Research Catalog

  • Ion implantation of semiconductors / G. Carter, W. A. Grant.

    • Text
    • New York : Wiley, 1976.
    • 1976
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 77-518Offsite
  • Neutron transmutation doping in semiconductors : [proceedings of the Second International Conference on Neutron Transmutation Doping Semiconductors, held at the University of Missouri, Columbia, Missouri, April 23-26, 1978] / edited by Jon M. Meese.

    • Text
    • New York : Plenum Press, c1979.
    • 1979
    • 1 Item
    FormatCall NumberItem Location
    Text JSF 80-516Offsite
  • The metal non-metal transition in disordered systems : proceedings of the nineteenth Scottish Universities Summer School in Physics, St. Andrews, August 1978 / edited by L. R. Friedman and D. P. Tunstall.

    • Text
    • Edinburgh : Scottish Universities Summer School in Physics, 1978.
    • 1978
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 81-1423Offsite
  • Ion implantation in microelectronics : a comprehensive bibliography / A.H. Agajanian.

    • Text
    • New York : IFI/Plenum, c1981.
    • 1981
    • 1 Item
    FormatCall NumberItem Location
    Text JSF 82-180Offsite
  • Ion implantation : equipment and techniques : proceedings of the Fourth International Conference, Berchtesgaden, Fed. Rep. of Germany, September 13-17, 1982 / editors, H. Ryssel and H. Glawischnig.

    • Text
    • Berlin ; New York : Springer-Verlag, 1983.
    • 1983
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 84-200Offsite
  • Ion implantation techniques : lectures given at the Ion Implantation School, in connection with the Fourth International Conference on Ion Implantation: Equipment and Techniques, Berchtesgaden, Fed. Rep. of Germany, September 13-15, 1982 / editors, H. Ryssel and H. Glawischnig.

    • Text
    • Berlin ; New York : Springer-Verlag, 1982.
    • 1982
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 83-534Offsite
  • A survey of semiconductor radiation techniques / V.V. Bolotov ... [et al.] ; edited by L.S. Smirnov ; [translated from the Russian by Igor Frolov].

    • Text
    • Moscow : Mir Publishers, c1983.
    • 1983
    • 1 Item
    FormatCall NumberItem Location
    Text JSD 86-158Offsite
  • Impurity diffusion and gettering in silicon : symposium held November 27-30, 1984, Boston, Massachusetts, U.S.A. / editors, Richard B. Fair, Charles W. Pearce, Jack Washburn.

    • Text
    • Pittsburgh, Pa. : Materials Research Society, c1985.
    • 1985
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 86-550Offsite
  • Rapid thermal processing of electronic materials : symposium held April 21-23, 1987, Anaheim, California, U.S.A / editors, Syd R. Wilson, Ronald Powell, D. Eirug Davies.

    • Text
    • Pittsburgh, Pa. : Materials Research Society, c1987.
    • 1987
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 88-3033Offsite
  • Rapid thermal annealing/chemical vapor deposition and integrated processing / symposium held April 25-28, 1989, San Diego, California, U.S.A. / editors, David Hodul ... [et al.].

    • Text
    • Pittsburgh, Pa. : Materials Research Society, c1989.
    • 1989
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 91-498Offsite
  • In-situ patterning : selective area deposition and etching : symposium held November 29-December 1, 1989, Boston, Massachusetts, U.S.A. / editors, Anthony F. Bernhardt, Jerry G. Black, Robert Rosenberg.

    • Text
    • Pittsburgh, Pa. : Materials Research Society, c1990.
    • 1990
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 92-1909Offsite
  • Rapid thermal and integrated processing : symposium held April 30-May 3, 1991, Anaheim, California, U.S.A. / editors, Jeffrey C. Gelpey ... [et al.].

    • Text
    • Pittsburgh, Pa. : Materials Research Society, c1991.
    • 1991
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 92-1805Offsite
  • Rapid thermal processing : science and technology / edited by Richard B. Fair.

    • Text
    • Boston : Academic Press, c1993.
    • 1993
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 94-186Offsite
  • Rapid thermal and integrated processing II : symposium held April 12-15, 1993, San Francisco, California, U.S.A. / editors, Jeffrey C. Gelpey ... [et al.].

    • Text
    • Pittsburgh, Pa. : Materials Research Society, c1993.
    • 1993
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 94-645Offsite
  • Rapid thermal and integrated processing III : symposium held April 4-7, 1994, San Francisco, California, U.S.A. / editors, Jimmie J. Wortman ... [et al.].

    • Text
    • Pittsburgh, PA : Materials Research Society, c1994.
    • 1994
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 95-1944Offsite
  • Ion implantation : basics to device fabrication / by Emanuele Rimini.

    • Text
    • Boston : Kluwer Academic Publishers, c1995.
    • 1995
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 95-165Offsite
  • Semiconductor technology : processing and novel fabrication techniques / edited by Mikhail E. Levinshtein, Michael S. Shur.

    • Text
    • New York ; Chichester, [England] : John Wiley & Sons, c1997.
    • 1997
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 97-1464Offsite
  • Doping and semiconductor junction formation.

    • Text
    • Park Ridge, N.J., Noyes Data Corp., 1970.
    • 1970
    • 1 Item
    FormatCall NumberItem Location
    Text TTE (Sittig, M. Doping and semiconductor junction formation)Offsite
  • Rapid thermal and integrated processing VII : symposium held April 13-15, 1998, San Francisco, California, U.S.A. / editors, Mehmet C. Öztürk ... [et al.].

    • Text
    • Warrendale, Pennsylvania: Materials Research Society, c1998.
    • 1998
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 99-1309Offsite
  • Growth processes and surface phase equilibria in molecular beam epitaxy / Nikolai N. Ledentsov.

    • Text
    • Berlin ; New York : Springer, c1999.
    • 1999
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 99-1597Offsite
  • Si front-end processing : physics and technology of dopant-defect interactions : symposium held April 6-9, 1999, San Francisco, California, U.S.A. / editors, Hans-Joachim L. Gossmann ... [et al.].

    • Text
    • Warrendale, Penn. : Materials Research Society, c1999.
    • 1999
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 00-1431Offsite
  • Ion implantation into semiconductors, oxides, and ceramics : proceedings of the E-MRS 1998 Spring Meeting Symposium J on Ion Implantation into Semiconductors, Oxides, and Ceramics, Strasbourg, France, 16-19 June 1998 / edited by J.K.N. Lindner ... [et al.].

    • Text
    • Amsterdam ; New York : Elsevier, 1999.
    • 1999
    • 1 Item
    FormatCall NumberItem Location
    Text JSF 00-679Offsite
  • An Ohmic model for charge transport in a semiconductor [microform] / Larry D. Edmonds.

    • Text
    • Pasadena, Calif. : National Aeronautics and Space Administration, Jet Propulsion Laboratory, California Institute of Technology ; [Springfield, Va. : National Technical Information Service, 1990]
    • 1990
  • Heavy doping effects in high efficiency silicon solar cells [microform] : quarterly report for period covering July 1, 1984 - September 30, 1984 / by F.A. Lindholm.

    • Text
    • [Pasadena, Calif. : National Aeronautics and Space Administration, Jet Propulsion Laboratory, California Institute of Technology, 1984]
    • 1984
  • Materials modification and growth using Ion beams : symposium held April 21-23, 1987, Anaheim, California, U.S.A. / editors, Ursula Gibson, Alice E. White, Peter P. Pronko.

    • Text
    • Pittsburgh, Pa. : Materials Research Society, c1987.
    • 1987
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 88-3037Offsite
  • Rapid thermal processing : symposium held December 2-4, 1985, Boston, Massachusetts, USA / editors, Thomas O. Sedgwick, Thomas E. Seidel, Bor-Yeu Tsaur.

    • Text
    • Pittsburgh, Pa. : Materials, Research Society, c1986.
    • 1986
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 87-257Offsite
  • Ion implantation technology : 16th International Conference on Ion Implantation Technology, IIT 2006, Marseille, France, 11-16 June 2006 / editors, Karen J. Kirkby ... [et al.].

    • Text
    • Melville, N.Y. : American Institute of Physics, c2006.
    • 2006
    • 1 Item
    FormatCall NumberItem Location
    Text JSF 07-305Offsite
  • Heavy doping effects in high efficiency silicon solar cells [microform] : quarterly report for period covering October 31, 1984 - December 31, 1984 / by F.A. Lindholm and A. Neugroschel.

    • Text
    • [Pasadena, Calif. : National Aeronautics and Space Administration, Jet Propulsion Laboratory, California Institute of Technology, 1984]
    • 1984
  • Heavy doping effects in high efficiency silicon solar cells [microform] : quarterly report for period covering January 1, 1985 - March 31, 1985 / by F.A. Lindholm and A. Neugroschel.

    • Text
    • [Pasadena, Calif. : National Aeronautics and Space Administration, Jet Propulsion Laboratory, California Institute of Technology, 1985?]
    • 1985
  • Rapid thermal and integrated processing : symposium held April 30-May 3, 1991, Anaheim, California, U.S.A. / editors, Jeffrey C. Gelpey [and others].

    • Text
    • Pittsburgh, Pa. : Materials Research Society, [1991], ©1991.
    • 1991-1991
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.85 .R344 1991Off-site
  • Neutron transmutation doping in semiconductors : [proceedings of the Second International Conference on Neutron Transmutation Doping Semiconductors, held at the University of Missiouri, Columbia, Missouri, April 23-26, 1978] / edited by Jon M. Meese.

    • Text
    • New York : Plenum Press, [1979], ©1979.
    • 1979-1979
    • 1 Item
    FormatCall NumberItem Location
    Text QC611.6.D6I57 1978Off-site
  • Rapid thermal and integrated processing : 10-11 September 1991, San Jose, California / Mehrdad M. Moslehi, Rajendra Singh, Dim-Lee Kwong, chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering.

    • Text
    • Bellingham, Wash. : SPIE, [1992], ©1992.
    • 1992-1992
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.85 .R3438 1992Off-site
  • Rapid thermal processing : science and technology / Richard B. Fair.

    • Text
    • Boston : Academic Press, [1993], ©1993.
    • 1993-1993
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.85 .F299 1993Off-site
  • Rapid thermal and integrated processing II / editors, Jeffrey C. Gelpey [and others] ; symposium support, AG Associates [and others] ; Symposium G, MRS Spring Meeting, April 12-15, 1993.

    • Text
    • Pittsburgh : Materials Research Society, 1993.
    • 1993
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.85 .M3687 1993Off-site
  • Ion implantation technology-92 : proceedings of the Ninth International Conference on Ion Implantation Technology, Gainesvile, FL, USA, September 20-24, 1992 / editors, D.F. Downey [and others].

    • Text
    • Amsterdam ; New York : North-Holland, 1993.
    • 1993
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.85 .I57623 1993Off-site
  • Properties of doped semiconducting materials / edited by V. S. Zemskov.

    • Text
    • New York : Nova Science Publishers, 1993.
    • 1993
    • 1 Item
    FormatCall NumberItem Location
    Text QC611.8.D66 P76 1993Off-site
  • Doping in III-V semiconductors / E. Fred Schubert.

    • Text
    • Cambridge [England] ; New York, NY, USA : Cambridge University Press, 1993.
    • 1993
    • 1 Item
    FormatCall NumberItem Location
    Text QC611.8.C64 S34 1993Off-site
  • Rapid thermal and integrated processing III : symposium held April 4-7, 1994, San Francisco, California, U.S.A. / editors, Jimmie J. Wortman [and others].

    • Text
    • Pittsburgh, PA : Materials Research Society, 1994.
    • 1994
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.85 .R344 1994Off-site
  • Ion implantation : basics to device fabrication / by Emanuele Rimini.

    • Text
    • Boston : Kluwer Academic Publishers, [1995], ©1995.
    • 1995-1995
    • 1 Item
    FormatCall NumberItem Location
    Text QC702.7.I55 R56 1995Off-site
  • Ion implantation in microelectronics : a comprehensive bibliography / A.H. Agajanian.

    • Text
    • New York : IFI/Plenum, c1981.
    • 1981
    • 1 Item
    FormatCall NumberItem Location
    Text Z5838.S4 A38Off-site
  • Delta-doping of semiconductors / edited by E.F. Schubert.

    • Text
    • Cambridge ; New York : Cambridge University Press, 1995.
    • 1995
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.85 .D457 1995Off-site
  • Rapid thermal and integrated processing IV : symposium held April 17-20, 1995, San Francisco, California, U.S.A. / editors, Steven R.J. Brueck ... [et.al.].

    • Text
    • Pittsburgh, Pa. : Materials Research Society, [1995], ©1995.
    • 1995-1995
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.85 .R3435 1995Off-site
  • Impurity doping processes in silicon / edited by F.F.Y. Wang.

    • Text
    • Amsterdam ; New York : North-Holland Pub. Co. ; New York, N.Y. : Sole distributors for the USA and Canada, Elsevier North-Holland, c1981.
    • 1981
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.85 .I48Off-site
  • Rapid thermal and integrated processing V : symposium held April 8-12, 1996, San Francisco, California, U.S.A. / editors, J.C. Gelpey ... [et.al.].

    • Text
    • Pittsburgh, Pa. : Materials Research Society, [1996], ©1996.
    • 1996-1996
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.85 .R344 1996Off-site
  • Ion implantation : equipment and techniques : proceedings of the Fourth International Conference, Berchtesgaden, Fed. Rep. of Germany, September 13-17, 1982 / editors, H. Ryssel and H. Glawischnig.

    • Text
    • Berlin ; New York : Springer-Verlag, 1983.
    • 1983
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.85 .I5864 1983Off-site
  • Ion implantation technology--96 : proceedings of the Eleventh International Conference on Ion Implantation Technology, Austin, Texas, USA, June 16-21, 1996 / editors, Emi Ishidida [sic] [and others].

    • Text
    • Piscataway, NJ : Institute of Electrical and Electronics Engineers, [1997], ©1997.
    • 1997-1997
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.85 .I57623 1996Off-site
  • Selected topics in group IV and II-VI semiconductors : proceedings of Symposium L, 6th International Symposium on Silicon Molecular Beam Epitaxy, and Symposium D on Purification, Doping and Defects in II-VI Materials of the 1995 E-MRS Spring Conference, Strasbourg, France, May 22-26, 1995 / edited by E. Kasper [and others].

    • Text
    • Amsterdam ; New York : Elsevier, 1996.
    • 1996
    • 1 Item
    FormatCall NumberItem Location
    Text QC611.6.M64 I58 1995Off-site
  • Semiconductor technology : processing and novel fabrication techniques / edited by Mikhail E. Levinshtein, Michael S. Shur.

    • Text
    • New York : John Wiley, [1997], ©1997.
    • 1997-1997
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.85 .S4453 1997Off-site
  • Materials modification and synthesis by ion beam processing : symposium held December 2-5, 1996, Boston, Massachusetts, U.S.A. / editors, Dale E. Alexander [and others].

    • Text
    • Pittsburgh, Pa. : Materials Research Society, [1997], ©1997.
    • 1997-1997
    • 1 Item
    FormatCall NumberItem Location
    Text TA418.6 .M374 1997Off-site
  • Defects and diffusion in silicon processing : symposium held April 1-4, 1997, San Francisco, California, U.S.A. / Tomas Diaz de la Rubia [and others].

    • Text
    • Pittsburg, Pa. : Materials Research Society, [1997], ©1997.
    • 1997-1997
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871.85 .D45453 1997Off-site

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