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Displaying 1-41 of 41 results
Methods and materials in microelectronic technology / edited by Joachim Bargon.
- Text
- New York : Plenum Press, c1984.
- 1984
- 1 Item
Item details Format Call Number Item Location Text JSF 86-1045 Offsite Ion tracks and microtechnology : principles and applications / Reimar Spohr ; edited by Klaus Bethge.
- Text
- Braunschweig : Vieweg, c1990.
- 1990
- 1 Item
Item details Format Call Number Item Location Text JSE 91-1669 Offsite The physics of submicron lithography / Kamil A. Valiev.
- Text
- New York : Plenum Press, c1992.
- 1992
- 1 Item
Item details Format Call Number Item Location Text JSF 92-934 Offsite Patterning of material layers in submicron region / U.S. Tandon, W.S. Khokle.
- Text
- New York : J. Wiley, 1993.
- 1993
- 1 Item
Item details Format Call Number Item Location Text JSF 95-175 Offsite Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing : 6-7 March 1991, San Jose, California / Martin Peckerar, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash., USA : SPIE, [1991], ©1991.
- 1991-1991
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E4357 1991g Off-site The physics of submicron lithography / Kamil A. Valiev.
- Text
- New York : Plenum Press, [1992], ©1992.
- 1992-1992
- 1 Item
Item details Format Call Number Item Location Text TK7874 .V336 1992 Off-site Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing II : 8-9 March 1992, San Jose, California / Martin Peckerar,chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash., USA : SPIE, [1992], ©1992.
- 1992-1992
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E4818 1992g Off-site Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III : 1-2 March 1993, San Jose, California / David O. Patterson, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash. : The Society, [1993], ©1993.
- 1993-1993
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E4863 1992g Off-site Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV : 28 February-1 March 1994, San Jose, California / David O. Patterson, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.
- Text
- Bellingham, Wash., USA : SPIE, [1994], ©1994.
- 1994-1994
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E4834 1994g Off-site Patterning of material layers in submicron region / U.S. Tandon, W.S. Khokle.
- Text
- New York : J. Wiley, 1993.
- 1993
- 1 Item
Item details Format Call Number Item Location Text TK7872.M3 P38 1993 Off-site Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V : 20-21 February 1995, Santa Clara, California / John M. Warlaumont, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.
- Text
- Bellingham, Wash., USA : SPIE, [1995], ©1995.
- 1995-1995
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E44 1995g Off-site Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March, 1996, Santa Clara, California / David E. Seeger, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International, SEMATECH.
- Text
- Bellingham, Wash. : SPIE, [1996], ©1996.
- 1996-1996
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E44 1996g Off-site EUV, X-ray, and neutron optics and sources : 21-23 July 1999, Denver, Colorado / Carolyn A. MacDonald [and others], chairs/editors ; sponsored ... by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash., USA : SPIE, [1999], ©1999.
- 1999-1999
- 1 Item
Item details Format Call Number Item Location Text TA1775 .E98 1999g Off-site Methods and materials in microelectronic technology / edited by Joachim Bargon.
- Text
- 1984
- 1 Item
Item details Format Call Number Item Location Text TK7874 .I5924 1982 Off-site Electron-beam, x-ray, & ion-beam techniques for submicrometer lithographies V : 11-12 March 1986, Santa Clara, California / Phillip D. Blais, chairman/editor.
- Text
- Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, c1986.
- 1986
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E43 Off-site Electron-beam, X-ray, and ion-beam lithographies VI : 5-6 March 1987, Santa Clara, California / Phillip D. Blais, chair/editor.
- Text
- Bellingham, Wash. : SPIE--the International Society for Optical Engineering, 1987.
- 1987
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E4775 1987g Off-site Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VII : 2-4 March 1988, Santa Clara, California / Arnold W. Yanof, chair/editor ; sponsored by SPIE-the International Society for Optical Engineering.
- Text
- Bellingham, Wash., USA : The Society, [1988], ©1988.
- 1988-1988
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E4826 1988 Off-site Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VIII : 1-3 March 1989, San Jose, California / Arnold W. Yanof, chair/editor ; sponsored by SPIE-the International Society for Optical Engineering.
- Text
- Bellingham, Wash., USA : The Society, [1989], ©1989.
- 1989-1989
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E4355 1989g Off-site Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies IX : 7-8 March 1990, San Jose, California / Douglas J. Resnick, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, [1990], ©1990.
- 1990-1990
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E4356 1990g Off-site Stereolithography and other RP & M technologies : from rapid prototyping to rapid tooling / Paul F. Jacobs.
- Text
- Dearborn, Mich. : Society of Manufacturing Engineers in cooperation with the Rapid Prototyping Association of SME ; New York : ASME Press, ©1996.
- 1996
- 1 Item
Item details Format Call Number Item Location Text TS171.4 .J33 1996 Off-site Stereolithography and other RP&M technologies : from rapid prototyping to rapid tooling / Paul F. Jacobs.
- Text
- Dearborn, Mich. : Society of Manufacturing Engineers in cooperation with the Rapid Prototyping Association of SME ; New York : ASME Press, c1996.
- 1996
- 1 Item
Item details Format Call Number Item Location Text TS171.4 .J33 1996 Off-site Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California / David E. Seeger, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering : cooperating organization SEMI--Semiconductor Equipment and Materials International, SEMATECH.
- Text
- Bellingham, Wash., USA : SPIE, c1996.
- 1996
- 1 Item
Item details Format Call Number Item Location Text TA1505 .P762 vol.2723 Off-site Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV : March 14-15, 1985, Santa Clara, California / Philip D. Blais, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics.
- Text
- 1985
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E433 Off-site Electron-beam, x-ray, & ion-beam techniques for submicrometer lithographies V : 11-12 March 1986, Santa Clara, California / Phillip D. Blais, chairman/editor.
- Text
- Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, c1986.
- 1986
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E434 Off-site Electron-beam, X-ray, and ion-beam lithographies VI : 5-6 March 1987, Santa Clara, California / Phillip D. Blais, chair/editor.
- Text
- 1987
- 1 Item
Item details Format Call Number Item Location Text TK7874.E435 Off-site Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VIII : 1-3 March 1989, San Jose, California / Arnold W. Yanof, chair/editor ; sponsored by SPIE-the International Society for Optical Engineering.
- Text
- 1989
- 1 Item
Item details Format Call Number Item Location Text TK7874.E4355 Off-site Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies IX : 7-8 March 1990, San Jose, California / Douglas J. Resnick, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, c1990.
- 1990
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E4356 Off-site Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing : 6-7 March 1991, San Jose, California / Martin Peckerar, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash., USA : SPIE, c1991.
- 1991
- 2 Items
Item details Format Call Number Item Location Text Off-site Not available - Please for assistance.Item details Format Call Number Item Location Text TK7874 .E4357 Off-site Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III : 1-2 March 1993, San Jose, California / David O. Patterson chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
- Text
- 1993
- 1 Item
Item details Format Call Number Item Location Text TK7874.E4359 1993 Off-site Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV : 28 February-1 March 1994, San Jose, California / David O. Patterson chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering : cooperating organization SEMI--Semiconductor Equipment and Materials International.
- Text
- 1994
- 1 Item
Item details Format Call Number Item Location Text TK7874.E436 1994 Off-site Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V : 20-21 February 1995, Santa Clara, California / John M. Warlaumont, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering : cooperating organization SEMI--Semiconductor Equipment and Materials International.
- Text
- Bellingham, Wash., USA : SPIE, c1995.
- 1995
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E437 1995 Off-site Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California / David E. Seeger, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering : cooperating organization SEMI--Semiconductor Equipment and Materials International, SEMATECH.
- Text
- Bellingham, Wash., USA : SPIE, c1996.
- 1996
- 1 Item
Item details Format Call Number Item Location Text TA1505 .P762 vol.2723 Off-site Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV : March 14-15, 1985, Santa Clara, California / Philip D. Blais, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics.
- Text
- Bellingham, Wash. : SPIE--the International Society for Optical Engineering, c1985.
- 1985
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E433 Off-site Electron-beam, x-ray, & ion-beam techniques for submicrometer lithographies V : 11-12 March 1986, Santa Clara, California / Phillip D. Blais, chairman/editor.
- Text
- Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, c1986.
- 1986
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E434 Off-site Electron-beam, X-ray, and ion-beam lithographies VI : 5-6 March 1987, Santa Clara, California / Phillip D. Blais, chair/editor.
- Text
- Bellingham, Wash. : SPIE--the International Society for Optical Engineering, 1987.
- 1987
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E435 Off-site Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VIII : 1-3 March 1989, San Jose, California / Arnold W. Yanof, chair/editor ; sponsored by SPIE-the International Society for Optical Engineering.
- Text
- Bellingham, Wash., USA : The Society, c1989.
- 1989
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E4355 Off-site Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies IX : 7-8 March 1990, San Jose, California / Douglas J. Resnick, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash. : Society of Photo-optical Instrumentation Engineers, ©1990.
- 1990
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E4356 Off-site Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing : 6-7 March 1991, San Jose, California / Martin Peckerar, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash., USA : SPIE, c1991.
- 1991
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E4357 Off-site Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III : 1-2 March 1993, San Jose, California / David O. Patterson chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash., USA : SPIE, c1993.
- 1993
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E4359 1993 Off-site Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV : 28 February-1 March 1994, San Jose, California / David O. Patterson chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering : cooperating organization SEMI--Semiconductor Equipment and Materials International.
- Text
- Bellingham, Wash., USA : SPIE, c1994.
- 1994
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E436 1994 Off-site Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V : 20-21 February 1995, Santa Clara, California / John M. Warlaumont, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering : cooperating organization SEMI--Semiconductor Equipment and Materials International.
- Text
- Bellingham, Wash., USA : SPIE, c1995.
- 1995
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E437 1995 Off-site
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