872.M3 P46 2001gOff-site

  • 21st Annual BACUS Symposium on Photomask Technology : 3-5 October, 2001 Monterey, [California] USA / Giang T. Dao, Brian J. Grenon, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology, SPIE--the International Sociey for Optical Engineering ; published by SPIE--the International Society for Optical Engineering.

    • Text
    • Bellingham, Washington : SPIE, [2002], ©2002.
    • 2002-2002
    • 2 Items
    FormatCall NumberItem Location
    Text TK7874 .S9274 2001g pt.2Off-site
    FormatCall NumberItem Location
    Text TK7874 .S9274 2001g pt.1Off-site

  • Photomask and next-generation lithography mask technology IX : 23-25 April, 2002, Yokohama, Japan / Hiroichi Kawahira, editor ; sponsored by PMJ--Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for the symposium, Japan Society of Applied Physics [and others] ; cooperating organization for technical exhibit, SEMI Japan ; supported by Yokohama City ; published by SPIE--the International Society for Optical Engineering.

    • Text
    • Bellingham, Washington : SPIE, [2001], ©2001.
    • 2001-2001
    • 1 Item
    FormatCall NumberItem Location
    Text TK7872.M3 P46 2002gOff-site

  • 22nd Annual BACUS Symposium on Photomask Technology : 1-4 October, 2002, Monterey, California, USA / Brian J. Grenon, Kurt R. Kimmel, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology, SPIE--the International Society for Optical Engineering ; published by SPIE--the International Society for Optical Engineering.

    • Text
    • Bellingham, Wash. : SPIE, [2002], ©2002.
    • 2002-2002
    • 2 Items
    FormatCall NumberItem Location
    Text TK7874 .S9274 2002g pt.2Off-site
    FormatCall NumberItem Location
    Text TK7874 .S9274 2002g pt.1Off-site

  • Photomask and next-generation lithography mask technology X : 16-18 April, 2003, Yokohama, Japan / Hiroyoshi Tanabe, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical roup of SPIE dedicated to the advancement of photomask technology, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for symposium, the Japan Society of Applied Physics ... [et al.] ; cooperating organization for technical exhibit, SEMI Japan ; supported by Yokohama City ; published by SPIE--the International Society for Optical Engineering.

    • Text
    • 2003
    • 1 Item
    FormatCall NumberItem Location
    Text TK7872.M3 P46 2003gOff-site

  • 23rd Annual BACUS Symposium on Photomask Technology : 9-12 September, 2003, Monterey, California, USA / Kurt R. Kimmel, Wolfgang Staud, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology [and] SPIE--the International Society for Optical Engineering.

    • Text
    • 2003
    • 2 Items
    FormatCall NumberItem Location
    Text TK7874 .S9274 2003g pt.2Off-site
    FormatCall NumberItem Location
    Text TK7874 .S9274 2003g pt.1Off-site

  • Photomask and next-generation lithography mask technology XI. Part One : 14-16 April, 2004, Yokohama, Japan / Hiroyoshi Tanabe, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--The International Society for Optical Engineering ; cooperating organizations, The Institute of Electrical Engineers of Japan . . . (et al.); co-organized by Yokohama City (Japan) ; published by SPIE--The International Society for Optical Engineering.

    • Text
    • Bellingham, Wash. : SPIE, [2004], ©2004.
    • 2004-2004
    • 2 Items
    FormatCall NumberItem Location
    Text TK7872.M3 P46 2004g pt.2Off-site
    FormatCall NumberItem Location
    Text TK7872.M3 P46 2004g pt.1Off-site

  • 24th Annual BACUS Symposium on Photomask Technology : 14-17 October, 2004, Monterey, California, USA / Wolfgang Staud, J. Tracy Weed, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology [and] SPIE--the International Society for Optical Engineering ; published by SPIE--the International Society for Optical Engineering.

    • Text
    • Bellingham, Wash. : SPIE, [2004], ©2004.
    • 2004-2004
    • 2 Items
    FormatCall NumberItem Location
    Text TK7874 .S9274 2004g pt.2Off-site
    FormatCall NumberItem Location
    Text TK7874 .S9274 2004g pt.1Off-site

  • 15th Annual Symposium on Photomask Technology and Management : proceedings : 20-22 September, 1995, Santa Clara, California / Gilbert V. Shelden, James N. Wiley, chairs/editors; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology.

    • Text
    • Bellingham, Wash. : SPIE, c1995.
    • 1995
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .S9434 1995Off-site

  • Photomask and X-ray mask technology III : 18-19 April, 1996, Kawasaki City, Kanagawa, Japan / Hideo Yoshihara, editor ; sponsored by Photomask Japan, BACUS, SPIE--the International Society for Optical Engineering ; supporting societies SPIE Japan Chapter ... [et al.].

    • Text
    • Bellingham, Wash. : SPIE, c1965.
    • 1996
    • 1 Item
    FormatCall NumberItem Location
    Text TA1505 .P762 vol.2793Off-site

  • 16th Annual Symposium on Photomask Technology and Management, 18-20 September 1996, Redwood City, California / Gilbert V. Shelden, James A. Reynolds., chairs/editors ; sponsored by BACUS.

    • Text
    • Bellingham, Wash. : Society of Photo-optical Instrumentation Engineers, ©1996.
    • 1996
    • 1 Item
    FormatCall NumberItem Location
    Text TA1505 .P762 vol.2884Off-site

  • Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan / Naoaki Aizaki, editor ; sponsored by Photomask Japan, BACUS, SPIE--the International Society for Optical Engineering ; supporting societies, the Japan Society of Applied Physics [and others] ; published by SPIE--the International Society for Optical Engineering.

    • Text
    • Bellingham, Washington : SPIE, ©1997.
    • 1997
    • 1 Item
    FormatCall NumberItem Location
    Text TA1505 .P762 vol.3096Off-site

  • 11th annual Symposium on Photomask Technology : proceedings : September 25-27, 1991, Sunnyvale, California / sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology.

    • Text
    • Bellingham, Wash. : SPIE--the International Society for Optical Engineering, c1992.
    • 1992
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .S9434 1991Off-site

  • 12th Annual Symposium on Photomask Technology and Management, 23-24 September 1992, Sunnyvale, California / sponsored by BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology.

    • Text
    • Bellingham, Wash. : Society of Photo-optical Instrumentation Engineers, ©1993.
    • 1992
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .S9434 1992Off-site

  • 13th Annual Symposium on Photomask Technology and Management : proceedings : 22-23 September 1993, Santa Clara, California / sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology.

    • Text
    • Bellingham, Wash. : SPIE--the International Society for Optical Engineering, c1994.
    • 1994
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .S9434 1993Off-site

  • Photomask and x-ray mask technology : 22 April 1994, Kawasaki City, Kanagawa, Japan / Hideo Yoshihara, chair/editor ; sponsored by Japan Chapter of SPIE ; cosponsored by BACUS, SPIE--the International Society for Optical Engineering.

    • Text
    • Bellingham, Wash. : SPIE--the International Society for Optical Engineering, c1994.
    • 1994
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .P567 1994Off-site

  • 14th Annual Symposium on Photomask Technology and Management : proceedings : 14-16 September 1994, Santa Clara, California / William L. Brodsky, Gilbert V. Shelden, chairs/editors : sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology.

    • Text
    • Bellingham, Wash. : SPIE--the International Society for Optical Engineering, c1994.
    • 1994
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .S9434 1994Off-site

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