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Displaying 1-50 of 78 results
Methods and materials in microelectronic technology / edited by Joachim Bargon.
- Text
- New York : Plenum Press, c1984.
- 1984
- 1 Item
Item details Format Call Number Item Location Text JSF 86-1045 Offsite The physics of submicron lithography / Kamil A. Valiev.
- Text
- New York : Plenum Press, c1992.
- 1992
- 1 Item
Item details Format Call Number Item Location Text JSF 92-934 Offsite Materials aspects of x-ray lithography : symposium held April 12-14, 1993, San Francisco, California, U.S.A. / editors, George K. Celler, Juan R. Maldonado.
- Text
- Pittsburgh, Pa. : Materials Research Society, 1993.
- 1993
- 1 Item
Item details Format Call Number Item Location Text JSE 94-1663 Offsite Patterning of material layers in submicron region / U.S. Tandon, W.S. Khokle.
- Text
- New York : J. Wiley, 1993.
- 1993
- 1 Item
Item details Format Call Number Item Location Text JSF 95-175 Offsite Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing : 6-7 March 1991, San Jose, California / Martin Peckerar, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash., USA : SPIE, [1991], ©1991.
- 1991-1991
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E4357 1991g Off-site Multilayer optics for advanced x-ray applications : 22-23 July 1991, San Diego, California / Natale M. Ceglio, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash. : SPIE, [1992], ©1992.
- 1992-1992
- 1 Item
Item details Format Call Number Item Location Text TA1775 .M84 1992 Off-site The physics of submicron lithography / Kamil A. Valiev.
- Text
- New York : Plenum Press, [1992], ©1992.
- 1992-1992
- 1 Item
Item details Format Call Number Item Location Text TK7874 .V336 1992 Off-site Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing II : 8-9 March 1992, San Jose, California / Martin Peckerar,chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash., USA : SPIE, [1992], ©1992.
- 1992-1992
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E4818 1992g Off-site Multilayer and grazing incidence x-ray/EUV optics for astronomy and projection lithography : 19-22 July 1992, San Diego, California / Richard B. Hoover, Arthur B.C. Walker, chairs/editors ; sponsored and published by SPIE--The International Society for Optical Engineering.
- Text
- Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, [1993], ©1993.
- 1993-1993
- 1 Item
Item details Format Call Number Item Location Text QC437 .M85 1993g Off-site Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III : 1-2 March 1993, San Jose, California / David O. Patterson, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash. : The Society, [1993], ©1993.
- 1993-1993
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E4863 1992g Off-site Materials aspects of x-ray lithography : symposium held April 12-14, 1993 / edited by George K. Celler and Juan R. Maldonado.
- Text
- Pittsburgh, PA : Materials Research Society, 1993.
- 1993
- 1 Item
Item details Format Call Number Item Location Text TK7874 .M342 1993 Off-site Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV : 28 February-1 March 1994, San Jose, California / David O. Patterson, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.
- Text
- Bellingham, Wash., USA : SPIE, [1994], ©1994.
- 1994-1994
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E4834 1994g Off-site Patterning of material layers in submicron region / U.S. Tandon, W.S. Khokle.
- Text
- New York : J. Wiley, 1993.
- 1993
- 1 Item
Item details Format Call Number Item Location Text TK7872.M3 P38 1993 Off-site Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V : 20-21 February 1995, Santa Clara, California / John M. Warlaumont, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.
- Text
- Bellingham, Wash., USA : SPIE, [1995], ©1995.
- 1995-1995
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E44 1995g Off-site Multilayer and grazing incidence X-ray/EUV optics III : 5-6 August, 1996, Denver, Colorado / Richard B. Hoover, Arthur B.C. Walker, Jr., chair/editors ; sponsored and published by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash. : The Society, [1996], ©1996.
- 1996-1996
- 1 Item
Item details Format Call Number Item Location Text QB472.A1 M85 1996 Off-site Photomask and X-ray mask technology III : 18-19 April, 1996, Kawasaki City, Kanagawa, Japan / Hideo Yoshihara, editor ; sponsored by Photomask Japan, BACUS, SPIE--the International Society for Optical Engineering ; cosponsored by Japan Chapter of SPIE [and others].
- Text
- Bellingham, Wash. : SPIE, [1965], ©1965.
- 1965-1965
- 1 Item
Item details Format Call Number Item Location Text TK7874 .P46 1996g Off-site Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March, 1996, Santa Clara, California / David E. Seeger, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International, SEMATECH.
- Text
- Bellingham, Wash. : SPIE, [1996], ©1996.
- 1996-1996
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E44 1996g Off-site Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California / David E. Seeger, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] SEMATECH.
- Text
- Bellingham, Wash., USA : SPIE, [1997], ©1997.
- 1997-1997
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E64 1997g Off-site Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan / Naoaki Aizaki, editor ; sponsored by Photomask Japan, BACUS, SPIE--the International Society for Optical Engineering ; supporting societies, the Japan Society of Applied Physics [and others] ; published by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Washington : SPIE, [1997], ©1997.
- 1997-1997
- 1 Item
Item details Format Call Number Item Location Text TK7878 .P46 1997g Off-site Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California / Yuli Vladimirsky, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, SEMATECH.
- Text
- Bellingham, Wash. : SPIE, [1998], ©1998.
- 1998-1998
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E523 1998g Off-site Photomask and X-ray mask technology VI : 13-14 April, 1999, Yokohama, Japan / Hiraoki Morimoto, editor ; sponsored by Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations, the Japan Society of Applied Physics [and others].
- Text
- Bellingham, Wash., USA : SPIE, [1999], ©1999.
- 1999-1999
- 1 Item
Item details Format Call Number Item Location Text TK7872.M3 P46 1999g Off-site Optical microlithography XI : 25-27 February, 1998, Santa Clara, California / Luc Van den hove, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations SEMI--Semiconductor Equipment and Materials International, SEMATECH.
- Text
- Bellingham, Washington : SPIE, [1998], ©1998.
- 1998-1998
- 1 Item
Item details Format Call Number Item Location Text TK7872.M3 O68 1998 Off-site Optical microlithography XII : 17-19 March, 1999, Santa Clara, California / Luc Van den Hove, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization SEMI--Semiconductor Equipment and Materials International, SEMATECH.
- Text
- Bellingham, Washington : SPIE, [1999], ©1999.
- 1999-1999
- 2 Items
Item details Format Call Number Item Location Text TK7835 .O65 1999g v.2 Off-site Item details Format Call Number Item Location Text TK7835 .O65 1999g v.1 Off-site Emerging lithographic technologies III : 15-17 March, 1999, Santa Clara, California / Yuli Vladimirsky, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.
- Text
- Bellingham, Washington : SPIE, [1999], ©1999.
- 1999-1999
- 2 Items
Item details Format Call Number Item Location Text TK7874 .E523 1999g p.2 Off-site Item details Format Call Number Item Location Text TK7874 .E523 1999g p.1 Off-site Photomask and X-ray mask technology V : 9-10 April, 1998, Kawasaki, Japan / Naoaki Aizaki, editor ; sponsored by Photomask Japan, BACUS, SPIE--the International Society for Optical Engineering ; supporting societies, the Japan Society of Applied Physics [and others] ; published by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Washington : SPIE, [1998], ©1998.
- 1998-1998
- 1 Item
Item details Format Call Number Item Location Text TK7878 .P56 1998 Off-site 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98 : 16-17 November 1998, Munich-Unterhaching, Germany / Uwe Behringer, chair/editor ; organized by VDE/VDI-Society Microelectronics, Micro- and Precision Engineering (GMM) (Germany) [and] Institute for Microstructure Technology/Forschungszentrum Karlsruhe GmbH (Germany) ; cooperating organizations, SEMI-Europe--Semiconductor Equipment and Materials International, BACUS (USA), [and] SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash., USA : SPIE, [1999], ©1999.
- 1999-1999
- 1 Item
Item details Format Call Number Item Location Text TK7872.M3 E89 1998g Off-site Emerging lithographic technologies IV : 28 February-1 March, 2000, Santa Clara, [California], USA / Elizabeth A. Dobisz, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
- Text
- Bellingham, Washington : SPIE, [2000], ©2000.
- 2000-2000
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E523 2000g Off-site Optical microlithography XIII : 1-3 March, 2000, Santa Clara, [California], USA / Christopher J. Progler, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
- Text
- Bellingham, Washington : SPIE, [2000], ©2000.
- 2000-2000
- 2 Items
Item details Format Call Number Item Location Text TK7835 .O65 2000g p.2 Off-site Item details Format Call Number Item Location Text TK7835 .O65 2000g p.1 Off-site Photomask and next-generation lithography mask technology VII : 12-13 April 2000, Yokohama, Japan / Hiroaki Morimoto, editor ; sponsored by Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for the symposium, Japan Society of Applied Physics, Japan Society for Precision Engineering, [and] Institute of Electrical Engineers of Japan ; cooperating organization for technical exhibit, SEMI Japan.
- Text
- Bellingham, Wash., USA : SPIE, [2000], ©2000.
- 2000-2000
- 1 Item
Item details Format Call Number Item Location Text TK7872.M3 P46 2000g Off-site Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA / Elizabeth A. Dobisz, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
- Text
- Bellingham, Washington : SPIE, [2001], ©2001.
- 2001-2001
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E523 2001g Off-site Photomask and next-generation lithography mask technology VIII : 25-26 April 2001, Yokohama, Japan / Hiroichi Kawahira, editor ; sponsored by PMJ--Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for the symposium, Japan Society of Applied Physics [and others] ; cooperating organization for technical exhibit, SEMI Japan ; supported by Yokohama City.
- Text
- Bellingham, Wash., USA : SPIE, [2001], ©2001.
- 2001-2001
- 1 Item
Item details Format Call Number Item Location Text TK7872.M3 P46 2001g Off-site Optical microlithography XIV : 27 February-2 March, 2001, Santa Clara, [California], USA / Christopher J. Progler, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
- Text
- Bellingham, Wash. : SPIE, [2001], ©2001.
- 2001-2001
- 2 Items
Item details Format Call Number Item Location Text TR940 .O695 2001 v.2 Off-site Item details Format Call Number Item Location Text TR940 .O695 2001 v.1 Off-site Emerging lithographic technologies VI : 5-7 March, 2002, Santa Clara, [California], USA / Roxann L. Engelstad, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
- Text
- Bellingham, Washington : SPIE, [2002], ©2002.
- 2002-2002
- 2 Items
Item details Format Call Number Item Location Text TK7874 .E523 2002g v.2 Off-site Item details Format Call Number Item Location Text TK7874 .E523 2002g v.1 Off-site Optical microlithography XV : 5-8 March, 2002, Santa Clara, [California], USA / Anthon Yen, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
- Text
- Bellingham, Washington SPIE, [2002], ©2002.
- 2002-2002
- 2 Items
Item details Format Call Number Item Location Text TK7835 .O65 2002g v.2 Off-site Item details Format Call Number Item Location Text TK7835 .O65 2002g v.1 Off-site Photomask and next-generation lithography mask technology IX : 23-25 April, 2002, Yokohama, Japan / Hiroichi Kawahira, editor ; sponsored by PMJ--Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for the symposium, Japan Society of Applied Physics [and others] ; cooperating organization for technical exhibit, SEMI Japan ; supported by Yokohama City ; published by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Washington : SPIE, [2001], ©2001.
- 2001-2001
- 1 Item
Item details Format Call Number Item Location Text TK7872.M3 P46 2002g Off-site Methods and materials in microelectronic technology / edited by Joachim Bargon.
- Text
- 1984
- 1 Item
Item details Format Call Number Item Location Text TK7874 .I5924 1982 Off-site Electron-beam, x-ray, & ion-beam techniques for submicrometer lithographies V : 11-12 March 1986, Santa Clara, California / Phillip D. Blais, chairman/editor.
- Text
- Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, c1986.
- 1986
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E43 Off-site Optical microlithography XVI : 25-28 February 2003, Santa Clara, California, USA / Anthony Yen, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
- Text
- 2003
- 3 Items
Item details Format Call Number Item Location Text TK7835 .O65 2003g pt.3 Off-site Item details Format Call Number Item Location Text TK7835 .O65 2003g pt.2 Off-site Item details Format Call Number Item Location Text TK7835 .O65 2003g pt.1 Off-site Emerging lithographic technologies VII : 25-27 February, 2003, Santa Clara, California, USA / Roxann L. Engelstad, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
- Text
- 2003
- 2 Items
Item details Format Call Number Item Location Text TK7874 .E523 2003g pt.2 Off-site Item details Format Call Number Item Location Text TK7874 .E523 2003g pt.1 Off-site Photomask and next-generation lithography mask technology X : 16-18 April, 2003, Yokohama, Japan / Hiroyoshi Tanabe, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical roup of SPIE dedicated to the advancement of photomask technology, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for symposium, the Japan Society of Applied Physics ... [et al.] ; cooperating organization for technical exhibit, SEMI Japan ; supported by Yokohama City ; published by SPIE--the International Society for Optical Engineering.
- Text
- 2003
- 1 Item
Item details Format Call Number Item Location Text TK7872.M3 P46 2003g Off-site Optical microlithography XVII : 24-27 February 2004, Santa Clara, California, USA / Bruce W. Smith, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMATECH.
- Text
- Bellingham, Wash., USA : SPIE, c2004.
- 2004
- 3 Items
Item details Format Call Number Item Location Text TK7835 .O65 2004g pt.3 Off-site Item details Format Call Number Item Location Text TK7835 .O65 2004g pt.2 Off-site Item details Format Call Number Item Location Text TK7835 .O65 2004g pt.1 Off-site Emerging lithographic technologies VIII : 24-26 February, 2004, Santa Clara, California, USA / R. Scott Mackay, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, [and] International SEMATECH.
- Text
- Bellingham, Wash., USA : SPIE, c2004.
- 2004
- 2 Items
Item details Format Call Number Item Location Text TK7874 .E523 2004g pt.2 Off-site Item details Format Call Number Item Location Text TK7874 .E523 2004g pt.1 Off-site Photomask and next-generation lithography mask technology XI. Part One : 14-16 April, 2004, Yokohama, Japan / Hiroyoshi Tanabe, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--The International Society for Optical Engineering ; cooperating organizations, The Institute of Electrical Engineers of Japan . . . (et al.); co-organized by Yokohama City (Japan) ; published by SPIE--The International Society for Optical Engineering.
- Text
- Bellingham, Wash. : SPIE, [2004], ©2004.
- 2004-2004
- 2 Items
Item details Format Call Number Item Location Text TK7872.M3 P46 2004g pt.2 Off-site Item details Format Call Number Item Location Text TK7872.M3 P46 2004g pt.1 Off-site Electron-beam, X-ray, and ion-beam lithographies VI : 5-6 March 1987, Santa Clara, California / Phillip D. Blais, chair/editor.
- Text
- Bellingham, Wash. : SPIE--the International Society for Optical Engineering, 1987.
- 1987
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E4775 1987g Off-site Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VII : 2-4 March 1988, Santa Clara, California / Arnold W. Yanof, chair/editor ; sponsored by SPIE-the International Society for Optical Engineering.
- Text
- Bellingham, Wash., USA : The Society, [1988], ©1988.
- 1988-1988
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E4826 1988 Off-site Digest of papers 1988, 1st MicroProcess Conference : July 4-6, 1988, Tokyo / sponsored by the Japan Society of Applied Physics in cooperation with American Vacuum Society, IEEE Electron Devices Society.
- Text
- Bunkyo-ku, Tokyo :bBusiness Center for Academic Societies Japan, [1988], ©1988.
- 1988-1988
- 1 Item
Item details Format Call Number Item Location Text TK7871.85 .M626 1988g Off-site Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VIII : 1-3 March 1989, San Jose, California / Arnold W. Yanof, chair/editor ; sponsored by SPIE-the International Society for Optical Engineering.
- Text
- Bellingham, Wash., USA : The Society, [1989], ©1989.
- 1989-1989
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E4355 1989g Off-site Digest of papers 1989, 2nd MicroProcess Conference : July 2-5, 1989, Kobe, Japan / Sponsored by the Japan Society of Applied Physics in cooperation with American Vacuum Society, IEEE Electron Devices Society.
- Text
- Bunkyo-ku, Tokyo : Business Center for Academic Societies Japan, [1989], ©1989.
- 1989-1989
- 1 Item
Item details Format Call Number Item Location Text TK7871.85 .M626 1989g Off-site Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies IX : 7-8 March 1990, San Jose, California / Douglas J. Resnick, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering.
- Text
- Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, [1990], ©1990.
- 1990-1990
- 1 Item
Item details Format Call Number Item Location Text TK7874 .E4356 1990g Off-site Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California / David E. Seeger, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering : cooperating organization SEMI--Semiconductor Equipment and Materials International, SEMATECH.
- Text
- Bellingham, Wash., USA : SPIE, c1996.
- 1996
- 1 Item
Item details Format Call Number Item Location Text TA1505 .P762 vol.2723 Off-site
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