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Displaying 1-50 of 210 results
Microlithography : process technology for IC fabrication / David J. Elliott.
- Text
- New York : McGraw-Hill, c1986.
- 1986
- 1 Item
Item details Format Call Number Item Location Text JSE 87-1927 Offsite Polymers for high technology : electronics and photonics / Murrae J. Bowden, editor, S. Richard Turner, editor ; developed from a symposium sponsored by the Division of Polymeric Materials--Science and Engineering at the 192nd Meeting of the American Chemical Society, Anaheim, California, September 7-12, 1986.
- Text
- Washington, DC : The Society, 1987.
- 1987
- 2 Items
Item details Format Call Number Item Location Text JSK 76-18 v. 346 Offsite Item details Format Call Number Item Location Text JSK 76-18 v. 346 Offsite Semiconductor lithography : principles, practices, and materials / Wayne M. Moreau.
- Text
- New York : Plenum Press, c1988.
- 1988
- 1 Item
Item details Format Call Number Item Location Text JSF 88-1620 Offsite Laser microfabrication : thin film processes and lithography / edited by Daniel J. Ehrlich, Jeffrey Y. Tsao.
- Text
- Boston : Academic Press, c1989.
- 1989
- 1 Item
Item details Format Call Number Item Location Text JSE 89-1648 Offsite Introduction to microlithography : theory, materials, and processing / L.F. Thompson, editor ; C.G. Willson, editor ; M.J. Bowden, editor ; based on a workshop sponsored by the ACS Division of Organic Coatings and Plastics Chemistry at the 185th Meeting of the American Chemical Society, Seattle, Washington, March 20-25, 1983.
- Text
- Washington, D.C. : The Society, 1983.
- 1983
- 1 Item
Item details Format Call Number Item Location Text JSK 76-18 v. 219 Offsite Microcircuit Engineering 88 : proceedings of the International Conference on Microlithography, September 20-22, 1988, Vienna, Austria / edited by F. Paschke, W. Fallmann and H. Löschner.
- Text
- Amsterdam ; New York : North-Holand ; New York, N.Y. U.S.A. : Distributors for the U.S. and Canada, Elsevier Science Pub. Co., 1989.
- 1989-1989
- 1 Item
Item details Format Call Number Item Location Text JSF 90-132 Offsite Materials for microlithography : radiation-sensitive polymers : based on a symposium cosponsored by the Division of Polymeric Materials, Science and Engineering and the Division of Polymer Chemistry, at the 187th Meeting of the American Chemical Society, St. Louis, Missouri, April 8-13, 1984 / L.F. Thompson, editor, C.G. Willson, editor, J.M.J. Fréchet, editor.
- Text
- Washington, D.C. : The Society, 1984.
- 1984
- 1 Item
Item details Format Call Number Item Location Text JSK 76-18 v. 266 Offsite Polymers in microlithography : materials and processes / Elsa Reichmanis, editor, Scott A. MacDonald, editor, Takao Iwayanagi, editor.
- Text
- Washington, DC : American Chemical Society, 1989.
- 1989
- 1 Item
Item details Format Call Number Item Location Text JSE 90-52 Offsite Microcircuit Engineering 89 : proceedings of the International Conference on Microlithography, September 26-28, 1989, Cambridge, England / edited by H. Ahmed ... [et al.].
- Text
- Amsterdam ; New York : Elsevier ; Tokyo : Ohmsha ; New York, N.Y., U.S.A. : Distributors for the United States and Canada, Elsevier Science Pub. Co., c1990.
- 1990
- 1 Item
Item details Format Call Number Item Location Text JSF 91-848 Offsite Nanolithography : a borderland between STM, EB, IB, and X-ray lithographies / edited by M. Gentili, C. Giovannella, and S. Selci.
- Text
- Dordrecht ; Boston : Kluwer Academic Publishers, 1994.
- 1994
- 1 Item
Item details Format Call Number Item Location Text JSE 94-1357 Offsite Introduction to microlithography / edited by Larry F. Thompson, C. Grant Willson, Murrae J. Bowden.
- Text
- Washington, DC : American Chemical Society, 1994.
- 1994
- 1 Item
Item details Format Call Number Item Location Text JSE 95-1394 Offsite Handbook of microlithography, micromachining, and microfabrication / P. Rai-Choudhury, editor.
- Text
- Bellingham, Wash., USA : SPIE Optical Engineering Press ; London, UK : Institution of Electrical Engineers, c1997.
- 1997
- 2 Items
Item details Format Call Number Item Location Text JSM 97-104 v. 1 Offsite Item details Format Call Number Item Location Text JSM 97-104 v. 2 Offsite Microlithography world.
- Text
- Port Washington, N.Y. : Penn Well Publication, published in cooperation with SPIE, 1992-
- 1992-present
- 2 Items
Item details Format Call Number Item Location Text JSM 98-51 v. 6, no. 1 (Win 1997) Offsite Item details Format Call Number Item Location Text JSM 98-51 v. 7-17, inc. (1998-2008) Offsite Microlithography fundamentals in semiconductor devices and fabrication technology / Saburo Nonogaki, Takumi Ueno, Toshio Ito.
- Text
- New York : Marcel Dekker, c1998.
- 1998
- 1 Item
Item details Format Call Number Item Location Text JSE 98-1154 Offsite Microlithography : science and technology / edited by James R. Sheats, Bruce W. Smith.
- Text
- New York : Marcel Dekker, c1998.
- 1998
- 1 Item
Item details Format Call Number Item Location Text JSE 99-1434 Offsite Scanning probe lithography / by Hyongsok T. Soh, Kathryn Wilder Guarini, Calvin F. Quate.
- Text
- Boston ; London : Kluwer Academic Publishers, c2001.
- 2001
- 1 Item
Item details Format Call Number Item Location Text JSE 01-1424 Offsite Photomask fabrication technology / Benjamin G. Eynon, Jr., Banqiu Wu.
- Text
- New York : McGraw-Hill, c2005.
- 2005
- 1 Item
Item details Format Call Number Item Location Text JSE 05-1224 Offsite Microlithography : science and technology / edited by Kazuaki Suzuki, Bruce W. Smith.
- Text
- Boca Raton : CRC Press, c2007.
- 2007
- 1 Item
Available Online
http://www.loc.gov/catdir/toc/ecip071/2006031516.htmlItem details Format Call Number Item Location Text JSF 08-241 Offsite Microlithography world [electronic resource].
- Text
- Port Washington, N.Y. : Penn Well Publication, published in cooperation with SPIE, [1992]-2008.
- 1992-2008
- 2 Resources
Available Online
See All Available Online Resources
Optical/laser microlithography IV : 6-8 March 1991, San Jose, California / Victor Pol, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash. : SPIE-the International Society for Optical Engineering, [1991], ©1991.
- 1991-1991
- 1 Item
Item details Format Call Number Item Location Text TA1677 .O674 1991g Off-site Microcircuit Engineering 90 : proceedings of the International Conference on Microlithography, September 18-20, 1990, Leuven, Belgium / edited by G. Declerck, L. Van den hove, F. Coopmans.
- Text
- Amsterdam ; New York : Elsevier ; New York, N.Y., U.S.A. : Distributors for the United States and Canada, Elsevier Science Pub. Co., [1991], ©1991.
- 1991-1991
- 1 Item
Item details Format Call Number Item Location Text TK7874 .M453 1990 Off-site Metallization : performance and reliability issues for VLSI and ULSI : 12-13 September 1991, San Jose, California / Gennady S. Gildenblat, Gary P. Schwartz, chairs/editors ; sponsored by SPIE--The International Society for Optical Engineering.
- Text
- Bellingham, Wash., USA : SPIE, 1991.
- 1991
- 1 Item
Item details Format Call Number Item Location Text TK7874 .M48 1991g Off-site 11th annual Symposium on Photomask Technology : proceedings : September 25-27, 1991, Sunnyvale, California / sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology.
- Text
- Bellingham, Wash. : SPIE--the International Society for Optical Engineering, [1992], ©1992.
- 1992-1992
- 1 Item
Item details Format Call Number Item Location Text TK7874 .S9434 1991 Off-site Microcircuit Engineering 91 : proceedings of the International Conference on Microlithography, September 17-19, 1991, Rome, Italy / A. Tucciarone, A. Paoletti, P. Paroli.
- Text
- Amsterdam ; New York : Elsevier, [1992], ©1992.
- 1992-1992
- 1 Item
Item details Format Call Number Item Location Text TK7874 .M453 1991 Off-site Optical/laser microlithography V : 11-13 March 1992, San Jose, California / John D. Cuthbert, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash., USA : SPIE, [1992], ©1992.
- 1992-1992
- 2 Items
Item details Format Call Number Item Location Text TA1677 .O67 1992g v.2 Off-site Item details Format Call Number Item Location Text TA1677 .O67 1992g v.1 Off-site Proceedings of the Symposia on Patterning Science and Technology II / edited by Wayne Greene, George J. Hefferon, L. K. White [and] Interconnection and Contact Metallization for ULSI / edited by Terry O. Herndon, Andrew L. Wu ; [sponsored by the] Dielectric Science and Technology and Electronics divisions.
- Text
- Pennington, NJ (10 S. Main St., Pennington 08534-2896) : Electrochemical Society, [1992], ©1992.
- 1992-1992
- 1 Item
Item details Format Call Number Item Location Text TK7874 .S943 1991 Off-site 12th annual Symposium on Photomask Technology and Management : proceedings : 23-24 September 1992, Sunnyvale, California / sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology.
- Text
- Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, [1993], ©1993.
- 1993-1993
- 1 Item
Item details Format Call Number Item Location Text TK7874 .S9434 1992g Off-site Optical/laser microlithography : 3-5 March 1993, San Jose, California / John D. Cuthbert, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash., USA : SPIE, [1993], ©1993.
- 1993-present
- 2 Items
Item details Format Call Number Item Location Text TA1677 .O673 1993g v.2 Off-site Item details Format Call Number Item Location Text TA1677 .O673 1993g v.1 Off-site Optical/laser microlithography VII : 2-4 March 1994, San Jose, California / Timothy A. Brunner, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.
- Text
- Bellingham, Wash., USA : SPIE, [1994], ©1994.
- 1994-1994
- 1 Item
Item details Format Call Number Item Location Text TA1677 .O673 1994g Off-site Photomask and X-ray mask technology II : 20-21 April 1995, Kawasaki City, Kanagawa, Japan / Hideo Yoshihara, editor ; sponsored by Photomask Japan ; BACUS ; SPIE--the International Society for Optical Engineering ; cosponsored by Japan Chapter of SPIE [and others].
- Text
- Bellingham, Wash. : SPIE, [1995], ©1995.
- 1995-1995
- 1 Item
Item details Format Call Number Item Location Text TK7874 .P46 1995g Off-site Optical/laser microlithography VIII : 22-24 February 1995, Santa Clara, California / Timothy A. Brunner, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.
- Text
- Bellingham, Wash. : SPIE, [1995], ©1995.
- 1995-1995
- 1 Item
Item details Format Call Number Item Location Text TA1677 .O673 1995g Off-site Microlithography amd metrology in micromachining : 23-24 October, 1995, Austin, Texas / Michael T. Postek, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash., USA : SPIE, [1995], ©1995.
- 1995-1995
- 1 Item
Item details Format Call Number Item Location Text QC176.8.M5 M39 1995g Off-site 15th Annual Symposium on Photomask Technology and Management : proceedings : 20-22 September, 1995, Santa Clara, California / Gilbert V. Sheldon, James N. Wiley, chairs/editors; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology, published by SPIE--The International society for Optical Engineering.
- Text
- Bellingham, Wash. : SPIE--the International Society for Optical Engineering, [1995], ©1995.
- 1995-1995
- 1 Item
Item details Format Call Number Item Location Text TK7874 .S9274 1995g Off-site Optical microlithography IX : 13-15 March, 1996, Santa Clara, California / Gene E. Fuller, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering; cooperating organizations SEMI--Semiconductor Equipment and Materials International, SEMATECH.
- Text
- Bellingham, Wash., USA : SPIE, [1996], ©1996.
- 1996-1996
- 1 Item
Item details Format Call Number Item Location Text TR940 .O695 1996g Off-site Microlithography and metrology in micromachining II : 14-15 October 1996, Austin, Texas / Michael T. Postek, Craig Friedrich, chairs/editors ; sponsored by SPIE--the International Society for Optical Engineering, SEMI--Semiconductor Equipment and Materials International, NIST--National Institute of Standards and Technology.
- Text
- Bellingham, Wash. : SPIE, [1996], ©1996.
- 1996-1996
- 1 Item
Item details Format Call Number Item Location Text QC176.8.M5 M39 1996g Off-site Photomask and X-ray mask technology III : 18-19 April, 1996, Kawasaki City, Kanagawa, Japan / Hideo Yoshihara, editor ; sponsored by Photomask Japan, BACUS, SPIE--the International Society for Optical Engineering ; cosponsored by Japan Chapter of SPIE [and others].
- Text
- Bellingham, Wash. : SPIE, [1965], ©1965.
- 1965-1965
- 1 Item
Item details Format Call Number Item Location Text TK7874 .P46 1996g Off-site 16th Annual Symposium on Photomask Technology and Management : proceedings : 18-20 September, 1996, Redwood City, California / Gilbert V. Shelden, James A Reynolds, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology.
- Text
- Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, [1996], ©1996.
- 1996-1996
- 1 Item
Item details Format Call Number Item Location Text TK7874 .S9274 1996g Off-site Optical microlithography X : 12-14 March, 1997, Santa Clara, California / Gene E. Fuller, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations SEMI--Semiconductor Equipment and Materials International, SEMATECH.
- Text
- Bellingham, Washington : SPIE, [1997], ©1997.
- 1997-1997
- 1 Item
Item details Format Call Number Item Location Text TR940 .O695 1997g Off-site Handbook of microlithography, micromachining, and microfabrication / P. Rai-Choudhury, editor.
- Text
- Bellingham, Wash., USA : SPIE Optical Engineering Press ; London, UK : Institution of Electrical Engineers, ©1997-
- 1997-present
- 2 Items
Item details Format Call Number Item Location Text TK7836 .H3423 1997 v.2 Off-site Item details Format Call Number Item Location Text TK7836 .H3423 1997 v.1 Off-site Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan / Naoaki Aizaki, editor ; sponsored by Photomask Japan, BACUS, SPIE--the International Society for Optical Engineering ; supporting societies, the Japan Society of Applied Physics [and others] ; published by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Washington : SPIE, [1997], ©1997.
- 1997-1997
- 1 Item
Item details Format Call Number Item Location Text TK7878 .P46 1997g Off-site Microlithographic techniques in IC fabrication : 25-26 June, 1997, Singapore / Soon-Fatt Yoon, Raymond Yu, Chris A. Mack, chairs/editors ; sponsored by SPIE--the International Society for Optical Engineering, SPIE Singapore Chapter, Institute of Physics Singapore ; cosponsored by SPIE Japan Chapter [and others] ; cooperating organizations Nanyang Technological University (Singapore) [and others] ; published by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Washington : SPIE, [1997], ©1997.
- 1997-1997
- 1 Item
Item details Format Call Number Item Location Text TK7835 .M435 1997g Off-site Microlithography and metrology in micromachining III : 29-30 September, 1997, Austin, Texas / Craig R. Friedrich, Akira Umeda, chairs/editors ; sponsored by SPIE--the Internatinoal Society for optical Engineering, SEMI--Semiconductor Equipment and Materials International, NIST--National Institute of Standards and Technology ; cooperating organization Solid State Technology ; published by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Washington : SPIE, [1997], ©1997.
- 1997-1997
- 1 Item
Item details Format Call Number Item Location Text QC176.8.M5 M39 1997g Off-site 17th Annual Symposium on Photomask Technology and Management : : 17-19 September, 1997, Redwood City, California / James A Reynolds, Brian J. Grenon, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology ; published by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Washington : SPIE, [1998], ©1998.
- 1998-1998
- 1 Item
Item details Format Call Number Item Location Text TK7874 .S9274 1997g Off-site Microlithography : science and technology / edited by James R. Sheats, Bruce W. Smith.
- Text
- New York : Marcel Dekker, [1998], ©1998.
- 1998-1998
- 1 Item
Item details Format Call Number Item Location Text TK7836 .M525 1998 Off-site Microlithography fundamentals in semiconductor devices and fabrication technology / Saburo Nonogaki, Takumi Ueno, Toshio Ito.
- Text
- New York : Marcel Dekker, [1998], ©1998.
- 1998-1998
- 1 Item
Item details Format Call Number Item Location Text TK7871.85 .N66 1998 Off-site Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, Santa Clara, California / Bhanwar Singh, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] SEMATECH.
- Text
- Bellingham, Wash., USA : SPIE, [1998], ©1998.
- 1998-1998
- 1 Item
Item details Format Call Number Item Location Text TK7874 .M4376 1998 Off-site Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California / Yuli Vladimirsky, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, SEMATECH.
- Text
- Bellingham, Wash. : SPIE, [1998], ©1998.
- 1998-1998
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E523 1998g Off-site Photomask and X-ray mask technology VI : 13-14 April, 1999, Yokohama, Japan / Hiraoki Morimoto, editor ; sponsored by Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations, the Japan Society of Applied Physics [and others].
- Text
- Bellingham, Wash., USA : SPIE, [1999], ©1999.
- 1999-1999
- 1 Item
Item details Format Call Number Item Location Text TK7872.M3 P46 1999g Off-site Optical microlithography XI : 25-27 February, 1998, Santa Clara, California / Luc Van den hove, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations SEMI--Semiconductor Equipment and Materials International, SEMATECH.
- Text
- Bellingham, Washington : SPIE, [1998], ©1998.
- 1998-1998
- 1 Item
Item details Format Call Number Item Location Text TK7872.M3 O68 1998 Off-site Etching in microsystem technology / Michael Köhler ; translated by Antje Wiegand.
- Text
- Weinheim ; New York : Wiley-VCH, [1999], ©1999.
- 1999-1999
- 1 Item
Item details Format Call Number Item Location Text TK7872.M3 K64 1999 Off-site
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