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Non-silver photographic processes : proceedings of the Symposium on Non-silver Photographic Processes held at New College, Oxford, September, 1973 / edited by R. J. Cox.
- Text
- London ; New York : Published for the Scientific and Technical Group of the Royal Photographic Society by Academic Press, 1975.
- 1975
- 1 Item
Item details Format Call Number Item Location Text JFE 76-1196 Schwarzman Building - General Research Room 315 Available - Can be used on site. Please visit New York Public Library - Schwarzman Building to submit a request in person.
Proceedings.
- Text
- [Rochester, N.Y., Graphics Markets Division, Eastman Kodak Co., 1973]
- 1973
- 1 Item
Item details Format Call Number Item Location Text JSF 80-930 Offsite Microlithography : process technology for IC fabrication / David J. Elliott.
- Text
- New York : McGraw-Hill, c1986.
- 1986
- 1 Item
Item details Format Call Number Item Location Text JSE 87-1927 Offsite Polymers for high technology : electronics and photonics / Murrae J. Bowden, editor, S. Richard Turner, editor ; developed from a symposium sponsored by the Division of Polymeric Materials--Science and Engineering at the 192nd Meeting of the American Chemical Society, Anaheim, California, September 7-12, 1986.
- Text
- Washington, DC : The Society, 1987.
- 1987
- 2 Items
Item details Format Call Number Item Location Text JSK 76-18 v. 346 Offsite Item details Format Call Number Item Location Text JSK 76-18 v. 346 Offsite Semiconductor lithography : principles, practices, and materials / Wayne M. Moreau.
- Text
- New York : Plenum Press, c1988.
- 1988
- 1 Item
Item details Format Call Number Item Location Text JSF 88-1620 Offsite Introduction to microlithography : theory, materials, and processing / L.F. Thompson, editor ; C.G. Willson, editor ; M.J. Bowden, editor ; based on a workshop sponsored by the ACS Division of Organic Coatings and Plastics Chemistry at the 185th Meeting of the American Chemical Society, Seattle, Washington, March 20-25, 1983.
- Text
- Washington, D.C. : The Society, 1983.
- 1983
- 1 Item
Item details Format Call Number Item Location Text JSK 76-18 v. 219 Offsite Materials for microlithography : radiation-sensitive polymers : based on a symposium cosponsored by the Division of Polymeric Materials, Science and Engineering and the Division of Polymer Chemistry, at the 187th Meeting of the American Chemical Society, St. Louis, Missouri, April 8-13, 1984 / L.F. Thompson, editor, C.G. Willson, editor, J.M.J. Fréchet, editor.
- Text
- Washington, D.C. : The Society, 1984.
- 1984
- 1 Item
Item details Format Call Number Item Location Text JSK 76-18 v. 266 Offsite Polymers in microlithography : materials and processes / Elsa Reichmanis, editor, Scott A. MacDonald, editor, Takao Iwayanagi, editor.
- Text
- Washington, DC : American Chemical Society, 1989.
- 1989
- 1 Item
Item details Format Call Number Item Location Text JSE 90-52 Offsite Photoreactive polymers : the science and technology of resists / Arnost Reiser.
- Text
- New York : Wiley, 1989.
- 1989
- 1 Item
Item details Format Call Number Item Location Text JSE 89-1394 Offsite Introduction to microlithography / edited by Larry F. Thompson, C. Grant Willson, Murrae J. Bowden.
- Text
- Washington, DC : American Chemical Society, 1994.
- 1994
- 1 Item
Item details Format Call Number Item Location Text JSE 95-1394 Offsite Microelectronics technology : polymers for advanced imaging and packaging : developed from a symposium sponsored by the ACS Division of Polymeric Materials: Science and Engineering, Inc., and the Polymers for Microelectronics Division of the Society of Polymer Science, Japan, at the 209th National Meeting of the American Chemical Society, Anaheim, California, April 2-6, 1995 / Elsa Reichmanis ... [et al.], editor.
- Text
- Washington, DC : American Chemical Society, 1995.
- 1995
- 1 Item
Item details Format Call Number Item Location Text JSE 96-49 Offsite Microlithography fundamentals in semiconductor devices and fabrication technology / Saburo Nonogaki, Takumi Ueno, Toshio Ito.
- Text
- New York : Marcel Dekker, c1998.
- 1998
- 1 Item
Item details Format Call Number Item Location Text JSE 98-1154 Offsite Micro- and nanopatterning polymers / Hiroshi Ito, editor ... [et al.].
- Text
- Washington, DC : American Chemical Society : Distributed by Oxford University Press, c1998.
- 1998
- 1 Item
Item details Format Call Number Item Location Text JSE 98-1313 Offsite Dry film photoresist from Japan [microform] : determination of the Commission in investigation no. 731-TA-622 (preliminary) under the Tariff Act of 1930, together with the information obtained in the investigation.
- Text
- Washington, DC : U.S. International Trade Commission, [1992]
- 1992
Dry film photoresist from Japan [microform].
- Text
- Washington, DC : U.S. International Trade Commission, [1993]
- 1993
Advances in resist technology and processing VIII : 4-5 March 1991, San Jose, California / Hiroshi Ito, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, [1991], ©1991.
- 1991-1991
- 1 Item
Item details Format Call Number Item Location Text TK8331 .A38383 1991g Off-site Photoresist : materials and processes / W. S. DeForest.
- Text
- New York : McGraw-Hill, [1975]
- 1975
- 1 Item
Item details Format Call Number Item Location Text TK7874 .D42 Off-site Advances in resist technology and processing IX : 9-10 March, 1992, San Jose, California / Anthony E. Novembre, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash., USA : SPIE, [1992], ©1992.
- 1992-1992
- 1 Item
Item details Format Call Number Item Location Text TK7874 .A25 1992g Off-site Proceedings of the Symposia on Patterning Science and Technology II / edited by Wayne Greene, George J. Hefferon, L. K. White [and] Interconnection and Contact Metallization for ULSI / edited by Terry O. Herndon, Andrew L. Wu ; [sponsored by the] Dielectric Science and Technology and Electronics divisions.
- Text
- Pennington, NJ (10 S. Main St., Pennington 08534-2896) : Electrochemical Society, [1992], ©1992.
- 1992-1992
- 1 Item
Item details Format Call Number Item Location Text TK7874 .S943 1991 Off-site Advances in resist technology and processing X : 1-2 March, 1992, San Jose, California / William D. Hinsberg, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash., USA : SPIE, [1993], ©1993.
- 1993-1993
- 1 Item
Item details Format Call Number Item Location Text TK8331 .A383 1993g Off-site Advances in resist technology and processing XI : 28 February-1 March 1994, San Jose, California / Omkaram Nalamasu, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.
- Text
- Bellingham, Wash., USA : SPIE, [1994], ©1994.
- 1994-1994
- 1 Item
Item details Format Call Number Item Location Text TR94 .A478 1994g Off-site Submicron lithography / Phillip D. Blais, chairman/editor ; in cooperation with the International Society for Hybrid Microelectronics, the Northern California Microphotomask/Masking Working Group, the Materials Research Society, March 29-30, 1982, Santa Clara, California.
- Text
- Bellingham, Wash. : International Society for Optical Engineering, 1982.
- 1982
- 1 Item
Item details Format Call Number Item Location Text TK7874 .S85 1982 Off-site Advances in resist technology and processing XII : 20-22 February 1995, Santa Clara, California / Robert D. Allen, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.
- Text
- Bellingham, Wash., USA : SPIE, [1995], ©1995.
- 1995-1995
- 1 Item
Item details Format Call Number Item Location Text TK7874 .A25 1995g Off-site Optical/laser microlithography VIII : 22-24 February 1995, Santa Clara, California / Timothy A. Brunner, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.
- Text
- Bellingham, Wash. : SPIE, [1995], ©1995.
- 1995-1995
- 1 Item
Item details Format Call Number Item Location Text TA1677 .O673 1995g Off-site Introduction to microlithography : theory, materials, and processing / L.F. Thompson, editor, C.G. Willson, editor, M.J. Bowden, editor ; based on a workshop sponsored by the ACS Division of Organic Coatings and Plastics Chemistry at the 185th Meeting of the American Chemical Society, Seattle, Washington, March 20-25, 1983.
- Text
- Washington, D.C. : The Society, 1983.
- 1983
- 1 Item
Item details Format Call Number Item Location Text TR940 .I57 1983 Off-site Advances in resist technology and processing XIII : 11-13 March 1996, Santa Clara, California / Roderick R. Kunz, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, SEMATECH.
- Text
- Bellingham, Wash., USA : International Society for Optical Engineering, [1996], ©1996.
- 1996-1996
- 1 Item
Item details Format Call Number Item Location Text TK7874 .A25 1996g Off-site Advances in resist technology and processing XIV : 10-12 March, 1997, Santa Clara, California / Rʹegine G. Tarascon-Auriol, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, SEMATECH.
- Text
- Bellingham, Washington : International Society for Optical Engineering, [1997], ©1997.
- 1997-1997
- 1 Item
Item details Format Call Number Item Location Text TK7874 .A25 1997g Off-site Microlithography fundamentals in semiconductor devices and fabrication technology / Saburo Nonogaki, Takumi Ueno, Toshio Ito.
- Text
- New York : Marcel Dekker, [1998], ©1998.
- 1998-1998
- 1 Item
Item details Format Call Number Item Location Text TK7871.85 .N66 1998 Off-site Micro- and nanopatterning polymers / Hiroshi Ito, editor [and others].
- Text
- Washington, DC : American Chemical Society ; [New York] : Distributed by Oxford University Press, [1998], ©1998.
- 1998-1998
- 1 Item
Item details Format Call Number Item Location Text TK7871.15.P6 M517 1998 Off-site Advances in resist technology and processing XV : 23-25 February, 1998, Santa Clara, California / Will Conley, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, SEMATECH.
- Text
- Bellingham, Washington : SPIE, [1998], ©1998.
- 1998-1998
- 2 Items
Item details Format Call Number Item Location Text TA7874 .A25 1998g pt.2 Off-site Item details Format Call Number Item Location Text TA7874 .A25 1998g pt.1 Off-site Advances in resist technology and processing XVI : Microlithography 1999 : 15-17 March, 1999, Santa Clara, California / Will Conley, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.
- Text
- Bellingham, Wash. : SPIE, [1999], ©1999.
- 1999-1999
- 2 Items
Item details Format Call Number Item Location Text TK7874 .A25 1999g p.2 Off-site Item details Format Call Number Item Location Text TK7874 .A25 1999g p.1 Off-site Advances in resist technology and processing XVII : 28 February-1 March, 2000, Santa Clara, USA / Francis M. Houlihan, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
- Text
- Bellingham, Washington : SPIE, [2000], ©2000.
- 2000-2000
- 2 Items
Item details Format Call Number Item Location Text TK7874 .A25 2000g p.2 Off-site Item details Format Call Number Item Location Text TK7874 .A25 2000g p.1 Off-site Advances in resist technology and processing XVIII : 26-28 February, 2001, Santa Clara, [California] USA / Francis M. Houlihan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
- Text
- Bellingham, Washington : SPIE, [2001], ©2001.
- 2001-2001
- 1 Item
Item details Format Call Number Item Location Text TK7874 .A25 2001g Off-site Advances in resist technology and processing XIX : 4-6 March, 2002, Santa Clara, [California] USA / Theodore H. Fedynyshyn, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
- Text
- Bellingham, Washington : SPIE, [2002], ©2002.
- 2002-2002
- 2 Items
Item details Format Call Number Item Location Text TK7874 .A25 2002g v.2 Off-site Item details Format Call Number Item Location Text TK7874 .A25 2002g v.1 Off-site Advances in resist technology and processing XX : 24-26 February, 2003, Santa Clara, California, USA / Theodore H. Fedynyshyn, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, International SEMITECH, Semiconductor Equipment and Materials International.
- Text
- 2003
- 2 Items
Item details Format Call Number Item Location Text TK7874 .A25 2003g pt.2 Off-site Item details Format Call Number Item Location Text TK7874 .A25 2003g pt.1 Off-site Advances in resist technology and processing III : 10-11 March 1986, Santa Clara, California / C. Grant Willson, chairman/editor.
- Text
- 1986
- 1 Item
Item details Format Call Number Item Location Text TR940 .A479 1986 Off-site Advances in resist technology and processing XXI : 23-24 February 2004, Santa Clara, California, USA / John L. Sturtevant, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMITECH.
- Text
- 2004
- 2 Items
Item details Format Call Number Item Location Text TK7874 .A25 2004g pt.2 Off-site Item details Format Call Number Item Location Text TK7874 .A25 2004g pt.1 Off-site Microlithography : process technology for IC fabrication / David J. Elliott.
- Text
- 1986
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E495 1986 Off-site Advances in resist technology and processing IV : 2-3 March 1987, Santa Clara, California / Murrae J. Bowden, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, [1987], ©1987.
- 1987-1987
- 1 Item
Item details Format Call Number Item Location Text TK8331 .A38 1987g Off-site Polymers for high technology : electronics and photonics / Murrae J. Bowden, editor, S. Richard Turner, editor ; developed from a symposium sponsored by the Division of Polymeric Materials--Science and Engineering at the 192nd Meeting of the American Chemical Society, Anaheim, California, September 7-12, 1986.
- Text
- Washington, DC : The Society, 1987.
- 1987
- 1 Item
Item details Format Call Number Item Location Text TK7871.15.P6 P627 1987 Off-site Semiconductor lithography : principles, practices, and materials / Wayne M. Moreau.
- Text
- New York : Plenum Press, [1988], ©1988.
- 1988-1988
- 1 Item
Item details Format Call Number Item Location Text TK7871.85 .M583 1988 Off-site Advances in resist technology and processing V : 29 February-2 March, 1988, Santa Clara, California / Scott A. MacDonald, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash., USA : International Society for Optical Engineering, 1988.
- 1988
- 1 Item
Item details Format Call Number Item Location Text TR940 .A4794 1988 Off-site Electronic and photonic applications of polymers / Murrae J. Bowden, editor, S. Richard Turner, editor.
- Text
- Washington, DC : American Chemical Society, 1988.
- 1988
- 1 Item
Item details Format Call Number Item Location Text TK7871.15.P6 E44 1988g Off-site Photoreactive polymers : the science and technology of resists / Arnost Reiser.
- Text
- New York : Wiley, [1989], ©1989.
- 1989-1989
- 1 Item
Item details Format Call Number Item Location Text QD382.P45 R45 1989 Off-site Advances in resist technology and processing VI : 27 February-1 March 1989, San Jose, California / Elsa Reichmanis, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, 1989.
- 1989
- 1 Item
Item details Format Call Number Item Location Text TK8331 .A3837 1989g Off-site Proceedings of the Symposium on Inorganic Resist Systems / edited by Daryl Ann Doane, Adam Heller ; [cosponsored by] Dielectrics and Insulation and Electronics Divisions and New Technology Subcommittee.
- Text
- Pennington, NJ (10 South Main St., Pennington 08534) : Electrochemical Society, [1982], ©1982.
- 1982-1982
- 1 Item
Item details Format Call Number Item Location Text TR940 .S96 1982 Off-site Proceedings of the Symposium on Patterning Science and Technology / edited by Robert Gleason, George J. Hefferon, L.K. White ; [sponsored by the] Dielectrics and Insulation and Electronics divisions and Luminescence and Display Materials Group.
- Text
- Pennington, NJ (10 S. Main St., Pennington 08534-2896) : Electrochemical Society, [1990], ©1990.
- 1990-1990
- 1 Item
Item details Format Call Number Item Location Text TK7874 .S943 1989 Off-site Advances in resist technology and processing VII : 5-6 March 1990, San Jose, California : proceedings / Michael P. C. Watts, chair/editor : sponsored by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash., USA : SPIE--The International Society for Optical Engineering, 1990.
- 1990
- 1 Item
Item details Format Call Number Item Location Text TK8331 .A3838 1990g Off-site Microelectronics technology : polymers for advanced imaging and packaging : developed from a symposium sponsored by the ACS Division of Polymeric Materials: Science and Engineering, Inc., and the Polymers for Microelectronics Division of the Society of Polymer Science, Japan, at the 209th National Meeting of the American Chemical Society, Anaheim, California, April 2-6, 1995 / Elsa Reichmanis ... [et al., editors].
- Text
- Washington, DC : American Chemical Society, 1995.
- 1995
- 1 Item
Item details Format Call Number Item Location Text TK7874 .M475 1995 Off-site Advances in resist technology and processing XIII : 11-13 March 1996, Santa Clara, California / Roderick R. Kunz, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, SEMATECH.
- Text
- Bellingham, Wash., USA : International Society for Optical Engineering, c1996.
- 1996
- 1 Item
Item details Format Call Number Item Location Text TA1505 .P762 vol.2724 Off-site
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