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Displaying 1-50 of 63 results
Plasma synthesis and etching of electronic materials : symposium held November 27-30, 1984, Boston, Massachusetts, U.S.A. / editors, R.P.H. Chang, B. Abeles.
- Text
- Pittsburgh, Pa. : Materials Research Society, c1985.
- 1985
- 1 Item
Item details Format Call Number Item Location Text JSE 86-552 Offsite Applications of plasma processes to VLSI technology / edited by Takuo Sugano ; translated by Hyo-gun Kim.
- Text
- New York : John Wiley & Sons, c1985.
- 1985
- 1 Item
Item details Format Call Number Item Location Text JSE 86-2282 Offsite Photon, beam, and plasma stimulated chemical processes at surfaces : symposium held December 1-4, 1986, Boston, Massachusetts, U.S.A. / editors, Vincent M. Donnelly, Irving P. Herman, Masataka Hirose.
- Text
- Pittsburgh, Pa. : Materials Research Society, c1987.
- 1987
- 1 Item
Item details Format Call Number Item Location Text JSE 88-3021 Offsite Introduction to microlithography : theory, materials, and processing / L.F. Thompson, editor ; C.G. Willson, editor ; M.J. Bowden, editor ; based on a workshop sponsored by the ACS Division of Organic Coatings and Plastics Chemistry at the 185th Meeting of the American Chemical Society, Seattle, Washington, March 20-25, 1983.
- Text
- Washington, D.C. : The Society, 1983.
- 1983
- 1 Item
Item details Format Call Number Item Location Text JSK 76-18 v. 219 Offsite Plasma etching : an introduction / edited by Dennis M. Manos, Daniel L. Flamm.
- Text
- Boston : Academic Press, c1989.
- 1989
- 1 Item
Item details Format Call Number Item Location Text JSE 90-235 Offsite Plasma-surface interactions and processing of materials / edited by Orlando Auciello ... [et al.]
- Text
- Dordrecht ; Boston : Kluwer Academic Publishers, c1990.
- 1990
- 1 Item
Item details Format Call Number Item Location Text JSE 90-902 Offsite Dry etching for VLSI / A.J. van Roosmalen, J.A.G. Baggerman, S.J.H. Brader.
- Text
- New York : Plenum Press, c1991.
- 1991
- 1 Item
Item details Format Call Number Item Location Text JSF 92-422 Offsite Plasma processing and synthesis of materials III : symposium held April 17-19, 1990, San Francisco, California, U.S.A. / editors, Diran Apelian, Julian Szekely.
- Text
- Pittsburgh, Pa. : Materials Research Society, c1991.
- 1991
- 1 Item
Item details Format Call Number Item Location Text JSE 92-1884 Offsite In-situ patterning : selective area deposition and etching : symposium held November 29-December 1, 1989, Boston, Massachusetts, U.S.A. / editors, Anthony F. Bernhardt, Jerry G. Black, Robert Rosenberg.
- Text
- Pittsburgh, Pa. : Materials Research Society, c1990.
- 1990
- 1 Item
Item details Format Call Number Item Location Text JSE 92-1909 Offsite Photons and low energy particles in surface processing : symposium held December 3-6, 1991, Boston, Massachusetts, U.S.A. / editors, Carol I.H. Ashby, James H. Brannon, Stella W. Pang.
- Text
- Pittsburgh, Pa. : Materials Research Society, c1992.
- 1992
- 1 Item
Item details Format Call Number Item Location Text JSE 93-745 Offsite Materials modification by energetic atoms and ions : symposium held April 28-30, 1992, San Francisco, California, U.S.A. / editors, Kenneth S. Grabowski ... [et al.].
- Text
- Pittsburgh, Pa. : Materials Research Society, c1992.
- 1992
- 1 Item
Item details Format Call Number Item Location Text JSE 93-1804 Offsite Plasma properties, deposition and etching / editors, J.J. Pouch and S.A. Alterovitz.
- Text
- Aedermannsdorf, Switzerland ; Brookfield, VT : Trans Tech Publications, 1993.
- 1993
- 1 Item
Item details Format Call Number Item Location Text JSF 94-321 Offsite Principles of plasma discharges and materials processing / Michael A. Lieberman, Allan J. Lichtenberg.
- Text
- New York : Wiley, c1994.
- 1994
- 1 Item
Item details Format Call Number Item Location Text JSE 95-1369 Offsite Introduction to microlithography / edited by Larry F. Thompson, C. Grant Willson, Murrae J. Bowden.
- Text
- Washington, DC : American Chemical Society, 1994.
- 1994
- 1 Item
Item details Format Call Number Item Location Text JSE 95-1394 Offsite Plasma processing of semiconductors / edited by P.F. Williams.
- Text
- Boston : Kluwer, 1997.
- 1997
- 1 Item
Item details Format Call Number Item Location Text JSE 97-673 Offsite Not available - In use until 2024-06-05 - Please for assistance.Plasma etching a ceramic composite [microform] / David R. Hull, Todd A. Leonhardt, and William A. Sanders.
- Text
- [Washington, DC] : National Aeronautics and Space Administration ; [Springfield, Va. : National Technical Information Service [distributor], 1992]
- 1992
Microstructural characterization of reaction-formed silicon carbide ceramics [microform] / M. Singh and T.A. Leonhardt.
- Text
- [Washington, D.C. : National Aeronautics and Space Administration ; Springfield, Va. : National Technical Information Service, distributor, 1995]
- 1995
Plasma etching in semiconductor fabrication / Russ A. Morgan.
- Text
- Amsterdam ; New York : Elsevier, 1985.
- 1985
- 1 Item
Item details Format Call Number Item Location Text JSE 87-794 Offsite Proceedings of the Eighth Symposium on Plasma Processing / edited by G.S. Mathad and D.W. Hess.
- Text
- Pennington, NJ (10 S. Main St., Pennington 08534-2896) : Electrochemical Society, [1990], ©1990.
- 1990-1990
- 1 Item
Item details Format Call Number Item Location Text TK7871.85 .S974 1990 Off-site Photons and low energy particles in surface processing : symposium held December 3-6, 1991, Boston, Massachusetts, U.S.A. / editors, Carol I.H. Ashby, James H. Brannon, Stella W. Pang.
- Text
- Pittsburgh, Pa. : Materials Research Society, [1992], ©1992.
- 1992-1992
- 1 Item
Item details Format Call Number Item Location Text TA418.7 .P46 1992 Off-site Proceedings of the Ninth Symposium on Plasma Processing / edited by G.S. Mathad, D.W. Hess.
- Text
- Pennington, NJ : Electrochemical Society, [1992], ©1992.
- 1992-1992
- 1 Item
Item details Format Call Number Item Location Text TK7871.85 .S974 1992 Off-site Proceedings of the Symposium on Highly Selective Dry Etching and Damage Control / edited by G.S. Mathad, Y. Horiike.
- Text
- Pennington, NJ : Electrochemical Society, [1993], ©1993.
- 1993-1993
- 1 Item
Item details Format Call Number Item Location Text TK7871.85 .S956 1993 Off-site Microelectronic processes, sensors, and controls : 27-29 September 1993, Monterey, California / James A. Bondur [and others], chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash., USA : SPIE, [1994], ©1994.
- 1994-1994
- 1 Item
Item details Format Call Number Item Location Text TK7874 .M468 1994g Off-site Principles of plasma discharges and materials processing / Michael A. Lieberman, Allan J. Lichtenberg.
- Text
- New York : Wiley, [1994], ©1994.
- 1994-1994
- 1 Item
Item details Format Call Number Item Location Text QC718.5.D9 L54 1994 Off-site Proceedings of the Tenth Symposium on Plasma Processing : May 22-27, 1994 / edited by G.S. Mathad, D.W. Hess.
- Text
- Pennington, NJ : Electrochemical Society, [1994], ©1994.
- 1994-1994
- 1 Item
Item details Format Call Number Item Location Text TK7871.85 .S974 1994g Off-site Process, equipment, and materials control in integrated circuit manufacturing : 25-26 October 1995, Austin, Texas / Anant G. Sabnis, Ivo J. Raaijmakers, chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.
- Text
- Bellingham, Wash., USA : SPIE, [1995], ©1995.
- 1995-1995
- 1 Item
Item details Format Call Number Item Location Text TK7874 .P76 1995g Off-site Process, equipment, and materials control in integrated circuit manufacturing II : 16-17 October 1996, Austin, Texas / Armando Iturralde, Te-Hua Lin, chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and others].
- Text
- Bellingham, Wash., USA : SPIE, [1996], ©1996.
- 1996-1996
- 1 Item
Item details Format Call Number Item Location Text TK7874 .P76 1996g Off-site Proceedings of the eleventh International Symposium on Plasma Processing / editors G.S. Mathad, M. Meyyappan.
- Text
- Pennington, NJ : Electrochemical Society, [1996], ©1996.
- 1996-1996
- 1 Item
Item details Format Call Number Item Location Text TK7871.85 .S974 1996g Off-site Plasma processing of semiconductors / edited by P.F. Williams.
- Text
- Boston : Kluwer, 1997.
- 1997
- 1 Item
Item details Format Call Number Item Location Text TA2020 .P532 1997 Off-site Process, equipment, and materials control in integrated circuit manufacturing III : 1-2 October, 1997, Austin, Texas / Abe Ghanbari, Anthony J. Toprac, chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, Solid State Technology, the Electrochemical Society.
- Text
- Bellingham, Washington : SPIE, [1997], ©1997.
- 1997-1997
- 1 Item
Item details Format Call Number Item Location Text TK7874 .P76 1997g Off-site 1998 3rd International Symposium on Plasma Process-Induced Damage : June 4-5, 1998, Honolulu, Hawaii, USA / Moritaka Nakamura, Thuy Dao, and Terence Hook, editors ; technical co-sponsors, American Vacuum Society, IEEE/Electron Devices Society, Japanese Society of Applied Physics.
- Text
- Sunnyvale, California : Northern California Chapter of the American Vacuum Society, [1998], ©1998.
- 1998-1998
- 1 Item
Item details Format Call Number Item Location Text TK7871.85 .I5834 1998g Off-site Multilevel interconnect technology II : 23-24 September, Santa Clara, California / Mart Graef, Divyseh N. Patel, chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, Solid State Technology [and others].
- Text
- Bellingham, Washington : SPIE, [1998], ©1998.
- 1998-1998
- 1 Item
Item details Format Call Number Item Location Text TK7874.75 .M85 1998 Off-site Process, equipment, and materials control in integrated circuit manufacturing IV : 22-24 September, 1998, Santa Clara, California / Anthony J. Toprac, Kim Dang, chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, Solid State Technology [and others].
- Text
- Bellingham, Washington : SPIE, [1998], ©1998.
- 1998-1998
- 1 Item
Item details Format Call Number Item Location Text TK7874 .P7519 1998 Off-site Etching in microsystem technology / Michael Köhler ; translated by Antje Wiegand.
- Text
- Weinheim ; New York : Wiley-VCH, [1999], ©1999.
- 1999-1999
- 1 Item
Item details Format Call Number Item Location Text TK7872.M3 K64 1999 Off-site Process, equipment, and materials control in integrated circuit manufacturing V : 22-23 September, 1999, Santa Clara, California / Anthony J. Toprac, Kim Dang, chairs/editors ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organizations, the Electrochemical Society [and others].
- Text
- Bellingham, Wash., USA : SPIE, [1999], ©1999.
- 1999-1999
- 1 Item
Item details Format Call Number Item Location Text TK7874 .P76 1999g Off-site Multilevel interconnect technology III : 22-23 September 1999, Santa Clara, California / Mart Graef, Divyesh N. Patel, chairs/editors ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organizations, the Electrochemical Society [and others].
- Text
- Bellingham, Wash., USA : SPIE, [1999], ©1999.
- 1999-1999
- 1 Item
Item details Format Call Number Item Location Text TK7874.75 .M85 1999 Off-site Plasma etching processes for sub-quarter micron devices : proceedings of the International Symposium / editor, G.S. Mathad ... [and others ; cosponsored by] Dielectric Science and Technology and Electronics Divisions [of the Electrochemical Society].
- Text
- Pennington, NJ : Electrochemical Society, [2000], ©2000.
- 2000-2000
- 1 Item
Item details Format Call Number Item Location Text TA2020 .P52 2000g Off-site Dry etching for microelectronics / edited by Ronald A. Powell.
- Text
- Amsterdam ; New York : North-Holland Physics Pub. ; New York, N.Y. : Distributors for the USA and Canada, Elsevier Science Pub. Co., 1984.
- 1984
- 1 Item
Item details Format Call Number Item Location Text TK7871.85 .D79 1984 Off-site Plasma etching in semiconductor fabrication / Russ A. Morgan.
- Text
- Amsterdam ; New York : Elsevier, 1985.
- 1985
- 1 Item
Item details Format Call Number Item Location Text TK7871.85 .M587 1985 Off-site Plasma synthesis and etching of electronic materials : symposium held November 27-30, 1984, Boston, Massachusetts, U.S.A. / editors, R.P.H. Chang, B. Abeles.
- Text
- Pittsburgh, Pa. : Materials Research Society, [1985], ©1985.
- 1985-1985
- 1 Item
Item details Format Call Number Item Location Text TA2005 .P54 1985 Off-site Principles of plasma discharges and materials processing / Michael A. Lieberman, Allan J. Lichtenberg.
- Text
- Hoboken, N.J. : Wiley-Interscience, [2005], ©2005.
- 2005-2005
- 1 Item
Item details Format Call Number Item Location Text QC718.5.D9 L54 2005 Off-site Photon, beam, and plasma stimulated chemical processes at surfaces : symposium held December 1-4, 1986, Boston, Massachusetts, USA / editors, Vincent M. Donnelly, Irving P. Herman, Masataka Hirose.
- Text
- Pittsburgh, Pa. : Materials Research Society, [1987], ©1987.
- 1987-1987
- 1 Item
Item details Format Call Number Item Location Text TA418.6 .P49 1987 Off-site Proceedings of the Fifth Symposium on Plasma Processing / edited by G.S. Mathad, G.C. Schwartz, G. Smolinsky.
- Text
- Pennington, NJ (10 S. Main St., Pennington 08534-2896) : Dielectrics and Insulation and Electronics Divisions, Electrochemical Society, [1985], ©1985.
- 1985-1985
- 1 Item
Item details Format Call Number Item Location Text TK7871.85 .S974 1984 Off-site Laser-assisted plasma etching / William M. Holber.
- Text
- 1987.
- 1987
- 1 Item
Item details Format Call Number Item Location Text FC87- 10,190 Off-site Laser-assisted plasma etching / William M. Holber.
- Text
- 1987.
- 1987
- 1 Item
Item details Format Call Number Item Location Text LD1237.5D 1987 .H62 Off-site Low pressure plasmas and microstructuring technology / by Gerhard Franz.
- Text
- Berlin ; New York : Springer, [2009], ©2009.
- 2009-2009
- 1 Item
Item details Format Call Number Item Location Text TA2020 .F73 2009g Off-site Proceedings of the Symposium on Dry Process / edited by Jun-ichi Nishizawa [and others].
- Text
- Pennington, NJ (10 S. Main St., Pennington 08534-2896) : Electrochemical Society, [1988], ©1988.
- 1988-1988
- 1 Item
Item details Format Call Number Item Location Text TK7871.85 .S955 1987 Off-site Handbook of plasma processing technology : fundamentals, etching, deposition, and surface interactions / edited by Stephen M. Rossnagel, Jerome J. Cuomo, William D. Westwood.
- Text
- Park Ridge, N.J., U.S.A. : Noyes Publications, [1990], ©1990.
- 1990-1990
- 1 Item
Item details Format Call Number Item Location Text TA2020 .H37 1989 Off-site Plasma-surface interactions and processing of materials / edited by Orlando Auciello [and others].
- Text
- Dordrecht ; Boston : Kluwer Academic Publishers, [1990], ©1990.
- 1990-1990
- 1 Item
Item details Format Call Number Item Location Text TA418.7 .N36 1988 Off-site In-situ patterning : selective area deposition and etching : symposium held November 29-December 1, 1989, Boston, Massachusetts, U.S.A. / editors, Anthony F. Bernhardt, Jerry G. Black, Robert Rosenberg.
- Text
- Pittsburgh, Pa. : Materials Research Society, [1990], ©1990.
- 1990-1990
- 1 Item
Item details Format Call Number Item Location Text TK7871.85 .I49 1990 Off-site
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