Research Catalog

  • ASMC ... proceedings / IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop.

    • Text
    • New York, NY : IEEE, c1990-
    • 1990-present
    • 14 Items
    FormatCall NumberItem Location
    Text JSM 99-14 v. 14 (2003)Offsite
    FormatCall NumberItem Location
    Text JSM 99-14 v. 15 (2004)Offsite
    FormatCall NumberItem Location
    Text JSM 99-14 v. 16 (2005)Offsite
  • Proceedings / International Symposium on Semiconductor Manufacturing, ISSM.

    • Text
    • [New York, N.Y.] : Institute of Electrical and Electronics Engineers, c1995-
    • 1995-present
    • 8 Items
    FormatCall NumberItem Location
    Text JSM 96-117 2001Offsite
    FormatCall NumberItem Location
    Text JSM 96-117 2003Offsite
    FormatCall NumberItem Location
    Text JSM 96-117 2005Offsite
  • Twenty first IEEE/CPMT International Electronics Manufacturing Technology Symposium : October 13-15, 1997, Austin, TX USA / [sponsored by Semiconductor Equipment and Materials International (SEMI) and by the Components, Packaging, & Manufacturing Technology (CPMT) Society].

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    • [New York, N.Y.] : IEEE ; Piscataway, NJ : IEEE Service Center, c1997.
    • 1997
    • 1 Item
    FormatCall NumberItem Location
    Text JSF 97-635Offsite
  • Nineteenth IEEE/CPMT International Electronics Manufacturing Technology Symposium : October 14-16, 1996, Austin, TX, USA / sponsored by Semiconductor Equipment and Materials International (SEMI), and by the Components, Packaging, & Manufacturing Technology (CPMT) Society.

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    • [New York, N.Y.] : Institute of Electrical and Electronics Engineers ; Piscataway, N.J. : IEEE Service Center, c1996.
    • 1996
    • 1 Item
    FormatCall NumberItem Location
    Text JSF 97-42Offsite
  • Twenty third IEEE/CPMT International Electronics Manufacturing Technology Symposium : proceedings 1998 IEMT symposium : October 19-21, 1998, Austin, TX, USA / sponsored by: Semiconductor Equipment & Materials Int'l [and] the Components, Packaging, & Manufacturing Technology Society of the IEEE.

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    • Piscataway, New Jersey : IEEE, c1998.
    • 1998
    • 1 Item
    FormatCall NumberItem Location
    Text JSF 99-28Offsite
  • Twenty Fourth IEEE/CPMT International Electronics Manufacturing Technology Symposium : proceedings 1999 IEMT symposium : October 18-19, 1999, Austin, TX, USA / sponsored by: Semiconductor Equipment & Materials Int'l [and] the Components, Packaging, & Manufacturing Technology Society of the IEEE.

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    • Piscataway, New Jersey : IEEE, c1999.
    • 1999
    • 1 Item
    FormatCall NumberItem Location
    Text JSF 00-18Offsite
  • Twenty Sixth IEEE/CPMT International Electronics Manufacturing Technology Symposium : proceedings : 2000 IEMT Symposium : October 2-3,2000, Santa Clara, CA, USA / sponsored by: SEMI, Semiconductor Equipment and Materials International [and] CPM, the Components, Packaging, & Manufacturing Technology Society of the IEEE.

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    • Piscataway, New Jersey : IEEE, c2000.
    • 2000
    • 1 Item
    FormatCall NumberItem Location
    Text JSF 02-167Offsite
  • Annual IEEE/CPMT/SEMI International Electronics Manufacturing Technology Symposium: [proceedings].

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    • Piscataway, N.J. : IEEE
    • unknown-present
    • 3 Items
    FormatCall NumberItem Location
    Text JSM 02-152 ed. 27 (2002) Offsite
    FormatCall NumberItem Location
    Text JSM 02-152 ed. 28 (2003)Offsite
    FormatCall NumberItem Location
    Text JSM 02-152 ed. 29 (2004) Offsite
  • IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop : ASMC '92 proceedings : September 30-October 1, 1992, Cambridge, Massachusetts.

    • Text
    • New York, NY : IEEE ; Piscataway, NJ : IEEE Service Center [distributor], c1992.
    • 1992
  • IEEE/SEMI 1994 Advanced Semiconductor Manufacturing Conference and Workshop : theme, Manufacturing excellence : a global challenge : ASMC '94 proceedings, November 14-16, 1994, Cambridge, Massachusetts.

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    • New York : Institute of Electrical and Electronics Engineers ; Piscataway, NJ : IEEE Service Center [distributor], c1994.
    • 1994
  • IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop, October 21-23, 1991, Boston, Massachusetts : ASMC '91 proceedings.

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    • New York, NY : Institute of Electrical and Electronics Engineers ; Piscataway, NJ : Copies may be purchased from IEEE Service Center, [1991], ©1991.
    • 1991-1991
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.85 .I24 1991gOff-site
  • IEEE/SEMI International Semiconductor Manufacturing Science Symposium : June 15-16, 1992, San Francisco CA, USA / [sponsored by Semiconductor Equipment and Materials International (SEMI) [and others].

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    • New York, NY, U.S.A. : Institute of Electrical and Electronics Engineers ; Piscataway, NJ, USA : Additional copies may be purchased from IEEE Service Center, [1992], ©1992.
    • 1992-1992
    • 1 Item
    FormatCall NumberItem Location
    Text TK7836 .I43 1992gOff-site
  • IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop : ASMC '92 proceedings : September 30-October 1, 1992, Cambridge, Massachusetts.

    • Text
    • New York, NY : Institute of Electrical and Electronics Engineers ; Piscataway, NJ : May be purchased from IEEE Service Center, [1992], ©1992.
    • 1992-1992
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.85 .I24 1992g Off-site
  • IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop : theme, "Factory of the future" : ASMC '93 proceedings, October 18-19, 1993, Boston, Massachusetts.

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    • [New York] : [Institute of Electrical and Electronics Engineers] ; Piscataway, NJ : IEEE Service Center [distributor], [1993], ©1993.
    • 1993-1993
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.85 .I24 1993gOff-site
  • IEEE/SEMI International Semiconductor Manufacturing Science Symposium [ISMSS] : San Francisco Marriott Hotel, San Francisco, California; conference July 19-20, workshops July 18 & 21 [1993]; held in conjunction with SEMICON/West 93 July 20-22 / Sponsored by Semiconductor Equipment and Materials International [and others].

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    • Piscataway, NJ : Institute of Electrical and Electronics Engineers, [1993], ©1993.
    • 1993-1993
    • 1 Item
    FormatCall NumberItem Location
    Text TK7836 .I43 1993gOff-site
  • Optical/laser microlithography VII : 2-4 March 1994, San Jose, California / Timothy A. Brunner, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.

    • Text
    • Bellingham, Wash., USA : SPIE, [1994], ©1994.
    • 1994-1994
    • 1 Item
    FormatCall NumberItem Location
    Text TA1677 .O673 1994gOff-site
  • Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV : 28 February-1 March 1994, San Jose, California / David O. Patterson, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.

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    • Bellingham, Wash., USA : SPIE, [1994], ©1994.
    • 1994-1994
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .E4834 1994gOff-site
  • Integrated circuit metrology, inspection, and process control VIII : 28 February-2 March, San Jose, California / Marylyn Hoy Bennett, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.

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    • Bellingham, Wash., USA : SPIE, [1994], ©1994.
    • 1994-1994
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .I54282 1994gOff-site
  • Multichip modules : international conference and exhibition, 13-15 April 1994, Denver, Colorado / sponsored by ISHM--the Microelectronics Society [and others] in cooperation with SEMI--Semiconductor Equipment and Materials International.

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    • Reston, Va. : ISHM ; Wheaton, Ill. : International Electronics Packaging Society : Published in cooperation with SPIE--the International Society for Optical Engineering, [1994], ©1994.
    • 1994-1994
    • 1 Item
    FormatCall NumberItem Location
    Text TK7870.15 .M853 1994gOff-site
  • Advances in resist technology and processing XI : 28 February-1 March 1994, San Jose, California / Omkaram Nalamasu, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.

    • Text
    • Bellingham, Wash., USA : SPIE, [1994], ©1994.
    • 1994-1994
    • 1 Item
    FormatCall NumberItem Location
    Text TR94 .A478 1994gOff-site
  • IEEE/SEMI 1994 Advanced Semiconductor Manufacturing Conference and Workshop : theme, Manufacturing excellence: a global challenge : ASMC '94 proceedings, November 14-16, 1994, Cambridge, Massachusetts.

    • Text
    • New York : Institute of Electrical and Electronics Engineers ; Piscataway, NJ : IEEE Service Center [distributor], [1994], ©1994.
    • 1994-1994
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.85 .I24 1994gOff-site
  • Integrated circuit metrology, inspection, and process control IX : 20-22 February 1995, Santa Clara, California / Marylyn H. Bennett, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.

    • Text
    • Bellingham, Wash., USA : SPIE, [1995], ©1995.
    • 1995-1995
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .I58 1995gOff-site
  • Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V : 20-21 February 1995, Santa Clara, California / John M. Warlaumont, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.

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    • Bellingham, Wash., USA : SPIE, [1995], ©1995.
    • 1995-1995
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .E44 1995gOff-site
  • Advances in resist technology and processing XII : 20-22 February 1995, Santa Clara, California / Robert D. Allen, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.

    • Text
    • Bellingham, Wash., USA : SPIE, [1995], ©1995.
    • 1995-1995
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .A25 1995gOff-site
  • Proceedings, 1995 international conference on multichip modules : 19-21 April 1995, Denver, Colorado / sponsored by ISHM--the Microelectronics Society [and others] ; endorsed by SEMI--Semiconductor Equipment and Materials International, PCMCIA--Personal Computer Memory Card International Association ; [edited and assembled by the 1995 Technical Program Committee and ISHM staff].

    • Text
    • Reston, Va. : ISHM : Published in cooperation with SPIE--the International Society for Optical Engineering, [1995], ©1995.
    • 1995-1995
    • 1 Item
    FormatCall NumberItem Location
    Text TK7870.15 .I57 1995gOff-site
  • Optical/laser microlithography VIII : 22-24 February 1995, Santa Clara, California / Timothy A. Brunner, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.

    • Text
    • Bellingham, Wash. : SPIE, [1995], ©1995.
    • 1995-1995
    • 1 Item
    FormatCall NumberItem Location
    Text TA1677 .O673 1995gOff-site
  • Micromachined devices and components : 23-24 October, 1995, Austin, Texas / Ray Roop, Kevin Chau, chairs/editors ; sponsored by SEMI-Semiconductor Equipment and Materials International [and others], published by SPIE--the International Society for Optical Engineering.

    • Text
    • Bellingham, Wash., USA : SPIE, [1995], ©1995.
    • 1995-1995
    • 1 Item
    FormatCall NumberItem Location
    Text QC176.8.M5 M396 1995gOff-site
  • Microelectronic structures and microelectromechanical devices for optical processing and multimedia applications : 24 October, 1995, Austin, Texas / Wayne Bailey [and others], chairs/editors ; sponsored by SEMI-Semiconductor Equipment and Materials International [and others], published by SPIE--the International Society for Optical Engineering.

    • Text
    • Bellingham, Wash., USA : SPIE, [1995], ©1995.
    • 1995-1995
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .M463 1995gOff-site
  • IEEE/UCS/SEMI International Symposium on Semiconductor Manufacturing / sponsored by the IEEE Electron Devices Society, and the Components Packaging & Manufacturing Technology Society and the Ultra Clean Society.

    • Text
    • [New York, N.Y.] : Institute of Electrical and Electronics Engineers ; Piscataway, NJ : Additional copies may be purchased from IEEE Service Center, [1995], ©1995.
    • 1995-1995
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.85 .I131 1995gOff-site
  • ASMC ... proceedings / IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop.

    • Text
    • New York, NY : IEEE, ©1990-
    • 1990-present
    • 9 Items
    FormatCall NumberItem Location
    Text TK7871.85 .I42 (2001)Off-site
    FormatCall NumberItem Location
    Text TK7871.85 .I42 (2002)Off-site
    FormatCall NumberItem Location
    Text TK7871.85 .I42 (2003)Off-site
  • Optical microlithography IX : 13-15 March, 1996, Santa Clara, California / Gene E. Fuller, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering; cooperating organizations SEMI--Semiconductor Equipment and Materials International, SEMATECH.

    • Text
    • Bellingham, Wash., USA : SPIE, [1996], ©1996.
    • 1996-1996
    • 1 Item
    FormatCall NumberItem Location
    Text TR940 .O695 1996gOff-site
  • Metrology, inspection, and process control for microlithography X : 11-13 March, 1996, Santa Clara, California / Susan K. Jones, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering; cooperating organizations SEMI--Semiconductor Equipment and Materials International, SEMATECH.

    • Text
    • Bellingham, Wash., USA : SPIE, [1996], ©1996.
    • 1996-1996
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .I5554 1996gOff-site
  • Proceedings, 1996 International Conference on Multichip Modules : April 17-19, 1996, the Marriott Tech Center, Denver, Colorado / sponsored by ISHM, International Society for Hybrid Microelectronics [and others] ; endorsed by SEMI ; [edited and assembled by the 1996 Technical Program Committee and ISHM staff].

    • Text
    • Reston, Va. : ISHM, [1996], ©1996.
    • 1996-1996
    • 1 Item
    FormatCall NumberItem Location
    Text TK7870.15 .I57 1996gOff-site
  • Advances in resist technology and processing XIII : 11-13 March 1996, Santa Clara, California / Roderick R. Kunz, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, SEMATECH.

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    • Bellingham, Wash., USA : International Society for Optical Engineering, [1996], ©1996.
    • 1996-1996
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .A25 1996gOff-site
  • Microelectronic device and multilevel interconnection technology II : 16-17 October, 1996, Austin, Texas / Ih-chin Chen [and others], chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and others].

    • Text
    • Bellingham, Wash., USA : SPIE, [1996], ©1996.
    • 1996-1996
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .M454 1996gOff-site
  • Microelectronic manufacturing yield, reliability, and failure analysis II : 16-17 October, 1996, Austin, Texas / Ali Keshavarzi, Sharad Prasad, Hans-Dieter Hartmann, chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International.

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    • Bellingham, Wash., USA : SPIE, [1996], ©1996.
    • 1996-1996
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .M458 1996gOff-site
  • Microlithography and metrology in micromachining II : 14-15 October 1996, Austin, Texas / Michael T. Postek, Craig Friedrich, chairs/editors ; sponsored by SPIE--the International Society for Optical Engineering, SEMI--Semiconductor Equipment and Materials International, NIST--National Institute of Standards and Technology.

    • Text
    • Bellingham, Wash. : SPIE, [1996], ©1996.
    • 1996-1996
    • 1 Item
    FormatCall NumberItem Location
    Text QC176.8.M5 M39 1996gOff-site
  • Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March, 1996, Santa Clara, California / David E. Seeger, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International, SEMATECH.

    • Text
    • Bellingham, Wash. : SPIE, [1996], ©1996.
    • 1996-1996
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .E44 1996gOff-site
  • Micromachining and microfabrication process technology II : 14-15 October 1996, Austin, Texas / Stella W. Pang, Shih-Chia Chang Charis/Editors ; Sponsored by SPIE--The International Society for Optical Engineering, SEMI--Semiconductor Equipment and Materials International, NIST--National Institute of Standards and Technology ; Cooperating Organizations Solid State Technology, Sandia National Laboratories ; Published by SPIE--the International Society for Optical Engineering.

    • Text
    • Bellingham, Wash., USA : SPIE, [1996], ©1996.
    • 1996-1996
    • 1 Item
    FormatCall NumberItem Location
    Text QC176.8.M5 M4 1996gOff-site
  • Process, equipment, and materials control in integrated circuit manufacturing II : 16-17 October 1996, Austin, Texas / Armando Iturralde, Te-Hua Lin, chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and others].

    • Text
    • Bellingham, Wash., USA : SPIE, [1996], ©1996.
    • 1996-1996
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .P76 1996gOff-site
  • Optical characterization techniques for high-performance microelectronic device manufacturing III : 16-17 October 1996, Austin, Texas / Damon DeBusk, Ray T. Chen, chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and others].

    • Text
    • Bellingham, Wash., USA : SPIE, [1996], ©1996.
    • 1996-1996
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.85 .O57 1996gOff-site
  • Micromachined devices and components II : 14-15 October, 1996, Austin, Texas / Kevin Chau, Ray Roop, chairs/editors ; sponsored by SPIE - the International Society for Optical Engineering [and others], published by SPIE--the International Society for Optical Engineering.

    • Text
    • Bellingham, Wash., USA : SPIE, [1996], ©1996.
    • 1996-1996
    • 1 Item
    FormatCall NumberItem Location
    Text QC176.8.M5 M396 1996gOff-site
  • Microelectronic structures and MEMS for optical processing II : 14-15 October 1996, Austin, Texas / M. Edward Motamedi, Wayne Bailey, chairs/editors ; sponsored by SPIE--the International Society for Optical Engineering, SEMI--Semiconductor Equipment and Materials International, NIST--National Institute of Standards and Technology ; cooperating organizations, Solid State Technology, Sandia National Laboratories ; published by SPIE--the International Society for Optical Engineering.

    • Text
    • Bellingham, Wash., USA : SPIE, [1996], ©1996.
    • 1996-1996
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .M4695 1996gOff-site
  • Advances in resist technology and processing XIV : 10-12 March, 1997, Santa Clara, California / Rʹegine G. Tarascon-Auriol, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, SEMATECH.

    • Text
    • Bellingham, Washington : International Society for Optical Engineering, [1997], ©1997.
    • 1997-1997
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .A25 1997gOff-site
  • Metrology, inspection, and process control for microlithography XI : 10-12 March, 1997, Santa Clara, California / Susan K. Jones, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations SEMI--Semiconductor Equipment and Materials International, SEMATECH.

    • Text
    • Bellingham, Washington : SPIE, [1997], ©1997.
    • 1997-1997
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .I5554 1997gOff-site
  • Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California / David E. Seeger, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] SEMATECH.

    • Text
    • Bellingham, Wash., USA : SPIE, [1997], ©1997.
    • 1997-1997
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .E64 1997gOff-site
  • Optical microlithography X : 12-14 March, 1997, Santa Clara, California / Gene E. Fuller, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations SEMI--Semiconductor Equipment and Materials International, SEMATECH.

    • Text
    • Bellingham, Washington : SPIE, [1997], ©1997.
    • 1997-1997
    • 1 Item
    FormatCall NumberItem Location
    Text TR940 .O695 1997gOff-site
  • Microelectronic device technology : 1-2 October 1997, Austin, Texas / Mark Rodder [and others], chairs/editors ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, Solid State Technology, [and] The Electrochemical Society.

    • Text
    • Bellingham, Wash., USA : SPIE, [1997], ©1997.
    • 1997-1997
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.85 .M5153 1997gOff-site
  • Process, equipment, and materials control in integrated circuit manufacturing III : 1-2 October, 1997, Austin, Texas / Abe Ghanbari, Anthony J. Toprac, chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, Solid State Technology, the Electrochemical Society.

    • Text
    • Bellingham, Washington : SPIE, [1997], ©1997.
    • 1997-1997
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .P76 1997gOff-site
  • Microelectronic structures and MEMS for optical processing III : 29-30 September, 1997, Austin, Texas / M. Edward Motamedi, Hans Peter Herzig, chairs/editors ; sponsored by SPIE--the International Society for OPtical Engineering, SEMI--Semiconductor Equipment and Materials International, NIST--National Institute of Standards and Technology ; cooperating organization Soild State Technology ; published by SPIE--the International Society for Optical Engineering.

    • Text
    • Bellingham, Washington : SPIE, [1997], ©1997.
    • 1997-1997
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .M4695 1997gOff-site

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