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  • Proceedings of the Eleventh Biennial University/Government/Industry Microelectronics Symposium / sponsored by SEMATECH, Electron Devices Society, the University of Texas at Austin, Semiconductor Reseach Corporation.

    • Text
    • [New York] : IEEE, c1995.
    • 1995
    • 1 Item
    FormatCall NumberItem Location
    Text JSF 95-869Offsite

  • Optical microlithography IX : 13-15 March, 1996, Santa Clara, California / Gene E. Fuller, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering; cooperating organizations SEMI--Semiconductor Equipment and Materials International, SEMATECH.

    • Text
    • Bellingham, Wash., USA : SPIE, [1996], ©1996.
    • 1996-1996
    • 1 Item
    FormatCall NumberItem Location
    Text TR940 .O695 1996gOff-site

  • Advances in resist technology and processing XIII : 11-13 March 1996, Santa Clara, California / Roderick R. Kunz, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, SEMATECH.

    • Text
    • Bellingham, Wash., USA : International Society for Optical Engineering, [1996], ©1996.
    • 1996-1996
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .A25 1996gOff-site

  • Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March, 1996, Santa Clara, California / David E. Seeger, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International, SEMATECH.

    • Text
    • Bellingham, Wash. : SPIE, [1996], ©1996.
    • 1996-1996
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .E44 1996gOff-site

  • Ion implantation technology--96 : proceedings of the Eleventh International Conference on Ion Implantation Technology, Austin, Texas, USA, June 16-21, 1996 / editors, Emi Ishidida [sic] [and others].

    • Text
    • Piscataway, NJ : Institute of Electrical and Electronics Engineers, [1997], ©1997.
    • 1997-1997
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.85 .I57623 1996Off-site

  • Advances in resist technology and processing XIV : 10-12 March, 1997, Santa Clara, California / Rʹegine G. Tarascon-Auriol, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, SEMATECH.

    • Text
    • Bellingham, Washington : International Society for Optical Engineering, [1997], ©1997.
    • 1997-1997
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .A25 1997gOff-site

  • Metrology, inspection, and process control for microlithography XI : 10-12 March, 1997, Santa Clara, California / Susan K. Jones, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations SEMI--Semiconductor Equipment and Materials International, SEMATECH.

    • Text
    • Bellingham, Washington : SPIE, [1997], ©1997.
    • 1997-1997
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .I5554 1997gOff-site

  • Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California / David E. Seeger, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] SEMATECH.

    • Text
    • Bellingham, Wash., USA : SPIE, [1997], ©1997.
    • 1997-1997
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .E64 1997gOff-site

  • Optical microlithography X : 12-14 March, 1997, Santa Clara, California / Gene E. Fuller, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations SEMI--Semiconductor Equipment and Materials International, SEMATECH.

    • Text
    • Bellingham, Washington : SPIE, [1997], ©1997.
    • 1997-1997
    • 1 Item
    FormatCall NumberItem Location
    Text TR940 .O695 1997gOff-site

  • Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, Santa Clara, California / Bhanwar Singh, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] SEMATECH.

    • Text
    • Bellingham, Wash., USA : SPIE, [1998], ©1998.
    • 1998-1998
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .M4376 1998Off-site

  • Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California / Yuli Vladimirsky, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, SEMATECH.

    • Text
    • Bellingham, Wash. : SPIE, [1998], ©1998.
    • 1998-1998
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .E523 1998gOff-site

  • Optical microlithography XI : 25-27 February, 1998, Santa Clara, California / Luc Van den hove, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations SEMI--Semiconductor Equipment and Materials International, SEMATECH.

    • Text
    • Bellingham, Washington : SPIE, [1998], ©1998.
    • 1998-1998
    • 1 Item
    FormatCall NumberItem Location
    Text TK7872.M3 O68 1998Off-site

  • Advances in resist technology and processing XV : 23-25 February, 1998, Santa Clara, California / Will Conley, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, SEMATECH.

    • Text
    • Bellingham, Washington : SPIE, [1998], ©1998.
    • 1998-1998
    • 2 Items
    FormatCall NumberItem Location
    Text TA7874 .A25 1998g pt.2Off-site
    FormatCall NumberItem Location
    Text TA7874 .A25 1998g pt.1Off-site

  • Optical microlithography XII : 17-19 March, 1999, Santa Clara, California / Luc Van den Hove, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization SEMI--Semiconductor Equipment and Materials International, SEMATECH.

    • Text
    • Bellingham, Washington : SPIE, [1999], ©1999.
    • 1999-1999
    • 2 Items
    FormatCall NumberItem Location
    Text TK7835 .O65 1999g v.2Off-site
    FormatCall NumberItem Location
    Text TK7835 .O65 1999g v.1Off-site

  • Processing of films for high Tc superconducting electronics : 10-12 October 1989, Santa Clara, California / T. Venkatesan, chair/editor ; sponsored by SPIE--The International Society for Optical Engineering ; cooperating organizations, Center for Advanced Electronic Materials Processing/North Carolina State University, Engineering Research Center for Plasma-Aided Manufacturing/University of Wisconsin-Madison, SEMATECH.

    • Text
    • Bellingham, Wash., USA : SPIE--The International Society for Optical Engineering, [1990], ©1990.
    • 1990-1990
    • 1 Item
    FormatCall NumberItem Location
    Text TK7872.T55 P76 1990gOff-site

  • Multichamber and in-situ processing of electronic materials : 10-11 October 1989, Santa Clara, California / Robert S. Freund, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organizations, Center for Advanced Electronic Materials Processing/North Carolina State University, Engineering Research Center for Plasma-Aided Manufacturing/University of Wisconsin-Madison, SEMATECH.

    • Text
    • Bellingham, Wash., USA : SPIE--The International Society for Optical Engineering, [1990], ©1990.
    • 1990-1990
    • 1 Item
    FormatCall NumberItem Location
    Text TK7836 .M85 1990gOff-site

  • Surface and interface analysis of microelectronic materials processing and growth : 12-13 October 1989, Santa Clara, California / Leonard J. Brillson, Fred H. Pollak, chairs/editors ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organizations: Center for Advanced Electronic Materials Processing/North Carolina State University, Engineering Research Center for Plasma-Aided Manufacturing/University of Wisconsin-Madison, SEMATECH.

    • Text
    • Bellingham, Wash., USA : SPIE--The International Society for Optical Engineering, [1990], ©1990.
    • 1990-1990
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .S868 1990gOff-site

  • Laser/optical processing of electronic materials : 10-11 October 1989, Santa Clara, California / J. Narayan, chair/editor ; sponsored by SPIE--The International Society for Optical Engineering ; cooperating organizations, SEMATECH, Center for Advanced Electronic Materials Processing/North Carolina State University, Engineering Research Center for Plasma-Aided Manufacturing/University of Wisconsin-Madison.

    • Text
    • Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, [1990], ©1990.
    • 1990-1990
    • 1 Item
    FormatCall NumberItem Location
    Text TA1677 .L367 1990gOff-site

  • Dry processing for submicrometer lithography : 12-13 October 1989, Santa Clara, California / James Bondur, Alan R. Reinberg, chairs/editors ; sponsored by SPIE--The International Society for Optical Engineering ; cooperating organizations, SEMATECH, Center for Advanced Electronics Materials Processing/North Carolina State University, Engineering Research Center for Plasma-Aided Manufacturing/University of Wisconsin-Madison.

    • Text
    • Bellingham, Wash., USA : SPIE, [1990], ©1990.
    • 1990-1990
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.85 .D792 1990gOff-site

  • Optical microlithography IX : 13-15 March, 1996, Santa Clara, California / Gene E. Fuller, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations SEMI--Semiconductor Equipment and Materials International, SEMATECH.

    • Text
    • Bellingham, Wash. : Society of Photo-optical Instrumentation Engineers, ©1996.
    • 1996
    • 1 Item
    FormatCall NumberItem Location
    Text TA1505 .P762 vol.2726Off-site

  • Metrology, inspection, and process control for microlithography X : : 11-13 March, 1996, Santa Clara, California / Susan K. Jones, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering; cooperating organizations SEMI--Semiconductor Equipment and Materials International, SEMATECH.

    • Text
    • Bellingham, Wash., USA : SPIE, c1996.
    • 1996
    • 1 Item
    FormatCall NumberItem Location
    Text TA1505 .P762 vol.2725Off-site

  • Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California / David E. Seeger, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering : cooperating organization SEMI--Semiconductor Equipment and Materials International, SEMATECH.

    • Text
    • Bellingham, Wash., USA : SPIE, c1996.
    • 1996
    • 1 Item
    FormatCall NumberItem Location
    Text TA1505 .P762 vol.2723Off-site

  • Optical microlithography X : 12-14 March, 1997, Santa Clara, California / Gene E. Fuller, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations SEMI--Semiconductor Equipment and Materials International, SEMATECH.

    • Text
    • Bellingham, Wash. : SPIE, c1997.
    • 1997
    • 1 Item
    FormatCall NumberItem Location
    Text TA1505 .P762 vol.3051Off-site

  • Advances in resist technology and processing XIV : 10-12 March, 1997, Santa Clara, California / Régine G. Tarascon-Auriol, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, SEMATECH.

    • Text
    • Bellingham, Wash. : Society of Photo-optical Instrumentation Engineers, ©1997.
    • 1997
    • 1 Item
    FormatCall NumberItem Location
    Text TA1505 .P762 vol.3049Off-site

  • Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California / David E. Seeger, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering : cooperating organization SEMI--Semiconductor Equipment and Materials International, SEMATECH.

    • Text
    • Bellingham, Wash., USA : SPIE, c1997.
    • 1997
    • 1 Item
    FormatCall NumberItem Location
    Text TA1505 .P762 vol.3048Off-site

  • Surface and interface analysis of microelectronic materials processing and growth : 12-13 October 1989, Santa Clara, California / Leonard J. Brillson, Fred H. Pollak, chairs/editors ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organizations: Center for Advanced Electronic Materials Processing, North Carolina State University, Engineering Research Center for Plasma-Aided Manufacturing, University of Wisconsin-Madison, SEMATECH.

    • Text
    • Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, ©1990.
    • 1990
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .S973Off-site

  • Proceedings : ninth Biennial University/Government/Industry Microelectronics Symposium, June 12-14, 1991, Melbourne, Florida / [sponsors], SEMATECH, IEEE, Florida Institute of Technology.

    • Text
    • New York, NY : Institute of Electrical and Electronics Engineers ; Piscataway, NJ : Available from IEEE Service Center, c1991.
    • 1991
    • 1 Item
    FormatCall NumberItem Location
    Text TK7874 .U56 1991Off-site

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