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Displaying 1-24 of 24 results for author "International SEMATECH."
Engineering statistics handbook.
- Text
- [Gaithersburg, Md.] : NIST
- 2003-present
- 1 Resource
Available Online
https://purl.fdlp.gov/GPO/gpo5766Semiconductor factory and equipment clock synchronization for e-manufacturing / Ya-Shian Li, Brad Van Eck.
- Text
- [Gaithersburg, MD] : U.S. Dept. of Commerce, National Institute of Standards and Technology, [2004]
- 2004
- 1 Resource
Available Online
https://purl.fdlp.gov/GPO/gpo98859Metrology, inspection, and process control for microlithography XIV : 28 February-2 March, 2000, Santa Clara, California / Neal T. Sullivan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH.
- Text
- Bellingham, Washington : SPIE, [2000], ©2000.
- 2000-2000
- 1 Item
Item details Format Call Number Item Location Text TK7874 .I5554 2000g Off-site Advances in resist technology and processing XVII : 28 February-1 March, 2000, Santa Clara, USA / Francis M. Houlihan, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
- Text
- Bellingham, Washington : SPIE, [2000], ©2000.
- 2000-2000
- 2 Items
Item details Format Call Number Item Location Text TK7874 .A25 2000g p.2 Off-site Item details Format Call Number Item Location Text TK7874 .A25 2000g p.1 Off-site Emerging lithographic technologies IV : 28 February-1 March, 2000, Santa Clara, [California], USA / Elizabeth A. Dobisz, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
- Text
- Bellingham, Washington : SPIE, [2000], ©2000.
- 2000-2000
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E523 2000g Off-site Optical microlithography XIII : 1-3 March, 2000, Santa Clara, [California], USA / Christopher J. Progler, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
- Text
- Bellingham, Washington : SPIE, [2000], ©2000.
- 2000-2000
- 2 Items
Item details Format Call Number Item Location Text TK7835 .O65 2000g p.2 Off-site Item details Format Call Number Item Location Text TK7835 .O65 2000g p.1 Off-site Advances in resist technology and processing XVIII : 26-28 February, 2001, Santa Clara, [California] USA / Francis M. Houlihan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
- Text
- Bellingham, Washington : SPIE, [2001], ©2001.
- 2001-2001
- 1 Item
Item details Format Call Number Item Location Text TK7874 .A25 2001g Off-site Metrology, inspection, and process control for microlithography XV : 26 February-1 March, 2001, Santa Clara, [California] USA / Neal T. Sullivan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH.
- Text
- Bellingham, Washington : SPIE, [2001], ©2001.
- 2001-2001
- 1 Item
Item details Format Call Number Item Location Text TK7874 .I5554 2001g Off-site Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA / Elizabeth A. Dobisz, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
- Text
- Bellingham, Washington : SPIE, [2001], ©2001.
- 2001-2001
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E523 2001g Off-site Optical microlithography XIV : 27 February-2 March, 2001, Santa Clara, [California], USA / Christopher J. Progler, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
- Text
- Bellingham, Wash. : SPIE, [2001], ©2001.
- 2001-2001
- 2 Items
Item details Format Call Number Item Location Text TR940 .O695 2001 v.2 Off-site Item details Format Call Number Item Location Text TR940 .O695 2001 v.1 Off-site Emerging lithographic technologies VI : 5-7 March, 2002, Santa Clara, [California], USA / Roxann L. Engelstad, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
- Text
- Bellingham, Washington : SPIE, [2002], ©2002.
- 2002-2002
- 2 Items
Item details Format Call Number Item Location Text TK7874 .E523 2002g v.2 Off-site Item details Format Call Number Item Location Text TK7874 .E523 2002g v.1 Off-site Metrology, inspection, and process control for microlithography XVI : 26 4-7 March, 2002, Santa Clara, [California] USA / Daniel J.C. Herr, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH.
- Text
- Bellingham, Washington : SPIE, [2002], ©2002.
- 2002-2002
- 2 Items
Item details Format Call Number Item Location Text TK7874 .I5554 2002g v.2 Off-site Item details Format Call Number Item Location Text TK7874 .I5554 2002g v.1 Off-site Advances in resist technology and processing XIX : 4-6 March, 2002, Santa Clara, [California] USA / Theodore H. Fedynyshyn, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
- Text
- Bellingham, Washington : SPIE, [2002], ©2002.
- 2002-2002
- 2 Items
Item details Format Call Number Item Location Text TK7874 .A25 2002g v.2 Off-site Item details Format Call Number Item Location Text TK7874 .A25 2002g v.1 Off-site Optical microlithography XV : 5-8 March, 2002, Santa Clara, [California], USA / Anthon Yen, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
- Text
- Bellingham, Washington SPIE, [2002], ©2002.
- 2002-2002
- 2 Items
Item details Format Call Number Item Location Text TK7835 .O65 2002g v.2 Off-site Item details Format Call Number Item Location Text TK7835 .O65 2002g v.1 Off-site Optical microlithography XVI : 25-28 February 2003, Santa Clara, California, USA / Anthony Yen, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
- Text
- 2003
- 3 Items
Item details Format Call Number Item Location Text TK7835 .O65 2003g pt.3 Off-site Item details Format Call Number Item Location Text TK7835 .O65 2003g pt.2 Off-site Item details Format Call Number Item Location Text TK7835 .O65 2003g pt.1 Off-site Emerging lithographic technologies VII : 25-27 February, 2003, Santa Clara, California, USA / Roxann L. Engelstad, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
- Text
- 2003
- 2 Items
Item details Format Call Number Item Location Text TK7874 .E523 2003g pt.2 Off-site Item details Format Call Number Item Location Text TK7874 .E523 2003g pt.1 Off-site Metrology, inspection, and process control for microlithography XVII : 24-27 February, 2003, Santa Clara, California, USA / Daniel J. Herr, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH.
- Text
- 2003
- 2 Items
Item details Format Call Number Item Location Text TK7874 .I5554 2003g pt.2 Off-site Item details Format Call Number Item Location Text TK7874 .I5554 2003g pt.1 Off-site Advances in resist technology and processing XX : 24-26 February, 2003, Santa Clara, California, USA / Theodore H. Fedynyshyn, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, International SEMITECH, Semiconductor Equipment and Materials International.
- Text
- 2003
- 2 Items
Item details Format Call Number Item Location Text TK7874 .A25 2003g pt.2 Off-site Item details Format Call Number Item Location Text TK7874 .A25 2003g pt.1 Off-site Design and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA / Lars W. Liebmann, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMATECH.
- Text
- 2004
- 1 Item
Item details Format Call Number Item Location Text TK7874 .D377 2004g Off-site Not available - Please for assistance.Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA / Kenneth W. Tobin, Jr., chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMATECH.
- Text
- 2004
- 1 Item
Item details Format Call Number Item Location Text TS183 .D37 2004g Off-site Optical microlithography XVII : 24-27 February 2004, Santa Clara, California, USA / Bruce W. Smith, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMATECH.
- Text
- Bellingham, Wash., USA : SPIE, c2004.
- 2004
- 3 Items
Item details Format Call Number Item Location Text TK7835 .O65 2004g pt.3 Off-site Item details Format Call Number Item Location Text TK7835 .O65 2004g pt.2 Off-site Item details Format Call Number Item Location Text TK7835 .O65 2004g pt.1 Off-site Metrology, inspection, and process control for microlithography XVIII : 23-26 February, 2004, Santa Clara, California, USA / Richard M. Silver, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH.
- Text
- 2004
- 3 Items
Item details Format Call Number Item Location Text Off-site Not available - Please for assistance.Item details Format Call Number Item Location Text TK7874 .I5554 2004g pt.2 Off-site Item details Format Call Number Item Location Text TK7874 .I5554 2004g pt.1 Off-site Advances in resist technology and processing XXI : 23-24 February 2004, Santa Clara, California, USA / John L. Sturtevant, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMITECH.
- Text
- 2004
- 2 Items
Item details Format Call Number Item Location Text TK7874 .A25 2004g pt.2 Off-site Item details Format Call Number Item Location Text TK7874 .A25 2004g pt.1 Off-site Emerging lithographic technologies VIII : 24-26 February, 2004, Santa Clara, California, USA / R. Scott Mackay, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, [and] International SEMATECH.
- Text
- Bellingham, Wash., USA : SPIE, c2004.
- 2004
- 2 Items
Item details Format Call Number Item Location Text TK7874 .E523 2004g pt.2 Off-site Item details Format Call Number Item Location Text TK7874 .E523 2004g pt.1 Off-site
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