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SEMICON/West, May 20-22, 1986, San Mateo, California : process and equipment reliability in the fab environment / presented by Semiconductor Equipment and Materials Institute, Inc.
- Text
- Mountain View, Calif. : The Institute, [1986?]
- 1986
- 1 Item
Item details Format Call Number Item Location Text JSF 88-563 Offsite The physics of submicron lithography / Kamil A. Valiev.
- Text
- New York : Plenum Press, c1992.
- 1992
- 1 Item
Item details Format Call Number Item Location Text JSF 92-934 Offsite Patterning of material layers in submicron region / U.S. Tandon, W.S. Khokle.
- Text
- New York : J. Wiley, 1993.
- 1993
- 1 Item
Item details Format Call Number Item Location Text JSF 95-175 Offsite Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing : 6-7 March 1991, San Jose, California / Martin Peckerar, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash., USA : SPIE, [1991], ©1991.
- 1991-1991
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E4357 1991g Off-site The physics of submicron lithography / Kamil A. Valiev.
- Text
- New York : Plenum Press, [1992], ©1992.
- 1992-1992
- 1 Item
Item details Format Call Number Item Location Text TK7874 .V336 1992 Off-site Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing II : 8-9 March 1992, San Jose, California / Martin Peckerar,chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash., USA : SPIE, [1992], ©1992.
- 1992-1992
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E4818 1992g Off-site Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III : 1-2 March 1993, San Jose, California / David O. Patterson, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash. : The Society, [1993], ©1993.
- 1993-1993
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E4863 1992g Off-site Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV : 28 February-1 March 1994, San Jose, California / David O. Patterson, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.
- Text
- Bellingham, Wash., USA : SPIE, [1994], ©1994.
- 1994-1994
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E4834 1994g Off-site Patterning of material layers in submicron region / U.S. Tandon, W.S. Khokle.
- Text
- New York : J. Wiley, 1993.
- 1993
- 1 Item
Item details Format Call Number Item Location Text TK7872.M3 P38 1993 Off-site Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V : 20-21 February 1995, Santa Clara, California / John M. Warlaumont, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.
- Text
- Bellingham, Wash., USA : SPIE, [1995], ©1995.
- 1995-1995
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E44 1995g Off-site Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March, 1996, Santa Clara, California / David E. Seeger, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International, SEMATECH.
- Text
- Bellingham, Wash. : SPIE, [1996], ©1996.
- 1996-1996
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E44 1996g Off-site Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California / David E. Seeger, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] SEMATECH.
- Text
- Bellingham, Wash., USA : SPIE, [1997], ©1997.
- 1997-1997
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E64 1997g Off-site Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California / Yuli Vladimirsky, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, SEMATECH.
- Text
- Bellingham, Wash. : SPIE, [1998], ©1998.
- 1998-1998
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E523 1998g Off-site Emerging lithographic technologies III : 15-17 March, 1999, Santa Clara, California / Yuli Vladimirsky, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.
- Text
- Bellingham, Washington : SPIE, [1999], ©1999.
- 1999-1999
- 2 Items
Item details Format Call Number Item Location Text TK7874 .E523 1999g p.2 Off-site Item details Format Call Number Item Location Text TK7874 .E523 1999g p.1 Off-site EUV, X-ray, and neutron optics and sources : 21-23 July 1999, Denver, Colorado / Carolyn A. MacDonald [and others], chairs/editors ; sponsored ... by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash., USA : SPIE, [1999], ©1999.
- 1999-1999
- 1 Item
Item details Format Call Number Item Location Text TA1775 .E98 1999g Off-site Emerging lithographic technologies IV : 28 February-1 March, 2000, Santa Clara, [California], USA / Elizabeth A. Dobisz, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
- Text
- Bellingham, Washington : SPIE, [2000], ©2000.
- 2000-2000
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E523 2000g Off-site Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA / Elizabeth A. Dobisz, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
- Text
- Bellingham, Washington : SPIE, [2001], ©2001.
- 2001-2001
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E523 2001g Off-site Emerging lithographic technologies VI : 5-7 March, 2002, Santa Clara, [California], USA / Roxann L. Engelstad, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
- Text
- Bellingham, Washington : SPIE, [2002], ©2002.
- 2002-2002
- 2 Items
Item details Format Call Number Item Location Text TK7874 .E523 2002g v.2 Off-site Item details Format Call Number Item Location Text TK7874 .E523 2002g v.1 Off-site Electron-beam, x-ray, & ion-beam techniques for submicrometer lithographies V : 11-12 March 1986, Santa Clara, California / Phillip D. Blais, chairman/editor.
- Text
- Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, c1986.
- 1986
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E43 Off-site Emerging lithographic technologies VII : 25-27 February, 2003, Santa Clara, California, USA / Roxann L. Engelstad, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
- Text
- 2003
- 2 Items
Item details Format Call Number Item Location Text TK7874 .E523 2003g pt.2 Off-site Item details Format Call Number Item Location Text TK7874 .E523 2003g pt.1 Off-site Emerging lithographic technologies VIII : 24-26 February, 2004, Santa Clara, California, USA / R. Scott Mackay, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, [and] International SEMATECH.
- Text
- Bellingham, Wash., USA : SPIE, c2004.
- 2004
- 2 Items
Item details Format Call Number Item Location Text TK7874 .E523 2004g pt.2 Off-site Item details Format Call Number Item Location Text TK7874 .E523 2004g pt.1 Off-site Electron-beam, X-ray, and ion-beam lithographies VI : 5-6 March 1987, Santa Clara, California / Phillip D. Blais, chair/editor.
- Text
- Bellingham, Wash. : SPIE--the International Society for Optical Engineering, 1987.
- 1987
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E4775 1987g Off-site Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VII : 2-4 March 1988, Santa Clara, California / Arnold W. Yanof, chair/editor ; sponsored by SPIE-the International Society for Optical Engineering.
- Text
- Bellingham, Wash., USA : The Society, [1988], ©1988.
- 1988-1988
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E4826 1988 Off-site Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VIII : 1-3 March 1989, San Jose, California / Arnold W. Yanof, chair/editor ; sponsored by SPIE-the International Society for Optical Engineering.
- Text
- Bellingham, Wash., USA : The Society, [1989], ©1989.
- 1989-1989
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E4355 1989g Off-site Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies IX : 7-8 March 1990, San Jose, California / Douglas J. Resnick, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, [1990], ©1990.
- 1990-1990
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E4356 1990g Off-site Technology of proximal probe lithography / Christie R.K. Marrian, editor.
- Text
- Bellingham, Wash. : SPIE Optical Engineering Press, c1993.
- 1993
- 1 Item
Item details Format Call Number Item Location Text TK7874.8 .T43 1993 Off-site Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California / David E. Seeger, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering : cooperating organization SEMI--Semiconductor Equipment and Materials International, SEMATECH.
- Text
- Bellingham, Wash., USA : SPIE, c1996.
- 1996
- 1 Item
Item details Format Call Number Item Location Text TA1505 .P762 vol.2723 Off-site Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California / David E. Seeger, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering : cooperating organization SEMI--Semiconductor Equipment and Materials International, SEMATECH.
- Text
- Bellingham, Wash., USA : SPIE, c1997.
- 1997
- 1 Item
Item details Format Call Number Item Location Text TA1505 .P762 vol.3048 Off-site X-ray lithography and applications of soft x-rays to technology : October 19-20, 1983, Upton, New York / Alan D. Wilson, chairman/editor ; cosponsors, National Synchrotron Light Source/Brookhaven National Laboratory, SPIE--The International Society for Optical Engineering.
- Text
- Bellingham, Wash. : SPIE--The International Society for Optical Engineering, c1984.
- 1984
- 1 Item
Item details Format Call Number Item Location Text TK7874.X73 Off-site Advances in resist technology : March 12-13, 1984, Santa Clara, California / C. Grant Willson, chairman/editor.
- Text
- Bellingham, Wash. : SPIE--the International Society for Optical Engineering, c1984.
- 1984
- 1 Item
Item details Format Call Number Item Location Text TK8331.A38 Off-site Advances in resist technology and processing II : March 11-12, 1985, Santa Clara, California / Larry F. Thompson, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics.
- Text
- Bellingham, Wash. : SPIE--the International Society for Optical Engineering, c1985.
- 1985
- 1 Item
Item details Format Call Number Item Location Text TK8331 .A383 Off-site Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV : March 14-15, 1985, Santa Clara, California / Philip D. Blais, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics.
- Text
- 1985
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E433 Off-site Electron-beam, x-ray, & ion-beam techniques for submicrometer lithographies V : 11-12 March 1986, Santa Clara, California / Phillip D. Blais, chairman/editor.
- Text
- Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, c1986.
- 1986
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E434 Off-site Electron-beam, X-ray, and ion-beam lithographies VI : 5-6 March 1987, Santa Clara, California / Phillip D. Blais, chair/editor.
- Text
- 1987
- 1 Item
Item details Format Call Number Item Location Text TK7874.E435 Off-site Electron-beam technology in microelectronic fabrication / edited by George R. Brewer.
- Text
- New York : Academic Press, 1980.
- 1980
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E48 Off-site Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VIII : 1-3 March 1989, San Jose, California / Arnold W. Yanof, chair/editor ; sponsored by SPIE-the International Society for Optical Engineering.
- Text
- 1989
- 1 Item
Item details Format Call Number Item Location Text TK7874.E4355 Off-site Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies IX : 7-8 March 1990, San Jose, California / Douglas J. Resnick, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, c1990.
- 1990
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E4356 Off-site Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing : 6-7 March 1991, San Jose, California / Martin Peckerar, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash., USA : SPIE, c1991.
- 1991
- 2 Items
Item details Format Call Number Item Location Text Off-site Not available - Please for assistance.Item details Format Call Number Item Location Text TK7874 .E4357 Off-site Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III : 1-2 March 1993, San Jose, California / David O. Patterson chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
- Text
- 1993
- 1 Item
Item details Format Call Number Item Location Text TK7874.E4359 1993 Off-site Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV : 28 February-1 March 1994, San Jose, California / David O. Patterson chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering : cooperating organization SEMI--Semiconductor Equipment and Materials International.
- Text
- 1994
- 1 Item
Item details Format Call Number Item Location Text TK7874.E436 1994 Off-site Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V : 20-21 February 1995, Santa Clara, California / John M. Warlaumont, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering : cooperating organization SEMI--Semiconductor Equipment and Materials International.
- Text
- Bellingham, Wash., USA : SPIE, c1995.
- 1995
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E437 1995 Off-site Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California / David E. Seeger, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering : cooperating organization SEMI--Semiconductor Equipment and Materials International, SEMATECH.
- Text
- Bellingham, Wash., USA : SPIE, c1996.
- 1996
- 1 Item
Item details Format Call Number Item Location Text TA1505 .P762 vol.2723 Off-site Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California / David E. Seeger, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering : cooperating organization SEMI--Semiconductor Equipment and Materials International, SEMATECH.
- Text
- Bellingham, Wash., USA : SPIE, c1997.
- 1997
- 1 Item
Item details Format Call Number Item Location Text TA1505 .P762 vol.3048 Off-site X-ray lithography and applications of soft x-rays to technology : October 19-20, 1983, Upton, New York / Alan D. Wilson, chairman/editor ; cosponsors, National Synchrotron Light Source/Brookhaven National Laboratory, SPIE--The International Society for Optical Engineering.
- Text
- Bellingham, Wash. : SPIE--The International Society for Optical Engineering, c1984.
- 1984
- 1 Item
Item details Format Call Number Item Location Text TK7874 .X73 Off-site Advances in resist technology : March 12-13, 1984, Santa Clara, California / C. Grant Willson, chairman/editor.
- Text
- Bellingham, Wash. : SPIE--the International Society for Optical Engineering, c1984.
- 1984
- 1 Item
Item details Format Call Number Item Location Text TK8331 .A38 Off-site Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV : March 14-15, 1985, Santa Clara, California / Philip D. Blais, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics.
- Text
- Bellingham, Wash. : SPIE--the International Society for Optical Engineering, c1985.
- 1985
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E433 Off-site Electron-beam, x-ray, & ion-beam techniques for submicrometer lithographies V : 11-12 March 1986, Santa Clara, California / Phillip D. Blais, chairman/editor.
- Text
- Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, c1986.
- 1986
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E434 Off-site Electron-beam, X-ray, and ion-beam lithographies VI : 5-6 March 1987, Santa Clara, California / Phillip D. Blais, chair/editor.
- Text
- Bellingham, Wash. : SPIE--the International Society for Optical Engineering, 1987.
- 1987
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E435 Off-site Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VIII : 1-3 March 1989, San Jose, California / Arnold W. Yanof, chair/editor ; sponsored by SPIE-the International Society for Optical Engineering.
- Text
- Bellingham, Wash., USA : The Society, c1989.
- 1989
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E4355 Off-site Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies IX : 7-8 March 1990, San Jose, California / Douglas J. Resnick, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash. : Society of Photo-optical Instrumentation Engineers, ©1990.
- 1990
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E4356 Off-site
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