Research Catalog

  • In-line characterization techniques for performance and yield enhancement in microelectronic manufacturing II : 23-24 September, 1998, Santa Clara, California / Sergio Ajuria, Tim Z. Hossain, chairs/editors ; sponsored and published by SPIE--The International Society for Optical Engineering ; cooperating organizations, Solid State Technology [and others].

    • Text
    • Bellingham, Washington : SPIE, [1998], ©1998.
    • 1998-1998
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .I463 1998Off-site
  • Microelectronic device technology II : 23-24 September, 1998, Santa Clara, California / David Burnett, Dirk Wristers, Toshiaki Tsuchiya, chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, Solid State Technology [and others].

    • Text
    • Bellingham, Washington : SPIE, [1998], ©1998.
    • 1998-1998
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.85 .M5155 1998gOff-site
  • Multilevel interconnect technology II : 23-24 September, Santa Clara, California / Mart Graef, Divyseh N. Patel, chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, Solid State Technology [and others].

    • Text
    • Bellingham, Washington : SPIE, [1998], ©1998.
    • 1998-1998
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874.75 .M85 1998Off-site
  • Process, equipment, and materials control in integrated circuit manufacturing IV : 22-24 September, 1998, Santa Clara, California / Anthony J. Toprac, Kim Dang, chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, Solid State Technology [and others].

    • Text
    • Bellingham, Washington : SPIE, [1998], ©1998.
    • 1998-1998
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .P7519 1998Off-site
  • Microfluidic devices and systems II : 20-21 September, 1999, Santa Clara, California / Chong Hyuk Ahn, A. Bruno Frazier, chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperaing organizations, SolidState Technology [and others].

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    • Bellingham, Washington : SPIE, [1999], ©1999.
    • 1999-1999
    • 1 Item
    FormatCall NumberItem Location
    Text QC176.8.M5 M385 1999gOff-site
  • MEMS reliability for critical and space applications : 21-22 September, 1999, Santa Clara, California / Russell A. Lawton [and others], chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering, cooperating organizations, SolidState Technology [and others].

    • Text
    • Bellingham, Washington : SPIE, [1999], ©1999.
    • 1999-1999
    • 1 Item
    FormatCall NumberItem Location
    Text TK7875 .M46 1999gOff-site
  • Micromachine technology for diffractive and holographic optics : 20-21 September 1999, Santa Clara, California / Sing H. Lee, J. Allen Cox, chairs/editors ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organizations, SolidState Technology [and others].

    • Text
    • Bellingham, Wash., USA : SPIE, [1999], ©1999.
    • 1999-1999
    • 1 Item
    FormatCall NumberItem Location
    Text TA1540 .M53 1999gOff-site
  • Process control and diagnostics : 18-19 September 2000, Santa Clara, USA / Michael L. Miller, Kaihan A. Ashtiani, chairs/editors ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organizations, SolidState Technology, the Electrochemical Society, [and] AVS--American Vacuum Society (USA).

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    • Bellingham, Wash., USA : SPIE, [2000], ©2000.
    • 2000-2000
    • 1 Item
    FormatCall NumberItem Location
    Text TS156.8 .P73 2000gOff-site
  • Challenges in process integration and device technology : 18-19 September 2000, Santa Clara, USA / David Burnett, Shinʼichiro Kimura, Bhanwar Singh, chairs/editors ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organizations, SolidState Technology, the Electrochemical Society, [and] AVS--American Vacuum Society (USA).

    • Text
    • Bellingham, Wash., USA : SPIE, [2000], ©2000.
    • 2000-2000
    • 1 Item
    FormatCall NumberItem Location
    Text TA1660 .C63 2000gOff-site
  • MEMS reliability for critical applications : 20 September 2000, Santa Clara, USA / Russell A. Lawton, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, SolidState Technology, [and] Sandia National Laboratories (USA).

    • Text
    • Bellingham, Wash., USA : SPIE, [2000], ©2000.
    • 2000-2000
    • 1 Item
    FormatCall NumberItem Location
    Text TK7875 .M46 2000gOff-site
  • Micromachining technology for micro-optics : 20 September 2000, Santa Clara, USA / Sing H. Lee, Eric G. Johnson, chairs/editors ; sponsored by SPIE-the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, SolidState Technology, [and] Sandia National Laboratories (USA).

    • Text
    • Bellingham, Wash., USA : SPIE, [2000], ©2000.
    • 2000-2000
    • 1 Item
    FormatCall NumberItem Location
    Text TA1660 .M536 2000gOff-site
  • MOEMS and miniaturized systems : 18-20 September 2000, Santa Clara, USA / M. Edward Motamedi, Rolf Göering, chairs/editors ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, Solid State Technology, [and] Sandia National Laboratories (USA).

    • Text
    • Bellingham, Wash., USA : SPIE, [2000], ©2000.
    • 2000-2000
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .M5326 2000gOff-site
  • Micromachining and microfabrication : 28-30 November, 2000, Singapore / Kevin Chau, Ash M. Parameswaran, Francis E.H. Tay, chairs/editors ; sponsored by, Nanyang Technological University (Singapore), SPIE--the International Society for Optical Engineering ; cooperating organizations, Institute of Physics (Singapore) [and others] ; published by SPIE--the International Society for Optical Engineering.

    • Text
    • Bellingham, Washington : SPIE, [2000], ©2000.
    • 2000-2000
    • 1 Item
    FormatCall NumberItem Location
    Text QC176.8.M5 M398 2000gOff-site
  • Reliability, testing, and characterization of MEMS/MOEMS II : 27-29 January 2003, San Jose, California, USA / Rajeshuni Ramesham, Danelle M. Tanner, chairs/editors ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, SolidState Technology, [and] Sandia National Laboratories (USA).

    • Text
    • Bellingham, Wash., USA : SPIE, [2003], ©2003.
    • 2003-2003
    • 1 Item
    FormatCall NumberItem Location
    Text TK7875 .R45 2003gOff-site
  • Microfluidics, bioMEMS, and medical microsystems : 27-29 January 2003, San Jose, California, USA / Holger Becker, Peter Woias, chairs/editors ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, SolidState Technology, [and] Sandia National Laboratories (USA).

    • Text
    • Bellingham, Wash., USA : SPIE, [2003], ©2003.
    • 2003-2003
    • 1 Item
    FormatCall NumberItem Location
    Text R856.A2 M52 2003gOff-site
  • MOEMS and miniaturized systems III : 27-29 January 2003, San Jose, California, USA / James H. Smith, Peter A. Krulevitch, Hubert K. Lakner, chairs/editors ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, SolidState Technology, [and] Scandia National Laboratories (USA).

    • Text
    • Bellingham, Wash., USA : SPIE, [2003], ©2003.
    • 2003-2003
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .M5326 2003gOff-site
  • Micromachining technology for micro-optics and nano-optics : 28-29 January 2003, San Jose, California, USA / Eric G. Johnson, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, SolidState Technology, [and] Sandia National Laboratories (USA).

    • Text
    • Bellingham, Wash., USA : SPIE, [2003], ©2003.
    • 2003-2003
    • 1 Item
    FormatCall NumberItem Location
    Text TA1660 .M536 2003gOff-site
  • MOEMS display and imaging systems : 28-29 January 2003, San Jose, California, USA / Hakan Urey, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, SolidState Technology, [and] Sandia National Laboratories (USA).

    • Text
    • Bellingham, Wash., USA : SPIE, [2003], ©2003.
    • 2003-2003
    • 1 Item
    FormatCall NumberItem Location
    Text TK7875 .M48 2003gOff-site

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