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  • Engineering statistics handbook.

    • Text
    • [Gaithersburg, Md.] : NIST
    • 2003-present
    • 1 Resource

    Available Online

    https://purl.fdlp.gov/GPO/gpo5766

  • Semiconductor factory and equipment clock synchronization for e-manufacturing / Ya-Shian Li, Brad Van Eck.

    • Text
    • [Gaithersburg, MD] : U.S. Dept. of Commerce, National Institute of Standards and Technology, [2004]
    • 2004
    • 1 Resource

    Available Online

    https://purl.fdlp.gov/GPO/gpo98859

  • Metrology, inspection, and process control for microlithography XIV : 28 February-2 March, 2000, Santa Clara, California / Neal T. Sullivan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH.

    • Text
    • Bellingham, Washington : SPIE, [2000], ©2000.
    • 2000-2000
    • 1 Item
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    Text TK7874 .I5554 2000gOff-site

  • Advances in resist technology and processing XVII : 28 February-1 March, 2000, Santa Clara, USA / Francis M. Houlihan, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.

    • Text
    • Bellingham, Washington : SPIE, [2000], ©2000.
    • 2000-2000
    • 2 Items
    FormatCall NumberItem Location
    Text TK7874 .A25 2000g p.2Off-site
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  • Emerging lithographic technologies IV : 28 February-1 March, 2000, Santa Clara, [California], USA / Elizabeth A. Dobisz, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.

    • Text
    • Bellingham, Washington : SPIE, [2000], ©2000.
    • 2000-2000
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .E523 2000gOff-site

  • Optical microlithography XIII : 1-3 March, 2000, Santa Clara, [California], USA / Christopher J. Progler, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization SEMI--Semiconductor Equipment and Materials International, International SEMATECH.

    • Text
    • Bellingham, Washington : SPIE, [2000], ©2000.
    • 2000-2000
    • 2 Items
    FormatCall NumberItem Location
    Text TK7835 .O65 2000g p.2Off-site
    FormatCall NumberItem Location
    Text TK7835 .O65 2000g p.1Off-site

  • Advances in resist technology and processing XVIII : 26-28 February, 2001, Santa Clara, [California] USA / Francis M. Houlihan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.

    • Text
    • Bellingham, Washington : SPIE, [2001], ©2001.
    • 2001-2001
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .A25 2001gOff-site

  • Metrology, inspection, and process control for microlithography XV : 26 February-1 March, 2001, Santa Clara, [California] USA / Neal T. Sullivan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH.

    • Text
    • Bellingham, Washington : SPIE, [2001], ©2001.
    • 2001-2001
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .I5554 2001gOff-site

  • Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA / Elizabeth A. Dobisz, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.

    • Text
    • Bellingham, Washington : SPIE, [2001], ©2001.
    • 2001-2001
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .E523 2001gOff-site

  • Optical microlithography XIV : 27 February-2 March, 2001, Santa Clara, [California], USA / Christopher J. Progler, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.

    • Text
    • Bellingham, Wash. : SPIE, [2001], ©2001.
    • 2001-2001
    • 2 Items
    FormatCall NumberItem Location
    Text TR940 .O695 2001 v.2Off-site
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    Text TR940 .O695 2001 v.1Off-site

  • Emerging lithographic technologies VI : 5-7 March, 2002, Santa Clara, [California], USA / Roxann L. Engelstad, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.

    • Text
    • Bellingham, Washington : SPIE, [2002], ©2002.
    • 2002-2002
    • 2 Items
    FormatCall NumberItem Location
    Text TK7874 .E523 2002g v.2Off-site
    FormatCall NumberItem Location
    Text TK7874 .E523 2002g v.1Off-site

  • Metrology, inspection, and process control for microlithography XVI : 26 4-7 March, 2002, Santa Clara, [California] USA / Daniel J.C. Herr, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH.

    • Text
    • Bellingham, Washington : SPIE, [2002], ©2002.
    • 2002-2002
    • 2 Items
    FormatCall NumberItem Location
    Text TK7874 .I5554 2002g v.2Off-site
    FormatCall NumberItem Location
    Text TK7874 .I5554 2002g v.1Off-site

  • Advances in resist technology and processing XIX : 4-6 March, 2002, Santa Clara, [California] USA / Theodore H. Fedynyshyn, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.

    • Text
    • Bellingham, Washington : SPIE, [2002], ©2002.
    • 2002-2002
    • 2 Items
    FormatCall NumberItem Location
    Text TK7874 .A25 2002g v.2Off-site
    FormatCall NumberItem Location
    Text TK7874 .A25 2002g v.1Off-site

  • Optical microlithography XV : 5-8 March, 2002, Santa Clara, [California], USA / Anthon Yen, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.

    • Text
    • Bellingham, Washington SPIE, [2002], ©2002.
    • 2002-2002
    • 2 Items
    FormatCall NumberItem Location
    Text TK7835 .O65 2002g v.2Off-site
    FormatCall NumberItem Location
    Text TK7835 .O65 2002g v.1Off-site

  • Optical microlithography XVI : 25-28 February 2003, Santa Clara, California, USA / Anthony Yen, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.

    • Text
    • 2003
    • 3 Items
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    Text TK7835 .O65 2003g pt.3Off-site
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    Text TK7835 .O65 2003g pt.2Off-site
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  • Emerging lithographic technologies VII : 25-27 February, 2003, Santa Clara, California, USA / Roxann L. Engelstad, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.

    • Text
    • 2003
    • 2 Items
    FormatCall NumberItem Location
    Text TK7874 .E523 2003g pt.2Off-site
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    Text TK7874 .E523 2003g pt.1Off-site

  • Metrology, inspection, and process control for microlithography XVII : 24-27 February, 2003, Santa Clara, California, USA / Daniel J. Herr, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH.

    • Text
    • 2003
    • 2 Items
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    Text TK7874 .I5554 2003g pt.2Off-site
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  • Advances in resist technology and processing XX : 24-26 February, 2003, Santa Clara, California, USA / Theodore H. Fedynyshyn, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, International SEMITECH, Semiconductor Equipment and Materials International.

    • Text
    • 2003
    • 2 Items
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    Text TK7874 .A25 2003g pt.2Off-site
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  • Design and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA / Lars W. Liebmann, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMATECH.

    • Text
    • 2004
    • 1 Item
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    Text TK7874 .D377 2004gOff-site
    Request for On-site UseRequest Scan
    Not available - Please for assistance.

  • Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA / Kenneth W. Tobin, Jr., chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMATECH.

    • Text
    • 2004
    • 1 Item
    FormatCall NumberItem Location
    Text TS183 .D37 2004gOff-site

  • Optical microlithography XVII : 24-27 February 2004, Santa Clara, California, USA / Bruce W. Smith, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMATECH.

    • Text
    • Bellingham, Wash., USA : SPIE, c2004.
    • 2004
    • 3 Items
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    Text TK7835 .O65 2004g pt.3Off-site
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    Text TK7835 .O65 2004g pt.2Off-site
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    Text TK7835 .O65 2004g pt.1Off-site

  • Metrology, inspection, and process control for microlithography XVIII : 23-26 February, 2004, Santa Clara, California, USA / Richard M. Silver, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH.

    • Text
    • 2004
    • 3 Items
    FormatCall NumberItem Location
    Text Off-site
    Not available - Please for assistance.
    FormatCall NumberItem Location
    Text TK7874 .I5554 2004g pt.2Off-site
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    Text TK7874 .I5554 2004g pt.1Off-site

  • Advances in resist technology and processing XXI : 23-24 February 2004, Santa Clara, California, USA / John L. Sturtevant, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMITECH.

    • Text
    • 2004
    • 2 Items
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    Text TK7874 .A25 2004g pt.2Off-site
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  • Emerging lithographic technologies VIII : 24-26 February, 2004, Santa Clara, California, USA / R. Scott Mackay, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, [and] International SEMATECH.

    • Text
    • Bellingham, Wash., USA : SPIE, c2004.
    • 2004
    • 2 Items
    FormatCall NumberItem Location
    Text TK7874 .E523 2004g pt.2Off-site
    FormatCall NumberItem Location
    Text TK7874 .E523 2004g pt.1Off-site

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