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Displaying 1-48 of 48 results
Dividing, ruling, and mask-making / D. F. Horne.
- Text
- London: A. Hilger; [1974]
- 1974
- 1 Item
Item details Format Call Number Item Location Text JSF 75-142 Offsite Not available - Please for assistance.Dividing, ruling, and mask-making / D. F. Horne.
- Text
- New York : Crane, Russak, [1974]
- 1974
- 1 Item
Item details Format Call Number Item Location Text JSF 75-179 Offsite Not available - Please for assistance.Proceedings.
- Text
- [Rochester, N.Y., Graphics Markets Division, Eastman Kodak Co., 1973]
- 1973
- 1 Item
Item details Format Call Number Item Location Text JSF 80-930 Offsite Not available - Please for assistance.Photomasks, scales, and gratings / Douglas F. Horne.
- Text
- Bristol : A. Hilger, c1983.
- 1983
- 1 Item
Item details Format Call Number Item Location Text JSF 84-785 Offsite Not available - Please for assistance.Microlithography world.
- Text
- Port Washington, N.Y. : Penn Well Publication, published in cooperation with SPIE, 1992-
- 1992-present
- 2 Items
Item details Format Call Number Item Location Text JSM 98-51 v. 6, no. 1 (Win 1997) Offsite Not available - Please for assistance.Item details Format Call Number Item Location Text JSM 98-51 v. 7-17, inc. (1998-2008) Offsite Not available - Please for assistance.Organizational, DS, GS and depot maintenance repair parts and special tools list [microform] : tester, leakage, protective mask, DOP, M14 (FSN 6665-911-3552).
- Text
- [Washington, D.C.] : Headquarters, Dept. of the Army, [1993]
- 1993
Photomask fabrication technology / Benjamin G. Eynon, Jr., Banqiu Wu.
- Text
- New York : McGraw-Hill, c2005.
- 2005
- 1 Item
Item details Format Call Number Item Location Text JSE 05-1224 Offsite Not available - Please for assistance.Microlithography world [electronic resource].
- Text
- Port Washington, N.Y. : Penn Well Publication, published in cooperation with SPIE, [1992]-2008.
- 1992-2008
- 2 Resources
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Proceedings of the First International Symposium on Electrochemical Microfabrication / edited by Madhav Datta, Keith Sheppard, Dexter Snyder ; [sponsored by the] Electrodeposition Division.
- Text
- Pennington, NJ : Electrochemical Society, [1992], ©1992.
- 1992-1992
- 1 Item
Item details Format Call Number Item Location Text TK7874 .I4736 1991 Off-site Not available - Please for assistance.Proceedings of the Symposia on Patterning Science and Technology II / edited by Wayne Greene, George J. Hefferon, L. K. White [and] Interconnection and Contact Metallization for ULSI / edited by Terry O. Herndon, Andrew L. Wu ; [sponsored by the] Dielectric Science and Technology and Electronics divisions.
- Text
- Pennington, NJ (10 S. Main St., Pennington 08534-2896) : Electrochemical Society, [1992], ©1992.
- 1992-1992
- 1 Item
Item details Format Call Number Item Location Text TK7874 .S943 1991 Off-site Not available - Please for assistance.Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III : 1-2 March 1993, San Jose, California / David O. Patterson, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash. : The Society, [1993], ©1993.
- 1993-1993
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E4863 1992g Off-site Not available - Please for assistance.Optical/laser microlithography VII : 2-4 March 1994, San Jose, California / Timothy A. Brunner, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.
- Text
- Bellingham, Wash., USA : SPIE, [1994], ©1994.
- 1994-1994
- 1 Item
Item details Format Call Number Item Location Text TA1677 .O673 1994g Off-site Not available - Please for assistance.Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV : 28 February-1 March 1994, San Jose, California / David O. Patterson, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.
- Text
- Bellingham, Wash., USA : SPIE, [1994], ©1994.
- 1994-1994
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E4834 1994g Off-site Not available - Please for assistance.Optical/laser microlithography VIII : 22-24 February 1995, Santa Clara, California / Timothy A. Brunner, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.
- Text
- Bellingham, Wash. : SPIE, [1995], ©1995.
- 1995-1995
- 1 Item
Item details Format Call Number Item Location Text TA1677 .O673 1995g Off-site Not available - Please for assistance.Proceedings of the Second International Symposium on Electrochemical Microfabrication / editors, Madhav Datta, Keith Sheppard, John O. Dukovic.
- Text
- Pennington, NJ : Electrochemical Society, [1995], ©1995.
- 1995-1995
- 1 Item
Item details Format Call Number Item Location Text TK7874 .I4736 1994 Off-site Not available - Please for assistance.Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California / David E. Seeger, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] SEMATECH.
- Text
- Bellingham, Wash., USA : SPIE, [1997], ©1997.
- 1997-1997
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E64 1997g Off-site Not available - Please for assistance.Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan / Naoaki Aizaki, editor ; sponsored by Photomask Japan, BACUS, SPIE--the International Society for Optical Engineering ; supporting societies, the Japan Society of Applied Physics [and others] ; published by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Washington : SPIE, [1997], ©1997.
- 1997-1997
- 1 Item
Item details Format Call Number Item Location Text TK7878 .P46 1997g Off-site Not available - Please for assistance.Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California / Yuli Vladimirsky, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, SEMATECH.
- Text
- Bellingham, Wash. : SPIE, [1998], ©1998.
- 1998-1998
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E523 1998g Off-site Not available - Please for assistance.Photomask and X-ray mask technology VI : 13-14 April, 1999, Yokohama, Japan / Hiraoki Morimoto, editor ; sponsored by Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations, the Japan Society of Applied Physics [and others].
- Text
- Bellingham, Wash., USA : SPIE, [1999], ©1999.
- 1999-1999
- 1 Item
Item details Format Call Number Item Location Text TK7872.M3 P46 1999g Off-site Not available - Please for assistance.Etching in microsystem technology / Michael Köhler ; translated by Antje Wiegand.
- Text
- Weinheim ; New York : Wiley-VCH, [1999], ©1999.
- 1999-1999
- 1 Item
Item details Format Call Number Item Location Text TK7872.M3 K64 1999 Off-site Not available - Please for assistance.Emerging lithographic technologies III : 15-17 March, 1999, Santa Clara, California / Yuli Vladimirsky, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.
- Text
- Bellingham, Washington : SPIE, [1999], ©1999.
- 1999-1999
- 2 Items
Item details Format Call Number Item Location Text TK7874 .E523 1999g p.2 Off-site Not available - Please for assistance.Item details Format Call Number Item Location Text TK7874 .E523 1999g p.1 Off-site Not available - Please for assistance.Photomask and X-ray mask technology V : 9-10 April, 1998, Kawasaki, Japan / Naoaki Aizaki, editor ; sponsored by Photomask Japan, BACUS, SPIE--the International Society for Optical Engineering ; supporting societies, the Japan Society of Applied Physics [and others] ; published by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Washington : SPIE, [1998], ©1998.
- 1998-1998
- 1 Item
Item details Format Call Number Item Location Text TK7878 .P56 1998 Off-site Not available - Please for assistance.Emerging lithographic technologies IV : 28 February-1 March, 2000, Santa Clara, [California], USA / Elizabeth A. Dobisz, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
- Text
- Bellingham, Washington : SPIE, [2000], ©2000.
- 2000-2000
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E523 2000g Off-site Not available - Please for assistance.Photomask and next-generation lithography mask technology VII : 12-13 April 2000, Yokohama, Japan / Hiroaki Morimoto, editor ; sponsored by Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for the symposium, Japan Society of Applied Physics, Japan Society for Precision Engineering, [and] Institute of Electrical Engineers of Japan ; cooperating organization for technical exhibit, SEMI Japan.
- Text
- Bellingham, Wash., USA : SPIE, [2000], ©2000.
- 2000-2000
- 1 Item
Item details Format Call Number Item Location Text TK7872.M3 P46 2000g Off-site Not available - Please for assistance.Materials development for direct write technologies : symposium held April 24-26, 2000, San Francisco, California, U.S.A. / editors, Douglas B. Chrisey [and others].
- Text
- Warrendale, Pa. : Materials Research Society, [2001], ©2001.
- 2001-2001
- 1 Item
Item details Format Call Number Item Location Text TK7871 .M37 2001g Off-site Not available - Please for assistance.Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA / Elizabeth A. Dobisz, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
- Text
- Bellingham, Washington : SPIE, [2001], ©2001.
- 2001-2001
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E523 2001g Off-site Not available - Please for assistance.Photomask and next-generation lithography mask technology VIII : 25-26 April 2001, Yokohama, Japan / Hiroichi Kawahira, editor ; sponsored by PMJ--Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for the symposium, Japan Society of Applied Physics [and others] ; cooperating organization for technical exhibit, SEMI Japan ; supported by Yokohama City.
- Text
- Bellingham, Wash., USA : SPIE, [2001], ©2001.
- 2001-2001
- 1 Item
Item details Format Call Number Item Location Text TK7872.M3 P46 2001g Off-site Not available - Please for assistance.Emerging lithographic technologies VI : 5-7 March, 2002, Santa Clara, [California], USA / Roxann L. Engelstad, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
- Text
- Bellingham, Washington : SPIE, [2002], ©2002.
- 2002-2002
- 2 Items
Item details Format Call Number Item Location Text TK7874 .E523 2002g v.2 Off-site Not available - Please for assistance.Item details Format Call Number Item Location Text TK7874 .E523 2002g v.1 Off-site Not available - Please for assistance.Photomask and next-generation lithography mask technology IX : 23-25 April, 2002, Yokohama, Japan / Hiroichi Kawahira, editor ; sponsored by PMJ--Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for the symposium, Japan Society of Applied Physics [and others] ; cooperating organization for technical exhibit, SEMI Japan ; supported by Yokohama City ; published by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Washington : SPIE, [2001], ©2001.
- 2001-2001
- 1 Item
Item details Format Call Number Item Location Text TK7872.M3 P46 2002g Off-site Not available - Please for assistance.Photomasks, scales, and gratings / Douglas F. Horne.
- Text
- Bristol : A. Hilger, [1983], ©1983.
- 1983-1983
- 1 Item
Item details Format Call Number Item Location Text TS517 .H67 1983 Off-site Not available - Please for assistance.Emerging lithographic technologies VII : 25-27 February, 2003, Santa Clara, California, USA / Roxann L. Engelstad, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
- Text
- 2003
- 2 Items
Item details Format Call Number Item Location Text TK7874 .E523 2003g pt.2 Off-site Not available - Please for assistance.Item details Format Call Number Item Location Text TK7874 .E523 2003g pt.1 Off-site Not available - Please for assistance.Photomask and next-generation lithography mask technology X : 16-18 April, 2003, Yokohama, Japan / Hiroyoshi Tanabe, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical roup of SPIE dedicated to the advancement of photomask technology, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for symposium, the Japan Society of Applied Physics ... [et al.] ; cooperating organization for technical exhibit, SEMI Japan ; supported by Yokohama City ; published by SPIE--the International Society for Optical Engineering.
- Text
- 2003
- 1 Item
Item details Format Call Number Item Location Text TK7872.M3 P46 2003g Off-site Not available - Please for assistance.Emerging lithographic technologies VIII : 24-26 February, 2004, Santa Clara, California, USA / R. Scott Mackay, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, [and] International SEMATECH.
- Text
- Bellingham, Wash., USA : SPIE, c2004.
- 2004
- 2 Items
Item details Format Call Number Item Location Text TK7874 .E523 2004g pt.2 Off-site Not available - Please for assistance.Item details Format Call Number Item Location Text TK7874 .E523 2004g pt.1 Off-site Not available - Please for assistance.Photomask and next-generation lithography mask technology XI. Part One : 14-16 April, 2004, Yokohama, Japan / Hiroyoshi Tanabe, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--The International Society for Optical Engineering ; cooperating organizations, The Institute of Electrical Engineers of Japan . . . (et al.); co-organized by Yokohama City (Japan) ; published by SPIE--The International Society for Optical Engineering.
- Text
- Bellingham, Wash. : SPIE, [2004], ©2004.
- 2004-2004
- 2 Items
Item details Format Call Number Item Location Text TK7872.M3 P46 2004g pt.2 Off-site Not available - Please for assistance.Item details Format Call Number Item Location Text TK7872.M3 P46 2004g pt.1 Off-site Not available - Please for assistance.Photomask fabrication technology / Benjamin G. Eynon, Jr., Banqiu Wu.
- Text
- New York : McGraw-Hill, [2005], ©2005.
- 2005-2005
- 1 Item
Item details Format Call Number Item Location Text TK7872.M3 E99 2005 Off-site Not available - Please for assistance.Proceedings of the Symposium on Patterning Science and Technology / edited by Robert Gleason, George J. Hefferon, L.K. White ; [sponsored by the] Dielectrics and Insulation and Electronics divisions and Luminescence and Display Materials Group.
- Text
- Pennington, NJ (10 S. Main St., Pennington 08534-2896) : Electrochemical Society, [1990], ©1990.
- 1990-1990
- 1 Item
Item details Format Call Number Item Location Text TK7874 .S943 1989 Off-site Not available - Please for assistance.Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California / David E. Seeger, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering : cooperating organization SEMI--Semiconductor Equipment and Materials International, SEMATECH.
- Text
- Bellingham, Wash., USA : SPIE, c1997.
- 1997
- 1 Item
Item details Format Call Number Item Location Text TA1505 .P762 vol.3048 Off-site Not available - Please for assistance.Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan / Naoaki Aizaki, editor ; sponsored by Photomask Japan, BACUS, SPIE--the International Society for Optical Engineering ; supporting societies, the Japan Society of Applied Physics ... [et al.].
- Text
- Bellingham, Washington : SPIE, c1997.
- 1997
- 1 Item
Item details Format Call Number Item Location Text TA1505 .P762 vol.3096 Off-site Not available - Please for assistance.X-ray lithography and applications of soft x-rays to technology : October 19-20, 1983, Upton, New York / Alan D. Wilson, chairman/editor ; cosponsors, National Synchrotron Light Source/Brookhaven National Laboratory, SPIE--The International Society for Optical Engineering.
- Text
- Bellingham, Wash. : SPIE--The International Society for Optical Engineering, c1984.
- 1984
- 1 Item
Item details Format Call Number Item Location Text TK7874.X73 Off-site Not available - Please for assistance.10th Annual Symposium on Microlithography : proceedings : September 26-27, 1990, Sunnyvale Hilton, Sunnyvale, California / sponsored by Bacus International.
- Text
- 1991
- 1 Item
Item details Format Call Number Item Location Text TK7871.85 .S965 1990 Off-site Not available - Please for assistance.16th Annual Symposium on Photomask Technology and Management, 18-20 September 1996, Redwood City, California / Gilbert V. Shelden, James A. Reynolds., chairs/editors ; sponsored by BACUS.
- Text
- Bellingham, Wash. : Society of Photo-optical Instrumentation Engineers, ©1996.
- 1996
- 1 Item
Item details Format Call Number Item Location Text TA1505 .P762 vol.2884 Off-site Not available - Please for assistance.Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California / David E. Seeger, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering : cooperating organization SEMI--Semiconductor Equipment and Materials International, SEMATECH.
- Text
- Bellingham, Wash., USA : SPIE, c1997.
- 1997
- 1 Item
Item details Format Call Number Item Location Text TA1505 .P762 vol.3048 Off-site Not available - Please for assistance.Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan / Naoaki Aizaki, editor ; sponsored by Photomask Japan, BACUS, SPIE--the International Society for Optical Engineering ; supporting societies, the Japan Society of Applied Physics [and others] ; published by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Washington : SPIE, ©1997.
- 1997
- 1 Item
Item details Format Call Number Item Location Text TA1505 .P762 vol.3096 Off-site Not available - Please for assistance.X-ray lithography and applications of soft x-rays to technology : October 19-20, 1983, Upton, New York / Alan D. Wilson, chairman/editor ; cosponsors, National Synchrotron Light Source/Brookhaven National Laboratory, SPIE--The International Society for Optical Engineering.
- Text
- Bellingham, Wash. : SPIE--The International Society for Optical Engineering, c1984.
- 1984
- 1 Item
Item details Format Call Number Item Location Text TK7874 .X73 Off-site Not available - Please for assistance.Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies IX : 7-8 March 1990, San Jose, California / Douglas J. Resnick, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash. : Society of Photo-optical Instrumentation Engineers, ©1990.
- 1990
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E4356 Off-site Not available - Please for assistance.10th Annual Symposium on Microlithography : proceedings : September 26-27, 1990, Sunnyvale Hilton, Sunnyvale, California / sponsored by Bacus International.
- Text
- Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, c1991.
- 1991
- 1 Item
Item details Format Call Number Item Location Text TK7871.85 .S965 1990 Off-site Not available - Please for assistance.12th Annual Symposium on Photomask Technology and Management, 23-24 September 1992, Sunnyvale, California / sponsored by BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology.
- Text
- Bellingham, Wash. : Society of Photo-optical Instrumentation Engineers, ©1993.
- 1992
- 1 Item
Item details Format Call Number Item Location Text TK7874 .S9434 1992 Off-site Not available - Please for assistance.Optical/laser microlithography VII : 2-4 March 1994, San Jose, California / Timothy A. Brunner, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.
- Text
- Bellingham, Wash. : Society of Photo-optical Instrumentation Engineers, ©1994.
- 1994
- 1 Item
Item details Format Call Number Item Location Text TA1677 .O677 1994 Off-site Not available - Please for assistance.
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