Research Catalog

  • Advanced materials.

    • Text
    • Deerfield Beach, FL : VCH Publishers, 1989-
    • 1989-present
    • 39 Items
    FormatCall NumberItem Location
    Text JSP 90-56 v. 18, no. 19-24 (Oct. 4-Dec. 18, 2006)Offsite
    FormatCall NumberItem Location
    Text JSP 90-56 v. 18, no. 9-14 (May 2-July 18, 2006)Offsite
    FormatCall NumberItem Location
    Text JSP 90-56 v. 19, no. 1-2 (Jan. 8-20, 2007)Offsite
  • Rapid thermal and integrated processing III : symposium held April 4-7, 1994, San Francisco, California, U.S.A. / editors, Jimmie J. Wortman ... [et al.].

    • Text
    • Pittsburgh, PA : Materials Research Society, c1994.
    • 1994
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 95-1944Offsite
  • The Chemistry of metal CVD / edited by Toivo T. Kodas and Mark J. Hampden-Smith.

    • Text
    • Weinheim ; New York : VCH, c1994.
    • 1994
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 95-1615Offsite
  • Application of chemical vapour deposition in catalyst design : development of high surface area silicon carbide as catalyst support / Moene, Robert

    • Text
    • [Delft] : Delft University Press, c1995.
    • 1995
    • 1 Item
    FormatCall NumberItem Location
    Text JSF 95-1046Offsite
  • Diamond chemical vapor deposition : nucleation and early growth stages / by Huimin Liu and David S. Dandy.

    • Text
    • Park Ridge, N.J. : Noyes Publications, c1995.
    • 1995
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 96-820Offsite
    Not available - In use until 2024-03-03 - Please for assistance.
  • Low-pressure synthetic diamond : manufacturing and applications / [edited by] Bernhard Dischler, Christoph Wild.

    • Text
    • Berlin ; New York : Springer, c1998.
    • 1998
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 98-1400Offsite
  • Aerosol processing of materials / Toivo T. Kodas and Mark J. Hampden-Smith.

    • Text
    • New York : Wiley-VCH, c1999.
    • 1999
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 99-1130Offsite
  • Amorphous and microcrystalline silicon technology 1998 : symposium held April 14-17, 1998, San Francisco, California, U.S.A. / editors, Ruud Schropp ... [et al.].

    • Text
    • Warrendale, Pa. : Materials Research Society, c1999.
    • 1999
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 99-1823Offsite
  • Deposition of diamond-like superhard materials / Wilhelm Kulisch.

    • Text
    • Berlin ; New York : Springer, c1999.
    • 1999
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 99-2118Offsite
  • Handbook of chemical vapor depos[i]tion (CVD) : principles, technology, and applications / by Hugh O. Pierson.

    • Text
    • Norwich, N.Y : Noyes Publications/William Andrew Pub., c1999.
    • 1999
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 00-1032Offsite
  • Scanning tunneling microscopy studies of diamond films and optoelectronic materials [microform] : progress report, 12/1/92 - 10/1/93 / Jose M. Perez.

    • Text
    • [Washington, DC : National Aeronautics and Space Administration ; Springfield, Va. : National Technical Information Service, distributor, 1993]
    • 1993
  • Advanced small rocket chambers option 1 - 14 Lbf Ir-Re rocket [microform] : final report / Donald M. Jassowski and Mark L. Gage.

    • Text
    • [Washington, DC] : National Aeronautics and Space Administration ; [Springfield, Va. : National Technical Information Service, distributor, 1992]
    • 1992
  • Lightweight solar concentrator structures [microform] : phase II / Brian E. Williams and Richard B. Kaplan.

    • Text
    • [Cleveland, Ohio] : Lewis Research Center ; [Springfield, Va. : National Technical Information Service, distributor, 1993]
    • 1993
  • Development of a polysilicon process based on chemical vapor deposition of dichlorosilane in an advanced Siemen's reactor [microform] : final report covering period October 11, 1982 to May 21, 1983 / Arvid N. Arvidson, principal investigator ; David H. Swayer, David M. Muller.

    • Text
    • Hemlock, Mich. : Hemlock Semiconductor Corporation ; [Springfield, Va. : National Technical Information Service, 1983]
    • 1983
  • Handbook of thin-film deposition processes and techniques : principles, methods, equipment and applications / edited by Krishna Seshan.

    • Text
    • Norwich, N.Y. : Noyes Publications/William Andrew Pub., c2002.
    • 2002
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 02-322Offsite
  • Thirteenth European Conference on Chemical Vapor Deposition, Glyfada, Athens, Greece, August 26-31, 2001 / edited by Dimitris Davazoglou, Constantin Vahlas.

    • Text
    • Les Ulis, France : EDP Sciences, [2001]
    • 2001
    • 1 Item
    FormatCall NumberItem Location
    Text JSF 02-99Offsite
  • Electron emission observations from as-grown and vacuum-coated chemical vapor deposited diamond [microform] / A. Lamouri ... [et al.].

    • Text
    • [Washington, D.C. : National Aeronautics and Space Administration, 1997]
    • 1997
  • Chemical vapor deposited SiC (SCS-0) fiber-reinforced strontium aluminosilicate glass-ceramic composites [microform] / Narottam P. Bansal.

    • Text
    • [Washington, D.C. : National Aeronautics and Space Administration, 1997]
    • 1997-1997
  • Chemical vapor deposition polymerization : the growth and properties of parylene thin films / by Jeffrey B. Fortin, Toh-Ming Lu.

    • Text
    • Boston ; London : Kluwer Academic Publishers, c2004.
    • 2004
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 04-301Offsite
  • Influence of filament and substrate temperatures on structural and optoelectronic properties of narrow gap a-SiGe:H alloys deposited by hot-wire CVD : preprint / Y. Xu ... [and others].

    • Text
    • Golden, Colo. : National Renewable Energy Laboratory, [2003]
    • 2003
    • 1 Resource

    Available Online

    https://purl.fdlp.gov/GPO/LPS50301
  • Mechanisms of growth of nanocrystalline silicon deposited by hot-wire chemical vapor deposition / H.R. Moutinho ... [and others].

    • Text
    • Golden, Colo. : National Renewable Energy Laboratory, [2005]
    • 2005
    • 1 Resource

    Available Online

    https://purl.fdlp.gov/GPO/LPS69116
  • Surface characteristics of etched and non-etched silicon germanium (SiGe)/Si graded structure with varying Ge concentration grown by ultra-high vacuum (UHV)/chemical vapor deposition (CVD) for optoelectronic and power conversion applications / Fred Semendy [and three others].

    • Text
    • Adelphi, MD : Army Research Laboratory, 2012.
    • 2012
    • 1 Resource

    Available Online

    https://purl.fdlp.gov/GPO/gpo33169
  • Rapid thermal and integrated processing III : symposium held April 4-7, 1994, San Francisco, California, U.S.A. / editors, Jimmie J. Wortman [and others].

    • Text
    • Pittsburgh, PA : Materials Research Society, 1994.
    • 1994
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.85 .R344 1994Off-site
  • The chemistry of metal CVD / edited by Toivo T. Kodas and Mark J. Hampden-Smith.

    • Text
    • Weinheim ; New York : VCH, 1994.
    • 1994
    • 1 Item
    FormatCall NumberItem Location
    Text TK7867 .C46 1994Off-site
  • Kinetics and characterization of tungsten CVD processes / door Johannes Andreas Maria Ammerlaan.

    • Text
    • Delft : Delft University Press, [1994], ©1994.
    • 1994-1994
    • 1 Item
    FormatCall NumberItem Location
    Text TS695 .A46 1994gOff-site
  • Chemical vapor deposition : thermal and plasma deposition of electronic materials / S. Sivaram.

    • Text
    • New York : Van Nostrand Reinhold, [1995], ©1995.
    • 1995-1995
    • 1 Item
    FormatCall NumberItem Location
    Text TK7836 .S54 1995Off-site
    Not available - Please for assistance.
  • Metal-organic chemical vapor deposition of electronic ceramics II : symposium held November 27-29 1995, Boston, Massachusetts, U.S.A. / editors, Seshu B. Desu, David B. Beach, Peter C. van Buskirk.

    • Text
    • Pittsburgh, Pa. : Materials Research Society, [1996], ©1996.
    • 1996-1996
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.15.C4 M45 1996Off-site
  • Rapid thermal and integrated processing IV : symposium held April 17-20, 1995, San Francisco, California, U.S.A. / editors, Steven R.J. Brueck ... [et.al.].

    • Text
    • Pittsburgh, Pa. : Materials Research Society, [1995], ©1995.
    • 1995-1995
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.85 .R3435 1995Off-site
  • Diamond chemical vapor deposition : nucleation and early growth stages / by Huimin Liu and David S. Dandy.

    • Text
    • Park Ridge, N.J. : Noyes Publications, [1995], ©1995.
    • 1995-1995
    • 1 Item
    FormatCall NumberItem Location
    Text TP873.5.D5 L58 1995Off-site
  • Amorphous and microcrystalline silicon technology 1997 : symposium held March 31-April 4, 1997, San Francisco, California, U.S.A. / editors, Sigurd Wagner [and others].

    • Text
    • Pittsburgh, Pa. : Materials Research Society, [1997], ©1997.
    • 1997-1997
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.99.A45 A46 1997Off-site
  • CVD of compound semiconductors : precursor synthesis, development and applications / Anthony C. Jones, Paul O'Brien.

    • Text
    • Weinheim, Germany ; Cambridge : VCH, [1997], ©1997.
    • 1997-1997
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.99.C65 J66 1997Off-site
  • Low-pressure synthetic diamond : manufacturing and applications / Bernhard Dischler, Christoph Wild, eds.

    • Text
    • Berlin ; New York : Springer, [1998], ©1998.
    • 1998-1998
    • 1 Item
    FormatCall NumberItem Location
    Text TP873.5.D5 L68 1998Off-site
  • Amorphous and microcrystalline silicon technology--1998 : symposium held April 14-17, 1998, San Francisco, California, U.S.A. / editors, Ruud Schropp [and others].

    • Text
    • Pittsburgh, Pennsylvania : Materials Research Society, [1999], ©1999.
    • 1999-1999
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.99.A45 A46 1999Off-site
  • Deposition of diamond-like superhard materials / Wilhelm Kulisch.

    • Text
    • New York : Springer, 1999.
    • 1999
    • 1 Item
    FormatCall NumberItem Location
    Text 508 Er38 v.157Off-site
  • Aerosol processing of materials / Toivo T. Kodas and Mark J. Hampden-Smith.

    • Text
    • New York : Wiley-VCH, [1999], ©1999.
    • 1999-1999
    • 1 Item
    FormatCall NumberItem Location
    Text TA418.9.T45 K63 1999Off-site
  • Handbook of chemical vapor depostion [i.e. deposition] (CVD) : principles, technology, and applications / by Hugh O. Pierson.

    • Text
    • Norwich, N.Y. : Noyes Publications/William Andrew Pub., [1999], ©1999.
    • 1999-1999
    • 1 Item
    FormatCall NumberItem Location
    Text TS695 .P52 1999Off-site
  • Amorphous and heterogeneous silicon thin films--2000 : symposium held April 24-28, 2000, San Francisco, California, U.S.A. / editors, Robert W. Collins [and others].

    • Text
    • Warrendale, Pennsylvania : Materials Research Society, [2001], ©2001.
    • 2001-2001
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.99.A45 A45 2000gOff-site
  • Amorphous and heterogeneous silicon-based films--2001 : symposium held April 16-20, 2001, San Francisco, California, U.S.A. / editors, Martin Stutzmann [and others].

    • Text
    • Warrendale, Pennsylvania : Materials Research Society, [2001], ©2001.
    • 2001-2001
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.99.A45 A45 2001gOff-site
  • Handbook of thin-film deposition processes and techniques : principles, methods, equipment and applications / edited by Krishna Seshan.

    • Text
    • Norwich, N.Y. : Noyes Publications/William Andrew Pub., [2002], ©2002.
    • 2002-2002
    • 1 Item
    FormatCall NumberItem Location
    Text TK7872.T55 H36 2002Off-site
  • Amorphous and heterogeneous silicon-based films--2002 : Symposium held April 2-5, 2002, San Francisco, California, U.S.A. / editors, J. David Cohen [and others].

    • Text
    • Warrendale, Pennsylvania : Materials Research Society, [2002], ©2002.
    • 2002-2002
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.99.A45 A45 2002gOff-site
  • Amorphous and nanocrystalline silicon-based films--2003 : Symposium held April 22-25, 2003, San Francisco, California, U.S.A. / editors, John R. Abelson ... [et al.].

    • Text
    • 2003
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.99.A45 A45 2003gOff-site
  • Chemical vapor deposition polymerization : the growth and properties of parylene thin films / by Jeffrey B. Fortin, Toh-Ming Lu.

    • Text
    • 2004
    • 1 Item
    FormatCall NumberItem Location
    Text TS695 .F67 2004Off-site
  • Amorphous and nanocrystalline silicon science and technology--2004 : Symposium held April 13-16, 2004, San Francisco, California, U.S.A. / editors, Gautam Ganguly [and others].

    • Text
    • Warrendale, Pa. : Materials Research Society, [2004], ©2004.
    • 2004-2004
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.99.A45 A45 2004gOff-site
  • Luminous chemical vapor deposition and interface engineering / Hirotsugu Yasuda.

    • Text
    • New York : Marcel Dekker, [2005], ©2005.
    • 2005-2005
    • 1 Item
    FormatCall NumberItem Location
    Text TP149 .Su77 v.122Off-site
  • Amorphous and nanocrystalline silicon science and technology--2005 : Symposium March 28-April 1, 2005, San Francisco, California, U.S.A. / editors: Robert W. Collins [and others].

    • Text
    • Warrendale, Pa. : Materials Research Society, [2005], ©2005.
    • 2005-2005
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.99.A45 A45 2005gOff-site
  • CVD of nonmetals / edited by William S. Rees.

    • Text
    • Weinheim ; New York : VCH, 1996.
    • 1996
    • 1 Item
    FormatCall NumberItem Location
    Text TS695.15 .C83 1996gOff-site
  • Amorphous and polycrystalline thin-film silicon science and technology--2007 : Symposium held April 9-13, 2007, San Francisco, California, U.S.A. / editors: Virginia Chu [and others].

    • Text
    • Warrendale, Penn. : Materials Research Society, [2007], ©2007.
    • 2007-2007
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.99.A45 A451 2007gOff-site
  • Amorphous and polycrystalline thin-film silicon science and technology--2008 : symposium held March 25-28, 2008, San Francisco, California, U.S.A. / editors: Arokia Nathan [and others].

    • Text
    • Warrendale, Pa. : Materials Research Society, [2008], ©2008.
    • 2008-2008
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.99.A45 S96 2008gOff-site
  • CVD diamond for electronic devices and sensors / edited by Ricardo S. Sussmann.

    • Text
    • Chichester, U.K. : J. Wiley, 2009.
    • 2009
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.15.D53 C94 2009Off-site
  • Amorphous and polycrystalline thin-film silicon science and technology--2009 : symposium held April 14-17, 2009, San Francisco, California, U.S.A. / editors, A. Flewitt ... [et al.].

    • Text
    • 2009
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.99.A45 A451 2009gOff-site

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